Patents by Inventor Chikara Inaba

Chikara Inaba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8974760
    Abstract: There is provided a hydrogen chrolide gas ejecting nozzle 1 used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member is provided with a shaft portion extending in the longitudinal direction and a head portion that is provided on an end of the shaft portion and extends in a direction intersecting the longitudinal direction of the shaft portion. A supply hole extending in the longitudinal direction is formed in the shaft portion, a plurality of ejection holes are formed in the head portion, and each of the ejection holes is communicatively connected to the supply hole and opened on the outer surface of the head portion toward a direction intersecting the direction to which the supply hole extends.
    Type: Grant
    Filed: June 12, 2013
    Date of Patent: March 10, 2015
    Assignee: Mitsubishi Materials Corporation
    Inventor: Chikara Inaba
  • Publication number: 20130272946
    Abstract: There is provided a hydrogen chrolide gas ejecting nozzle 1 used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member is provided with a shaft portion extending in the longitudinal direction and a head portion that is provided on an end of the shaft portion and extends in a direction intersecting the longitudinal direction of the shaft portion. A supply hole extending in the longitudinal direction is formed in the shaft portion, a plurality of ejection holes are formed in the head portion, and each of the ejection holes is communicatively connected to the supply hole and opened on the outer surface of the head portion toward a direction intersecting the direction to which the supply hole extends.
    Type: Application
    Filed: June 12, 2013
    Publication date: October 17, 2013
    Inventor: Chikara Inaba
  • Patent number: 8557211
    Abstract: A reaction apparatus for producing trichlorosilane in which metal silicon powder M is reacted with hydrogen chloride gas, thus generating trichlorosilane, includes: an apparatus body into which the metal silicon powder is supplied; and an ejection port for ejecting the hydrogen chloride gas into the apparatus body from the bottom part of the apparatus body, wherein a plurality of holed pieces having a through hole penetrating in the thickness direction and a plurality of pellets interposed between these holed pieces are stacked in a mixed state on the upper side of the ejection port.
    Type: Grant
    Filed: June 25, 2012
    Date of Patent: October 15, 2013
    Assignee: Mitsubishi Materials Corporation
    Inventor: Chikara Inaba
  • Patent number: 8486339
    Abstract: There is provided a hydrogen chrolide gas ejecting nozzle 1 used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member is provided with a shaft portion extending in the longitudinal direction and a head portion that is provided on an end of the shaft portion and extends in a direction intersecting the longitudinal direction of the shaft portion. A supply hole extending in the longitudinal direction is formed in the shaft portion, a plurality of ejection holes are formed in the head portion, and each of the ejection holes is communicatively connected to the supply hole and opened on the outer surface of the head portion toward a direction intersecting the direction to which the supply hole extends.
    Type: Grant
    Filed: October 22, 2008
    Date of Patent: July 16, 2013
    Assignee: Mitsubishi Materials Corporation
    Inventor: Chikara Inaba
  • Patent number: 8367029
    Abstract: In the apparatus for producing trichlorosilane in which metal silicon powder supplied into the reactor is reacted with hydrogen chloride gas while being fluidized by the gas, thereby taking out trichlorosilane generated by the reaction from the upper part of the reactor, and a plurality of gas flow controlling members are installed at the internal space of the reactor along the vertical direction.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: February 5, 2013
    Assignee: Mitsubishi Materials Corporation
    Inventor: Chikara Inaba
  • Publication number: 20120275982
    Abstract: A reaction apparatus for producing trichlorosilane in which metal silicon powder M is reacted with hydrogen chloride gas, thus generating trichlorosilane, includes: an apparatus body into which the metal silicon powder is supplied; and an ejection port for ejecting the hydrogen chloride gas into the apparatus body from the bottom part of the apparatus body, wherein a plurality of holed pieces having a through hole penetrating in the thickness direction and a plurality of pellets interposed between these holed pieces are stacked in a mixed state on the upper side of the ejection port.
    Type: Application
    Filed: June 25, 2012
    Publication date: November 1, 2012
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventor: Chikara Inaba
  • Patent number: 8226895
    Abstract: A reaction apparatus for producing trichlorosilane in which metal silicon powder M is reacted with hydrogen chloride gas, thus generating trichlorosilane, includes: an apparatus body into which the metal silicon powder is supplied; and an ejection port for ejecting the hydrogen chloride gas into the apparatus body from the bottom part of the apparatus body, wherein a plurality of holed pieces having a through hole penetrating in the thickness direction and a plurality of pellets interposed between these holed pieces are stacked in a mixed state on the upper side of the ejection port.
    Type: Grant
    Filed: October 22, 2008
    Date of Patent: July 24, 2012
    Assignee: Mitsubishi Materials Corporation
    Inventor: Chikara Inaba
  • Patent number: 8101131
    Abstract: Aluminum chloride from a gas containing chlorosilanes produced in a chlorination reactor is effectively removed. A container 1 is filled with sodium chloride and heated by a heating device 17, a gas containing chlorosilanes produced by a reaction between metallurgical grade silicon and hydrogen chloride passes through the sodium chloride layer 16 to generate a double salt of aluminum chloride contained in the gas and the sodium chloride, and the gas from which the double salt is separated is recovered from a gas recovery tube 26.
    Type: Grant
    Filed: March 20, 2009
    Date of Patent: January 24, 2012
    Assignee: Mitsubishi Materials Corporation
    Inventors: Teruhisa Kitagawa, Mitsutoshi Narukawa, Chikara Inaba
  • Publication number: 20100074823
    Abstract: In the apparatus for producing trichlorosilane in which metal silicon powder supplied into the reactor is reacted with hydrogen chloride gas while being fluidized by the gas, thereby taking out trichlorosilane generated by the reaction from the upper part of the reactor, and a plurality of gas flow controlling members are installed at the internal space of the reactor along the vertical direction.
    Type: Application
    Filed: November 19, 2009
    Publication date: March 25, 2010
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventor: Chikara Inaba
  • Patent number: 7641872
    Abstract: In the apparatus for producing trichlorosilane in which metal silicon powder supplied into the reactor is reacted with hydrogen chloride gas while being fluidized by the gas, thereby taking out trichlorosilane generated by the reaction from the upper part of the reactor, and a plurality of gas flow controlling members are installed at the internal space of the reactor along the vertical direction.
    Type: Grant
    Filed: October 17, 2008
    Date of Patent: January 5, 2010
    Assignee: Mitsubishi Materials Corporation
    Inventor: Chikara Inaba
  • Publication number: 20090238748
    Abstract: Aluminum chloride from a gas containing chlorosilanes produced in a chlorination reactor is effectively removed. A container 1 is filled with sodium chloride and heated by a heating device 17, a gas containing chlorosilanes produced by a reaction between metallurgical grade silicon and hydrogen chloride passes through the sodium chloride layer 16 to generate a double salt of aluminum chloride contained in the gas and the sodium chloride, and the gas from which the double salt is separated is recovered from a gas recovery tube 26.
    Type: Application
    Filed: March 20, 2009
    Publication date: September 24, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Teruhisa Kitagawa, Mitsutoshi Narukawa, Chikara Inaba
  • Publication number: 20090123359
    Abstract: A reaction apparatus for producing trichlorosilane in which metal silicon powder M is reacted with hydrogen chloride gas, thus generating trichlorosilane, includes: an apparatus body into which the metal silicon powder is supplied; and an ejection port for ejecting the hydrogen chloride gas into the apparatus body from the bottom part of the apparatus body, wherein a plurality of holed pieces having a through hole penetrating in the thickness direction and a plurality of pellets interposed between these holed pieces are stacked in a mixed state on the upper side of the ejection port.
    Type: Application
    Filed: October 22, 2008
    Publication date: May 14, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventor: Chikara Inaba
  • Publication number: 20090108100
    Abstract: There is provided a hydrogen chrolide gas ejecting nozzle I used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member is provided with a shaft portion extending in the longitudinal direction and a head portion that is provided on an end of the shaft portion and extends in a direction intersecting the longitudinal direction of the shaft portion. A supply hole extending in the longitudinal direction is formed in the shaft portion, a plurality of ejection holes are formed in the head portion, and each of the ejection holes is communicatively connected to the supply hole and opened on the outer surface of the head portion toward a direction intersecting the direction to which the supply hole extends.
    Type: Application
    Filed: October 22, 2008
    Publication date: April 30, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventor: Chikara Inaba
  • Publication number: 20090104104
    Abstract: In the apparatus for producing trichlorosilane in which metal silicon powder supplied into the reactor is reacted with hydrogen chloride gas while being fluidized by the gas, thereby taking out trichlorosilane generated by the reaction from the upper part of the reactor, and a plurality of gas flow controlling members are installed at the internal space of the reactor along the vertical direction.
    Type: Application
    Filed: October 17, 2008
    Publication date: April 23, 2009
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventor: Chikara Inaba