Patents by Inventor Chikaya Tamitsuji

Chikaya Tamitsuji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210332171
    Abstract: To provide a polymer wherein a linking group that connects the main chain of the polymer and a cyclic perfluoroaliphatic disulfonimide skeleton, is a fluoroalkylene group which may have an ether oxygen atom. A polymer which has either one or both of units represented by formula u1-1 and units represented by formula u1-2: RF1, RF2: a C1-3 perfluoroalkylene group; RF3: a C1-6 perfluoroalkylene group; m: 0 or 1; and X: a hydrogen atom, an alkali metal atom, a fluorine atom, an alkyl group, ammonium or the like.
    Type: Application
    Filed: June 18, 2021
    Publication date: October 28, 2021
    Applicant: AGC Inc.
    Inventors: Takeshi HIRAI, Daisuke JOMUTA, Chikaya TAMITSUJI, Takumi OKUYAMA
  • Publication number: 20210301119
    Abstract: To provide a perfluoropolymer capable of producing an electrolyte membrane excellent in electrical conductivity and mechanical strength under high temperature environment, as well as a liquid composition, a polymer electrolyte membrane, a membrane electrode assembly and a polymer electrolyte fuel cell, obtainable by using the perfluoropolymer. The perfluoropolymer of the present invention contains perfluoromonomer units, does not substantially contain units having a halogen atom other than a fluorine atom, does not substantially contain units having a ring structure, and has acid-type sulfonic acid groups, wherein the perfluoromonomer units contain at least one type of units A selected from the group consisting of perfluoro vinyl ether units and perfluoro allyl ether units; the ion exchange capacity is from 1.4 to 2.5 milliequivalent/gram dry resin; and the storage modulus at 120° C. is at least 60 MPa.
    Type: Application
    Filed: May 28, 2021
    Publication date: September 30, 2021
    Applicant: AGC Inc.
    Inventors: Takeshi HIRAI, Daisuke JOMUTA, Chikaya TAMITSUJI
  • Publication number: 20210301044
    Abstract: To provide an acid-type sulfonic acid group-containing polymer which is excellent in hydrogen gas barrier properties and hot water resistance and which generates less oligomer during production; a liquid composition and a polymer electrolyte membrane comprising this acid-type sulfonic acid group-containing polymer; and a membrane electrode assembly and a polymer electrolyte fuel cell provided with the polymer electrolyte membrane. This acid-type sulfonic acid group-containing polymer is a polymer which has perfluoromonomer units, no monomer units having a halogen atom other than a fluorine atom, and acid-type sulfonic acid groups, and of which the hydrogen gas permeability coefficient under the conditions of a temperature of 80° C. and a relative humidity of 10%, is at most 2.5×10?9 cm3·cm/(s·cm2·cmHg), and the mass reduction rate when being immersed in hot water at 120° C.
    Type: Application
    Filed: May 26, 2021
    Publication date: September 30, 2021
    Applicant: AGC Inc.
    Inventors: Takeshi HIRAI, Susumu SAITO, Hiroyuki WATABE, Chikaya TAMITSUJI, Daisuke JOMUTA
  • Publication number: 20210284813
    Abstract: To provide a liquid composition capable of forming a membrane excellent in durability against hydrogen peroxide or peroxide radicals and excellent in hydrogen gas barrier property; a polymer electrolyte membrane; a membrane electrode assembly; and a polymer electrolyte fuel cell. Liquid composition comprising a liquid medium, an acid-type sulfonic acid group-containing fluorocarbon polymer of which the hydrogen gas permeation coefficient under the conditions of a temperature of 80° C. and a relative humidity of 10% is at most 2.5×10?9 cm3·cm/(s·cm2·cmHg), and cerium atoms; a polymer electrolyte membrane 15 comprising the acid-type sulfonic acid group-containing fluorocarbon polymer, and cerium atoms; and a membrane electrode assembly 10 comprising an anode 13 having a catalyst layer, a cathode 14 having a catalyst layer, and the polymer electrolyte membrane 15 disposed between the anode 13 and the cathode 14.
    Type: Application
    Filed: May 27, 2021
    Publication date: September 16, 2021
    Applicant: AGC Inc.
    Inventors: Takumi OKUYAMA, Takeshi HIRAI, Susumu SAITO, Chikaya TAMITSUJI, Daisuke JOMUTA
  • Publication number: 20210284771
    Abstract: To provide a perfluoropolymer capable of producing an electrolyte membrane excellent in mechanical strength in high temperature environments; as well as a liquid composition, polymer electrolyte membrane, membrane electrode assembly and polymer electrolyte water electrolyzer, obtainable by using the perfluoropolymer. The perfluoropolymer of the present invention contains perfluoromonomer units, does not substantially contain units having a halogen atom other than a fluorine atom, does not substantially contain units having a ring structure, and has acid-type sulfonic acid groups, wherein the perfluoromonomer units contain at least one type of units A selected from the group consisting of perfluorovinyl ether units and perfluoroallyl ether units; the ion exchange capacity is from 0.9 to 1.4 milliequivalent/gram dry resin; and the storage modulus at 120° C. is at least 100 MPa.
    Type: Application
    Filed: May 27, 2021
    Publication date: September 16, 2021
    Applicant: AGC Inc.
    Inventors: Takeshi HIRAI, Daisuke JOMUTA, Chikaya TAMITSUJI
  • Patent number: 10975053
    Abstract: The present invention relates to a method for producing a 1,3-dioxolane compound represented by formula 1, the method containing step (a), in which hexafluoroacetone monohydrate is brought into contact with a metal fluoride, step (b), in which fluorine gas is brought into contact, and step (c), in which an olefin compound represented by formula 2 is brought into contact. In formulae 1 and 2, X1 to X4 each independently represent a hydrogen atom, fluorine atom, chlorine atom, or trifluoromethyl group.
    Type: Grant
    Filed: July 23, 2020
    Date of Patent: April 13, 2021
    Assignee: AGC INC.
    Inventors: Daisuke Jomuta, Yusuke Takahira, Nobuyuki Otozawa, Chikaya Tamitsuji
  • Publication number: 20200354332
    Abstract: The present invention relates to a method for producing a 1,3-dioxolane compound represented by formula 1, the method containing step (a), in which hexafluoroacetone monohydrate is brought into contact with a metal fluoride, step (b), in which fluorine gas is brought into contact, and step (c), in which an olefin compound represented by formula 2 is brought into contact. In formulae 1 and 2, X1 to X4 each independently represent a hydrogen atom, fluorine atom, chlorine atom, or trifluoromethyl group.
    Type: Application
    Filed: July 23, 2020
    Publication date: November 12, 2020
    Applicant: AGC Inc.
    Inventors: Daisuke JOMUTA, Yusuke TAKAHIRA, Nobuyuki OTOZAWA, Chikaya TAMITSUJI
  • Publication number: 20200190233
    Abstract: A fluorosulfonyl group-containing polymer having units represented by the following formula u1, a sulfonic acid group-containing polymer having fluorosulfonyl groups in the fluorosulfonyl group-containing polymer converted into sulfonic acid groups, its production method and its applications: wherein RF1 and RF2 are a C1-3 perfluoroalkylene group.
    Type: Application
    Filed: February 26, 2020
    Publication date: June 18, 2020
    Applicant: AGC Inc.
    Inventors: Takeshi HIRAI, Daisuke Jomuta, Chikaya Tamitsuji
  • Publication number: 20200190025
    Abstract: A method for producing a fluorosulfonyl group-containing compound to obtain a compound represented by the following formula 5 from a compound represented by the following formula 1 as a starting material and a method for producing a fluorosulfonyl group-containing monomer in which the fluorosulfonyl group-containing compound is used: wherein R1 and R2 are a C1-3 alkylene group, and RF1 and RF2 are a C1-3 perfluoroalkylene group.
    Type: Application
    Filed: February 26, 2020
    Publication date: June 18, 2020
    Applicant: AGC Inc.
    Inventors: Takeshi HIRAI, Daisuke JOMUTA, Chikaya TAMITSUJI
  • Patent number: 10038188
    Abstract: To provide a cathode active material with which a lithium ion secondary battery having favorable cycle characteristics and having a high energy density even when discharged at a high voltage can be obtained; a cathode comprising the cathode active material; and a lithium ion secondary battery having the cathode. A cathode active material comprising a composite oxide (A) containing Li and at least one transition metal element selected from the group consisting of Ni, Co and Mn, and the following particles (B) and the following fluorinated carbon material (C) present on the surface of the composite oxide (A): particles (B): particles containing an oxide of at least one metal element selected from the group consisting of Ti, Sn, Si, Al, Ce, Y, Zr, Co, W, V, Nb, Ta, La and Mg; and fluorinated carbon material (C): a fluorinated carbon material in the form of particles or fibers.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: July 31, 2018
    Assignee: SUMITOMO CHEMICAL CO., LTD.
    Inventors: Widjaja Hardiyanto, Chikaya Tamitsuji, Naoki Yoshida, Sadatatsu Ikeda
  • Publication number: 20150325851
    Abstract: To provide a cathode active material with which a lithium ion secondary battery having favorable cycle characteristics and having a high energy density even when discharged at a high voltage can be obtained; a cathode comprising the cathode active material; and a lithium ion secondary battery having the cathode. A cathode active material comprising a composite oxide (A) containing Li and at least one transition metal element selected from the group consisting of Ni, Co and Mn, and the following particles (B) and the following fluorinated carbon material (C) present on the surface of the composite oxide (A): particles (B): particles containing an oxide of at least one metal element selected from the group consisting of Ti, Sn, Si, Al, Ce, Y, Zr, Co, W, V, Nb, Ta, La and Mg; and fluorinated carbon material (C): a fluorinated carbon material in the form of particles or fibers.
    Type: Application
    Filed: April 23, 2015
    Publication date: November 12, 2015
    Applicant: Asahi Glass Company, Limited
    Inventors: Widjaja HARDIYANTO, Chikaya TAMITSUJI, Naoki YOSHIDA, Sadatatsu IKEDA
  • Patent number: 8735308
    Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ?Ti3+/Ti3+, on an optical use surface, is 0.2 or less.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: May 27, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Akio Koike, Chikaya Tamitsuji, Kunio Watanabe, Tomonori Ogawa
  • Patent number: 8656735
    Abstract: To provide a novel fluorination treatment method whereby the surface of oxide glass can be treated for fluorination at low cost and with excellent adhesiveness. A method for treating the surface of oxide glass, which comprises contacting the surface of oxide glass with a gas of a fluorinating agent or a mixed gas having a fluorinating agent diluted with an inert gas, wherein the fluorinating agent is an elemental fluorine, or a fluorine compound capable of cleaving a bond between an oxygen atom and a metal atom in the framework of the oxide glass and forming a bond between a fluorine atom and the metal atom; and the concentration of hydrogen fluoride at the surface of oxide glass with which the fluorinating agent is in contact, is controlled to be at most 1 mol %.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: February 25, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Chikaya Tamitsuji, Kunio Watanabe
  • Patent number: 8240172
    Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: August 14, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Chikaya Tamitsuji, Kunio Watanabe, Akio Koike
  • Patent number: 8043668
    Abstract: Provided is a method for depositing a fluorine-doped silicon oxide film on the surface of a substrate made of a material comprising at least 50 mass % of an ethylene/tetrafluoroethylene copolymer. This method comprises flowing a mixed gas into between electrodes, exposing the mixed gas to electric power applied between the electrodes so that the electrical power density between the electrodes becomes from 0.5 to 1.1 W/cm3 to cause discharge, and forming plasma of the mixed gas and depositing the fluorine-doped silicon oxide film on the surface of the substrate. In this method, the mixed gas for forming the fluorine-doped silicon oxide film comprises silicon tetrafluoride, oxygen and a hydrocarbon, the atomic ratio of oxygen atoms to carbon atoms (O/C) is from 1 to 10, and the atomic ratio of oxygen atoms to silicon atoms (O/Si) is from 1.7 to 25 in the mixed gas.
    Type: Grant
    Filed: April 29, 2009
    Date of Patent: October 25, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Seiji Higashi, Chikaya Tamitsuji
  • Publication number: 20110239706
    Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body, wherein, in step (b), elemental fluorine (F2) is continuously or intermittently supplied to the reaction vessel and the gas in the reaction vessel is continuously or intermittently discharged from the reaction vessel.
    Type: Application
    Filed: April 1, 2011
    Publication date: October 6, 2011
    Applicant: Asahi Glass Company, Limited
    Inventors: Chikaya Tamitsuji, Kunio Watanabe, Akio Koike
  • Publication number: 20110239707
    Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of a pressure of Pb1 and a temperature of 400° C. or lower, and followed by maintaining in the reaction vessel under condition of a pressure Pb2 lower than the pressure Pb1 and a temperature of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.
    Type: Application
    Filed: April 1, 2011
    Publication date: October 6, 2011
    Applicant: Asahi Glass Company, Limited
    Inventors: Chikaya Tamitsuji, Kunio Watanabe, Akio Koike
  • Publication number: 20110179827
    Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.
    Type: Application
    Filed: April 6, 2011
    Publication date: July 28, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Chikaya TAMITSUJI, Kunio Watanabe, Akio Koike
  • Publication number: 20110151194
    Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.
    Type: Application
    Filed: March 4, 2011
    Publication date: June 23, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Chikaya Tamitsuji, Kunio Watanabe, Kaname Okada, Daisuke Kobayashi
  • Patent number: 7934391
    Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: May 3, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Chikaya Tamitsuji, Kunio Watanabe, Kaname Okada, Daisuke Kobayashi