Abstract: A residual value calculation system is for an air conditioner including an indoor unit and an outdoor unit. The residual value calculation system includes a management device that manages the air conditioner. The management device includes an obtaining unit and a calculating unit. The obtaining unit obtains first environment information related to an installation environment of the indoor unit, and second environment information related to an installation environment of the outdoor unit. The calculating unit calculates a residual value of the air conditioner after use over a set period based on the first environment information and the second environment information, the residual value including at least one of an initial estimation residual value and an actual estimation residual value based on actual use.

Abstract: A substrate processing method includes a processing liquid film forming step of supplying a processing liquid, containing a sublimable substance, to a pattern forming surface of a substrate, to form a processing liquid film on the pattern forming surface, a temperature maintaining step of maintaining a temperature of the processing liquid film, formed on the pattern forming surface, in a temperature range not lower than a melting point of the sublimable substance and lower than a boiling point of the sublimable substance, a film thinning step of thinning the processing liquid film while the temperature of the processing liquid film is in the temperature range, a freezing step of making the processing liquid film, thinned by the film thinning step, freeze on the pattern forming surface after the temperature maintaining step to form a frozen body of the sublimable substance, and a sublimating step of sublimating the frozen body to remove the frozen body from the pattern forming surface.

Abstract: A substrate processing method includes a processing liquid film forming step of supplying a processing liquid, containing a sublimable substance, to a pattern forming surface of a substrate, to form a processing liquid film on the pattern forming surface, a temperature maintaining step of maintaining a temperature of the processing liquid film, formed on the pattern forming surface, in a temperature range not lower than a melting point of the sublimable substance and lower than a boiling point of the sublimable substance, a film thinning step of thinning the processing liquid film while the temperature of the processing liquid film is in the temperature range, a freezing step of making the processing liquid film, thinned by the film thinning step, freeze on the pattern forming surface after the temperature maintaining step to form a frozen body of the sublimable substance, and a sublimating step of sublimating the frozen body to remove the frozen body from the pattern forming surface.

Abstract: A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate, a holding layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removing the particle holding layer from the substrate, a liquid film of the second processing liquid, a solidifying step of cooling the liquid film to a temperature not more than a melting point of the sublimable substance to make the liquid film solidify on the substrate and form a solid film, and a sublimating step of sublimating and thereby removing the solid film from the substrate.

Abstract: A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate, a holding layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removing the particle holding layer from the substrate, a liquid film of the second processing liquid, a solidifying step of cooling the liquid film to a temperature not more than a melting point of the sublimable substance to make the liquid film solidify on the substrate and form a solid film, and a sublimating step of sublimating and thereby removing the solid film from the substrate.

Abstract: A control apparatus includes a receiving unit, a demand response unit, a power consumption fluctuation unit, a fluctuation-amount-estimation unit and an adjustment control execution unit. The receiving unit receives a demand pertaining to power consumption sent from an energy management apparatus. The demand response unit executes a demand-response control in order to adjust total power consumption of a plurality of devices set up in a property in accordance with the demand. The power consumption fluctuation unit executes a non-demand-response control in order to cause total power consumption to fluctuate regardless of the demand. The fluctuation-amount-estimation unit estimates a power consumption that will fluctuate due to the non-demand-response control during the demand-response control.

Abstract: A substrate processing method includes a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate, a holding layer forming step of solidifying or curing the first processing liquid to form a particle holding layer on the upper surface of the substrate, a holding layer removing step of peeling and removing the particle holding layer from the upper surface of the substrate, a liquid film forming step of forming, after removing the particle holding layer from the substrate, a liquid film of the second processing liquid, a solidifying step of cooling the liquid film to a temperature not more than a melting point of the sublimable substance to make the liquid film solidify on the substrate and form a solid film, and a sublimating step of sublimating and thereby removing the solid film from the substrate.

Abstract: A substrate processing method includes a processing liquid film forming step of supplying a processing liquid, containing a sublimable substance, to a pattern forming surface of a substrate, to form a processing liquid film on the pattern forming surface, a temperature maintaining step of maintaining a temperature of the processing liquid film, formed on the pattern forming surface, in a temperature range not lower than a melting point of the sublimable substance and lower than a boiling point of the sublimable substance, a film thinning step of thinning the processing liquid film while the temperature of the processing liquid film is in the temperature range, a freezing step of making the processing liquid film, thinned by the film thinning step, freeze on the pattern forming surface after the temperature maintaining step to form a frozen body of the sublimable substance, and a sublimating step of sublimating the frozen body to remove the frozen body from the pattern forming surface.

Abstract: A control apparatus includes a receiving unit, a demand-response unit, a power consumption fluctuation unit, and a setting unit. The receiving unit receives a demand relating to power consumption from an energy management apparatus. The demand-response unit executes a demand-response control in order to adjust power consumption of facility devices set up in a property in accordance with the demand when the demand is received by the receiving unit. The power consumption fluctuation unit executes a non-demand-response control in order to increase or decrease power consumption of the facility devices regardless of the demand. The setting unit sets the non-demand-response control to active or inactive.

Abstract: A control apparatus includes a receiving unit, a demand response unit, a power consumption fluctuation unit, a fluctuation-amount-estimation unit and an adjustment control execution unit. The receiving unit receives a demand pertaining to power consumption sent from an energy management apparatus. The demand response unit executes a demand-response control in order to adjust total power consumption of a plurality of devices set up in a property in accordance with the demand. The power consumption fluctuation unit executes a non-demand-response control in order to cause total power consumption to fluctuate regardless of the demand. The fluctuation-amount-estimation unit estimates a power consumption that will fluctuate due to the non-demand-response control during the demand-response control.

Abstract: A control apparatus includes a receiving unit, a demand-response unit, a power consumption fluctuation unit, and a setting unit. The receiving unit receives a demand relating to power consumption from an energy management apparatus. The demand-response unit executes a demand-response control in order to adjust power consumption of facility devices set up in a property in accordance with the demand when the demand is received by the receiving unit. The power consumption fluctuation unit executes a non-demand-response control in order to increase or decrease power consumption of the facility devices regardless of the demand. The setting unit sets the non-demand-response control to active or inactive.