Abstract: Systems of demand and capacity management with machine-time accuracy are provided. The system includes an allocation planning module, an order management module, a capacity model, and a capacity management module. The allocation planning module receives a demand plan for a product. The capacity management module transforms the demand plan into a machine-time-based plan according to the capacity model, and reserves capacity according to the machine-time-based plan for the demand plan. The capacity management module further transforms a purchase order received by the order management module before a cutoff date for the product into a machine-time-based order, accepts the machine-time-based order and decreases the reservation capacity depending on the machine-time-based plan.

Abstract: An on-demand data management system. The system comprises a file management module and a demand analysis module. The file management module receives files. Each file has attributes. The file management module segments the files according the attributes. The demand analysis module receives a data demand and selects data from the segmented files according to the data demand.

Abstract: Systems of demand and capacity management with machine-time accuracy are provided. The system includes an allocation planning module, an order management module, a capacity model, and a capacity management module. The allocation planning module receives a demand plan for a product. The capacity management module transforms the demand plan into a machine-time-based plan according to the capacity model, and reserves capacity according to the machine-time-based plan for the demand plan. The capacity management module further transforms a purchase order received by the order management module before a cutoff date for the product into a machine-time-based order, accepts the machine-time-based order and decreases the reservation capacity depending on the machine-time-based plan.

Abstract: A new business model of supply chain management for IC foundry and a system and method of demand and capacity management with machine-time accuracy are provided. The system includes an allocation planning module, an order management module, a capacity model, and a capacity management module. The allocation planning module receives a demand plan for a product. The capacity management module transforms the demand plan into a machine-time-based plan according to the capacity model, and reserves capacity according to the machine-time-based plan for the demand plan. The capacity management module further transforms a purchase order received by the order management module before a cutoff date for the product into a machine-time-based order, accepts the machine-time-based order and decreases the reservation capacity depending on the machine-time-based plan.

Abstract: A 6T SRAM cell includes a first inverter having a first pull-up transistor and a first pull-down transistor serially coupled between a supply source and a complementary supply source, and a second inverter cross-coupled with the first inverter having a second pull-up transistor and a second pull-down transistor serially coupled between the supply source and the complementary supply source. The cell further includes a first pass-gate and second pass-gate transistors coupled to the first and second inverters, respectively. The first pass-gate transistor and the first pull-up transistor are respectively constructed on a first P-type well and a first N-type well adjacent to one another, which are overlaid by a first doped region and a second doped region of substantially the same width in alignment with one another, respectively.

Abstract: A method of forming a metal-oxide-metal (MIM), capacitor structure wherein the fabrication procedures used for the MIM capacitor structure are integrated into a process sequence used to form damascene type copper interconnect structures for CMOS type devices, has been developed. The process sequence features a copper damascene connector located overlying exposed portions of a semiconductor substrate, and underlying the MIM capacitor structure. The MIM capacitor structure, comprised a capacitor dielectric layer sandwiched between conductive capacitor plates, is protected during several selective reactive ion etching patterning procedures by an overlying anti-reflective coating (ARC), insulator shape, and by insulator spacers located on the sides of the ARC shape and on the sides of a capacitor dielectric shape.

Abstract: A method of forming a metal-oxide-metal (MIM), capacitor structure wherein the fabrication procedures used for the MIM capacitor structure are integrated into a process sequence used to form damascene type copper interconnect structures for CMOS type devices, has been developed. The process sequence features a copper damascene connector located overlying exposed portions of a semiconductor substrate, and underlying the MIM capacitor structure. The MIM capacitor structure, comprised a capacitor dielectric layer sandwiched between conductive capacitor plates, is protected during several selective reactive ion etching patterning procedures by an overlying anti-reflective coating (ARC), insulator shape, and by insulator spacers located on the sides of the ARC shape and on the sides of a capacitor dielectric shape.

Abstract: Within both a computer assisted system for assigning a production demand within a plurality of fabrication facilities and a computer assisted method for assigning the production demand within the series of fabrication facilities, there is discriminated with respect to the production demand an existing product production demand content and a new product production demand content. The former is assigned to at least one qualified fabrication facility within the plurality of fabrication facilities and the latter is assigned to only one capable fabrication facility within the plurality of fabrication facilities.

Abstract: Within both a computer assisted system for assigning a production demand within a plurality of fabrication facilities and a computer assisted method for assigning the production demand within the series of fabrication facilities, there is discriminated with respect to the production demand an existing product production demand content and a new product production demand content. The former is assigned to at least one qualified fabrication facility within the plurality of fabrication facilities and the latter is assigned to only one capable fabrication facility within the plurality of fabrication facilities.