Patents by Inventor Chii-Chang Lai

Chii-Chang Lai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7799927
    Abstract: An indolestyryl compound. The indolestyryl compound has formula (I): wherein Z1 comprises benzene, naphthalene, or heterocyclic ring containing O, S, or N, R2 comprises H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and R6 comprise H, alkyl, aralkyl, or heterocyclic ring containing O, S, or N, R7 and R8 comprise H or alkyl, R10 comprises H, alkyl, halogen atoms, nitro, hydroxyl, amino, ester, or substituted or non-substituted sulfonyl, W comprises carbon or nitrogen, Y comprises carbon, oxygen, sulfur, selenium, —NR, or —C(CH3)2, m is 1˜3, and X1 comprises an anionic group or an anionic organometallic complex, wherein R3 and R4 are joined to a nitrogen atom or R5 and R6 are joined together to form a ring, and R bonded to nitrogen is C1-5 alkyl.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: September 21, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Chien-Wen Chen, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Wen-Yih Liao, Chien-Liang Huang, Tzuan-Ren Jeng, Ching-Yu Hsieh, An-Tse Lee
  • Patent number: 7598359
    Abstract: A bis(indolestyryl) compound. The bis(indolestyryl) compound has formula (I): wherein A and B comprise benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 and R1? are H, halogen, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, amide, sulfo ester, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R2, R2?, R3, and R3? comprise H, C1-6 alkyl, C6-18 aryl, C2-6 alkenyl, C3-6 cycloalkenyl, or C3-6 cycloalkyl, R4 is H, C1-5 alkyl, hydroxyl, halogen, or alkoxy, R5 and R5? comprise H, halogen, C1-5 alkyl, nitro, C1-3 alkoxy, amino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, W comprises oxygen, sulfur, selenium, —NR, or —C(CH3)2, n is 1˜18 and Z1 and Z2 are different and comprise an anion or an anionic organometallic complex with +1 or +2 valence, wherein R bonded to nitrogen is C1-4 alkyl.
    Type: Grant
    Filed: September 1, 2005
    Date of Patent: October 6, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Chien-Wen Chen, Chien-Liang Huang, Wen-Yih Liao, Ming-Chia Lee
  • Patent number: 7598360
    Abstract: A bisstyryl compound. The bisstyryl compound has formula (I): wherein Z1 and Z2 are benzene, naphthalene, or heterocyclic ring, R1 is H, C1-5 alkyl, hydroxyl, halogen atoms, or alkoxy, R2 is H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and R6 are H, halogen atoms, alkyl, aralkyl, or heterocyclic ring containing O, S, or N, or R3 and R4 are joined to a nitrogen atom or R5 and R6 are joined together to form a ring, R7 and R8 are H or alkyl, W is nitrogen with or without Z1 and Z2 or aromatic group without Z1 and Z2, Y is carbon, oxygen, sulfur, selenium, —NR, or —C(CH3)2, m is 1-3, n is 1-18, and X1 and X2 are anionic groups or anionic organometallic complexes.
    Type: Grant
    Filed: October 21, 2005
    Date of Patent: October 6, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Chien-Wen Chen, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Wen-Yih Liao, Chien-Liang Huang, Tzuan-Ren Jeng, Ching-Yu Hsieh, An-Tse Lee
  • Patent number: 7390549
    Abstract: An asymmetric bis(indolestyryl) compound. The asymmetric bis(indolestyryl) compound has formula (I): wherein A and B comprise benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 and R1? are H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, C1-3 alkoxy, amine, alkylamine, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R2, R2?, R3, and R3? comprise H, C1-6 alkyl, C6-18 aryl, C2-6 alkenyl, C3-6 cycloalkenyl, or C3-6 cycloalkyl, or C3-6 cycloalkyl containing hetero atom, R4 is H, hydroxyl, halogen atoms, or alkoxy, R5 and R5? comprise H, halogen atoms, C1-5 alkyl, nitro, C1-3 alkoxy, amine, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, n is 1˜18, Y is C(R6R7), C1-3 alkylamino or hetero atom, R6 and R7 are C1-3 alkyl, and Z? is an anion or an anionic organometallic complex. The invention also provides a high density recording medium utilizing the asymmetric bis(indolestyryl) compound.
    Type: Grant
    Filed: June 17, 2005
    Date of Patent: June 24, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Chii-Chang Lai, Hui-Ping Tsai, Chien-Liang Huang, Wen-Yih Liao, Ming-Chia Lee
  • Patent number: 7316890
    Abstract: Indolestyryl compounds and use thereof for a high density recording media and method for fabricating the same. The indolestyryl compounds exhibit strong absorbance in the visible light region (400˜700 nm) of the spectrum, resistance to heat and light, high light sensitivity, and excellent solubility, resulting from their special chemical configuration. Furthermore, the indolestyryl compounds can be used as recording layer materials in high density recording media for matching a reading laser wavelength and enhancing the reflective index and carrier-to-noise ratio (CNR) of the high density recording media. Accordingly, the recording sensitivity and the readout characteristics of high density recording media comprising the indolestyryl compound according to the present invention can be improved.
    Type: Grant
    Filed: April 26, 2004
    Date of Patent: January 8, 2008
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Hui-Ping Tsai, Chii-Chang Lai, Jie-Hwa Ma, Jong-Lieh Yang, Tzuan-Ren Jeng, Wen-Yih Liao, Chien-Liang Huang, Ming-Chia Lee, Chuen-Fuw Yan
  • Publication number: 20070219377
    Abstract: An indolestyryl compound. The indolestyryl compound has formula (I): wherein Z1 comprises benzene, naphthalene, or heterocyclic ring containing O, S, or N, R2 comprises H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and R6 comprise H, alkyl, aralkyl, or heterocyclic ring containing O, S, or N, R7 and R8 comprise H or alkyl, R10 comprises H, alkyl, halogen atoms, nitro, hydroxyl, amino, ester, or substituted or non-substituted sulfonyl, W comprises carbon or nitrogen, Y comprises carbon, oxygen, sulfur, selenium, —NR, or —C(CH3)2, m is 1˜3, and X1 comprises an anionic group or an anionic organometallic complex, wherein R3 and R4 are joined to a nitrogen atom or R5 and R6 are joined together to form a ring, and R bonded to nitrogen is C1-5 alkyl.
    Type: Application
    Filed: April 26, 2006
    Publication date: September 20, 2007
    Inventors: Shin-Shin Wang, Chien-Wen Chen, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Wen-Yih Liao, Chien-Liang Huang, Tzuan-Ren Jeng, Ching-Yu Hsieh, An-Tse Lee
  • Publication number: 20070009825
    Abstract: A bisstyryl compound. The bisstyryl compound has formula (I): wherein Z1 and Z2 are benzene, naphthalene, or heterocyclic ring, R1 is H, C1-5 alkyl, hydroxyl, halogen atoms, or alkoxy, R2 is H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and R6 are H, halogen atoms, alkyl, aralkyl, or heterocyclic ring containing O, S, or N, or R3 and R4 are joined to a nitrogen atom or R5 and R6 are joined together to form a ring, R7 and R8 are H or alkyl, W is nitrogen with or without Z1 and Z2 or aromatic group without Z1 and Z2, Y is carbon, oxygen, sulfur, selenium, —NR, or —C(CH3)2, m is 1-3, n is 1-18, and X1 and X2 are anionic groups or anionic organometallic complexes.
    Type: Application
    Filed: October 21, 2005
    Publication date: January 11, 2007
    Inventors: Shin-Shin Wang, Chien-Wen Chen, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Wen-Yih Liao, Chien-Liang Huang, Tzuan-Ren Jeng, Ching-Yu Hsieh, An-Tse Lee
  • Publication number: 20070003873
    Abstract: A bis(indolestyryl) compound. The bis(indolestyryl) compound has formula (I): wherein A and B comprise benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 and R1? are H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, amide, sulfo ester, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R2, R2?, R3, and R3? comprise H, C1-6 alkyl, C6-18 aryl, C2-6 alkenyl, C3-6 cycloalkenyl, or C3-6 cycloalkyl, R4 is H, C1-5 alkyl, hydroxyl, halogen atoms, or alkoxy, R5 and R5? comprise H, halogen atoms, C1-5 alkyl, nitro, C1-3 alkoxy, amino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, W comprises oxygen, sulfur, selenium, —NR, or —C(CH3)2, n is 1˜18, and Z1 and Z2 are different and comprise an anion or an anionic organometallic complex with +1 or +2 valence, wherein R bonded to nitrogen is C1-4 alkyl.
    Type: Application
    Filed: September 1, 2005
    Publication date: January 4, 2007
    Inventors: Shin-Shin Wang, Jong-Lieh Yang, Chii-Chang Lai, Hui-Ping Tsai, Wen-Ping Chu, Chien-Wen Chen, Chien-Liang Huang, Wen-Yih Liao, Ming-Chia Lee
  • Publication number: 20060142590
    Abstract: An asymmetric bis(indolestyryl) compound. The asymmetric bis(indolestyryl) compound has formula (I): wherein A and B comprise benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 and R1? are H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, C1-3 alkoxy, amine, alkylamine, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R2, R2?, R3, and R3? comprise H, C1-6 alkyl, C6-18 aryl, C2-6 alkenyl, C3-6 cycloalkenyl, or C3-6 cycloalkyl, or C3-6 cycloalkyl containing hetero atom, R4 is H, hydroxyl, halogen atoms, or alkoxy, R5 and R51 comprise H, halogen atoms, C1-5 alkyl, nitro, C1-3 alkoxy, amine, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, n is 1˜18, Y is C(R6R7), C1-3 alkylamino or hetero atom, R6 and R7 are C1-3 alkyl, and Z? is an anion or an anionic organometallic complex. The invention also provides a high density recording medium utilizing the asymmetric bis(indolestyryl) compound.
    Type: Application
    Filed: June 17, 2005
    Publication date: June 29, 2006
    Inventors: Shin-Shin Wang, Chii-Chang Lai, Hui-Ping Tsai, Chien-Liang Huang, Wen-Yih Liao, Ming-Chia Lee
  • Patent number: 7014981
    Abstract: The invention discloses new benzoindole styryl compounds and its use for a high-density optical recording medium. The invention uses the dyes of the new benzoindole styryl compounds to form the recording layer of high-density recording media. The new benzoindole styryl compounds are easy to prepare and purify, so they are cheaper when comparing to the compounds generally used in high-density optical recording media. The benzoindole styryl compounds has a maximum absorption for the light wavelength in the range of 500 nanometers to 700 nanometers. The benzoindole styryl compounds also have high sensitivity and chemical stability for light and heat. Using the new benzoindole styryl compounds to form a high-density optical recording medium can match up with the short-wavelength laser beam for high-density optical recording media and have the advantage of a stable quality.
    Type: Grant
    Filed: September 13, 2002
    Date of Patent: March 21, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Wen-Yih Liao, Chii-Chang Lai, Chien-Liang Huang, Hui-Ping Tsai, Chuen-Fuw Yan, Jong-Lieh Yang, Tzuan-Ren Jeng, Ming-Chia Lee
  • Publication number: 20050064335
    Abstract: Indolestyryl compounds and use thereof for a high density recording media and method for fabricating the same. The indolestyryl compounds exhibit strong absorbance in the visible light region (400˜700 nm) of the spectrum, resistance to heat and light, high light sensitivity, and excellent solubility, resulting from their special chemical configuration. Furthermore, the indolestyryl compounds can be used as recording layer materials in high density recording media for matching a reading laser wavelength and enhancing the reflective index and carrier-to-noise ratio (CNR) of the high density recording media. Accordingly, the recording sensitivity and the readout characteristics of high density recording media comprising the indolestyryl compound according to the present invention can be improved.
    Type: Application
    Filed: April 26, 2004
    Publication date: March 24, 2005
    Inventors: Shin-Shin Wang, Hui-Ping Tsai, Chii-Chang Lai, Jie-Hwa Ma, Jong-Lieh Yang, Tzuan-Ren Jeng, Wen-Yih Liao, Chien-Liang Huang, Ming-Chia Lee, Chuen-Fuw Yan
  • Patent number: 6815031
    Abstract: The invention discloses new indolestyryl compounds and their uses for a high-density optical recording medium. The invention uses the new indolestyryl compounds to form the recording layer of a high-density recording medium. The new indolestyryl compounds are easy to prepare and purify, so they are cheaper when comparing to the compounds generally used in high-density optical recording media. The indolestyryl compounds have a maximum absorption for light wavelengths in the range of 500 nanometers to 700 nanometers. The indolestyryl compounds also have high sensitivity and chemical stability toward light and heat. Using the new indolestyryl compounds to form high-density optical recording media can match up with the short-wavelength laser beam for high-density optical recording media and have the advantage of a stable quality.
    Type: Grant
    Filed: September 13, 2002
    Date of Patent: November 9, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Chien-Liang Huang, Shin-Shin Wang, Wen-Yih Liao, Hui-Ping Tsai, Chuen-Fuw Yan, Chii-Chang Lai, Tzuan-Ren Jeng, Jong-Lieh Yang, Ming-Chia Lee
  • Patent number: 6761952
    Abstract: This invention provides imin complex dyes for a high-density optical disc recording medium having the following formula (I): wherein Y constitutes oxygen atom, sulfate atom, carbon atom with substitutes (C—R5) or nitrogen atom with substitutes (N—R6); R1 constitutes alkyl group having carbon number one to eighteen with or without substitutes or ether group, p-alkyl benzyl group with or without substitutes; R2, R3, R5, R6, R7 can be same or different groups; and X constitutes halogen atom, ClO4−, BF4−, PF6−, SbF6−, TCNQ−, TCNE−, naphthalenesulfonic acid or organometallic complex.x. The bis-styryl dyes whose spectra maximum absorption in visible light range of wavelength of 300 nm˜800 nm can be used as a high density optical disc recording medium.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: July 13, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Chia Lee, Wen-Yih Liao, Chien-Liang Huang, Chuen-Fuw Yan, Tzuan-Ren Jeng, Ching-Yu Hsieh, Shin-Shin Wang, Hui-Ping Tsai, Chii-Chang Lai, Jie-Hwa Ma, Jong-Lieh Yang
  • Publication number: 20030202458
    Abstract: The invention discloses new benzoindole styryl compounds and its use for a high-density optical recording medium. The invention uses the dyes of the new benzoindole styryl compounds to form the recording layer of high-density recording media. The new benzoindole styryl compounds are easy to prepare and purify, so they are cheaper when comparing to the compounds generally used in high-density optical recording media. The benzoindole styryl compounds has a maximum absorption for the light wavelength in the range of 500 nanometers to 700 nanometers. The benzoindole styryl compounds also have high sensitivity and chemical stability for light and heat. Using the new benzoindole styryl compounds to form a high-density optical recording medium can match up with the short-wavelength laser beam for high-density optical recording media and have the advantage of a stable quality.
    Type: Application
    Filed: September 13, 2002
    Publication date: October 30, 2003
    Inventors: Shin-Shin Wang, Wen-Yih Liao, Chii-Chang Lai, Chien-Liang Huang, Hui-Ping Tsai, Chuen-Fuw Yan, Jong-Lieh Yang, Tzuan-Ren Jeng, Ming-Chia Lee
  • Publication number: 20030203148
    Abstract: The invention discloses new indolestyryl compounds and their uses for a high-density optical recording medium. The invention uses the new indolestyryl compounds to form the recording layer of a high-density recording medium. The new indolestyryl compounds are easy to prepare and purify, so they are cheaper when comparing to the compounds generally used in high-density optical recording media. The indolestyryl compounds have a maximum absorption for light wavelengths in the range of 500 nanometers to 700 nanometers. The indolestyryl compounds also have high sensitivity and chemical stability toward light and heat. Using the new indolestyryl compounds to form high-density optical recording media can match up with the short-wavelength laser beam for high-density optical recording media and have the advantage of a stable quality.
    Type: Application
    Filed: September 13, 2002
    Publication date: October 30, 2003
    Inventors: Chien-Liang Huang, Shin-Shin Wang, Wen-Yih Liao, Hui-Ping Tsai, Chuen-Fuw Yan, Chii-Chang Lai, Tzuan-Ren Jeng, Jong-Lieh Yang, Ming-Chia Lee
  • Patent number: 6500341
    Abstract: A process for the purification of water-soluble non-ionic contrast agents from water-soluble non-ionic impurities involves the steps of (a) injecting a raw water-soluble non-ionic contrast agent solution on a chromatographic column containing non-ionic resins; (b) eluting water-soluble impurities contained in the raw water-soluble non-ionic contrast agent solution with deionized water as a first eluent, and (c) eluting a water-soluble non-ionic contrast agent with alcohol as a second eluent.
    Type: Grant
    Filed: August 30, 2001
    Date of Patent: December 31, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Shin-Shin Wang, Hui-Ping Tsai, Chii-Chang Lai
  • Publication number: 20020170860
    Abstract: A process for the purification of water-soluble non-ionic contrast agents from water-soluble non-ionic impurities involves the steps of (a) injecting a raw water-soluble non-ionic contrast agent solution on a chromatographic column containing non-ionic resins; (b) eluting water-soluble impurities contained in the raw water-soluble non-ionic contrast agent solution with deionized water as a first eluent, and (c) eluting a water-soluble non-ionic contrast agent with alcohol as a second eluent.
    Type: Application
    Filed: August 30, 2001
    Publication date: November 21, 2002
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shin-Shin Wang, Hui-Ping Tsai, Chii-Chang Lai