Patents by Inventor Chiih-Wei Tso

Chiih-Wei Tso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7486866
    Abstract: A fabrication method for hollow integration rod suitable for high temperature operation, comprising the steps: (a) pre-fixing a set of mirrors to be a hollow integration rod by a light curable adhesive (such as UV curable adhesive); and (b) fixing those mirrors permanently by an inorganic adhesive. Wherein the mirrors can be a High Reflective Mirror with dielectric thin films, or it could be a High Reflective Mirror made of metallic thin film and coating a dielectric thin films by deposition for enhancing the reflection and protection purpose; for a all dielectric film, since there are multi-layer of thin dielectric films been deposited thereon, to prevent the warpage or distortion due to film stress in deposition process, several layers of thin film of silicon oxide SiOx can be pre-deposited on the backside of the mirror to balance.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: February 3, 2009
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventors: Chien-Chih Lai, Chin-Ming Chung, Juin-Hong Lin, Pi-Tsung Hsu, Chiih-Wei Tso
  • Publication number: 20060119946
    Abstract: A fabrication method for hollow integration rod suitable for high temperature operation, comprising the steps: (a) pre-fixing a set of mirrors to be a hollow integration rod by a light curable adhesive (such as UV curable adhesive); and (b) fixing those mirrors permanently by an inorganic adhesive. Wherein the mirrors can be a High Reflective Mirror with dielectric thin films, or it could be a High Reflective Mirror made of metallic thin film and coating a dielectric thin films by deposition for enhancing the reflection and protection purpose; for a all dielectric film, since there are multi-layer of thin dielectric films been deposited thereon, to prevent the warpage or distortion due to film stress in deposition process, several layers of thin film of silicon oxide SiOx can be pre-deposited on the backside of the mirror to balance.
    Type: Application
    Filed: December 2, 2005
    Publication date: June 8, 2006
    Inventors: Chien-Chih Lai, Chin-Ming Chung, Juin-Hong Lin, Pi-Tsung Hsu, Chiih-Wei Tso