Patents by Inventor Chikara Egami

Chikara Egami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure Method, Method for Forming Projecting and Recessed Pattern, and Method for Manufacturing Optical Element
    Publication number: 20080160455
    Abstract: An exposure pattern having a line width of submicron size is simply formed by using an inexpensive and stable solid state laser or a gas laser as an exposure light source, and by using a photoresist for g-line or i-line. The exposure is performed by locally controlling a reaction time constant of the photosensitive material with beaming the laser beam on a predetermined portion of a layer of the photosensitive material having a predetermined thickness formed on the surface of a substrate W, with beam intensity and scanning rate of the laser beam being controlled.
    Type: Application
    Filed: January 24, 2006
    Publication date: July 3, 2008
    Applicant: FUJIFLIM Corporation
    Inventors: Yoshihito Hodosawa, Chikara Egami
  • Optical recording method, optical recording medium, and optical recording system
    Publication number: 20020150825
    Abstract: An optical recording method suited for recording a very small object or movement of a living organism such as a microorganism, which comprises irradiating an informative object set on or above a recording layer comprising a photosensitive material capable of undergoing a storable and detectable photochemical reaction, preferably a polymer material containing a photoreactive component capable of photoisomerization and having in the repeating unit thereof at least one group selected from a urethane group, a urea group, an amide group, a carboxyl group and a hydroxyl group, and recording a distribution of an optical near field generated from the informative object being irradiated on the photosensitive material as a photoreacting quantity of the photosensitive material.
    Type: Application
    Filed: April 25, 2002
    Publication date: October 17, 2002
    Applicant: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
    Inventors: Osamu Watanabe, Masaaki Tsuchimori, Yoshimasa Kawata, Chikara Egami, Okihiro Sugihara, Naomichi Okamoto
  • Optical recording method, optical recording medium, and optical recording system
    Patent number: 6413680
    Abstract: An optical recording method suited for recording a very small object or movement of a living organism such as a microorganism, which comprises irradiating an informative object set on or above a recording layer comprising a photosensitive material capable of undergoing a storable and detectable photochemical reaction, preferably a polymer material containing a photoreactive component capable of photoisomerization and having in the repeating unit thereof at least one group selected from a urethane group, a urea group, an amide group, a carboxyl group and a hydroxyl group, and recording a distribution of an optical near field generated from the informative object being irradiated on the photosensitive material as a photoreacting quantity of the photosensitive material.
    Type: Grant
    Filed: February 25, 1999
    Date of Patent: July 2, 2002
    Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventors: Osamu Watanabe, Masaaki Tsuchimori, Yoshimasa Kawata, Chikara Egami, Okihiro Sugihara, Naomichi Okamoto, Osamu Nakamura