Patents by Inventor Chika Harada

Chika Harada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask and pattern formation method using the same
    Patent number: 8278014
    Abstract: A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than the first dimension. A phase-shifting portion which transmits the exposing light in an opposite phase with respect to the first opening is formed on the transparent substrate around the first opening. A light-shielding portion is formed on the transparent substrate around the second opening.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: October 2, 2012
    Assignee: Panasonic Corporation
    Inventors: Shigeo Irie, Akio Misaka, Yuji Nonami, Tetsuya Nakamura, Chika Harada
  • PHOTOMASK AND PATTERN FORMATION METHOD USING THE SAME
    Publication number: 20110262849
    Abstract: A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than the first dimension. A phase-shifting portion which transmits the exposing light in an opposite phase with respect to the first opening is formed on the transparent substrate around the first opening. A light-shielding portion is formed on the transparent substrate around the second opening.
    Type: Application
    Filed: July 7, 2011
    Publication date: October 27, 2011
    Applicant: Panasonic Corporation
    Inventors: Shigeo IRIE, Akio Misaka, Yuji Nonami, Tetsuya Nakamura, Chika Harada
  • Photomask and pattern formation method using the same
    Patent number: 7998641
    Abstract: A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than the first dimension. A phase-shifting portion which transmits the exposing light in an opposite phase with respect to the first opening is formed on the transparent substrate around the first opening. A light-shielding portion is formed on the transparent substrate around the second opening.
    Type: Grant
    Filed: August 28, 2008
    Date of Patent: August 16, 2011
    Assignee: Panasonic Corporation
    Inventors: Shigeo Irie, Akio Misaka, Yuji Nonami, Tetsuya Nakamura, Chika Harada
  • PHOTOMASK AND PATTERN FORMATION METHOD USING THE SAME
    Publication number: 20090061330
    Abstract: A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than the first dimension. A phase-shifting portion which transmits the exposing light in an opposite phase with respect to the first opening is formed on the transparent substrate around the first opening. A light-shielding portion is formed on the transparent substrate around the second opening.
    Type: Application
    Filed: August 28, 2008
    Publication date: March 5, 2009
    Inventors: Shigeo Irie, Akio Misaka, Yuji Nonami, Tetsuya Nakamura, Chika Harada