Abstract: A mount insulator is structured by a core metal body, installed at a fixed side and including an almost flat intermediate flange section having a piercing hole at an axial center section and a ring-shaped wall section extensively provided at the outer periphery of the intermediate flange in the direction of both sides crossing the intermediate section, and a mount elastic body section integrally fixed and formed with both sides of the intermediate flange section, an inner peripheral surface of the piercing hole and an inner peripheral surface of the ring-shaped wall section, and including an extension section expanded in a direction to cross the intermediate flange section and projecting from both wall sections, and a piercing supporting hole provided at the inner periphery side of the piercing hole of the intermediate flange section and piercing through between end surfaces of both extension sections of smaller diameter than that of the piercing hole and almost concentric with the piercing hole for piercingl

Abstract: The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

Abstract: An electron beam pattern transfer system is disclosed which includes a photoelectric transducing mask disposed within a vacuum container and adapted to transfer a photoelectron beam pattern corresponding to a pattern of the mask onto a sample according to an amount of an incident light, a DC voltage generator connected to vary a voltage applied between the mask and the sample, and a focusing coil of a superconductive magnet for creating a magnetic field of a predetermined intensity between the mask and the sample. When a mask-to-sample distance and/or magnetic field intensity varies undesirably, the variation is electrically detected by detectors. In order to compensate for the defocusing of the photoelectron beam pattern on the sample due to the above-mentioned variation, a microprocessor automatically calculates an amount of correction with respect to the intensity of the electric field between the mask and the sample, on a real-time basis and supplies its control signal to the DC voltage generator.