Patents by Inventor Chimin Sheu

Chimin Sheu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR PREVENTING THE COLLAPSE OF HIGH ASPECT RATIO STRUCTURES DURING DRYING
    Publication number: 20130280123
    Abstract: Methods of reducing the capillary forces experienced by fragile high aspect ratio structures during drying to substantially prevent damage to said high aspect ratio structures during drying. They include modifying the surface of the high aspect ratio structures such that the forces are sufficiently minimized and as such less than 10% of the high aspect ratio features will have bent or collapsed during drying of the structure having said features thereon.
    Type: Application
    Filed: August 26, 2011
    Publication date: October 24, 2013
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: Tianniu Chen, Steven Bilodeau, Chimin Sheu, Mutsumi Nakanishi, Masahiro Matsuoka, Fumio Nakayama, Peng Zhang, Michael B. Korzenski, Emanuel I. Cooper, Kate Veccharelli, Makonnen Payne
  • Stripper for dry film removal
    Patent number: 8357646
    Abstract: The present invention, in a preferred embodiment, is a photoresist stripper formulation, comprising: Hydroxylamine ; Water; a solvent selected from the group consisting of dimethylsulfoxide; N-methylpyrrrolidine; dimethylacetamide; dipropylene glycol monomethyl ether; monoethanolamine and mixtures thereof; a base selected from the group consisting of choline hydroxide, monoethanolamine, tetramethylammonium hydroxide; aminoethylethanolamine and mixtures thereof; a metal corrosion inhibitor selected from the group consisting of catechol, gallic acid, lactic acid, benzotriazole and mixtures thereof; and a bath life extending agent selected from the group consisting of glycerine, propylene glycol and mixtures thereof. The present invention is also a method for using formulations as exemplified in the preferred embodiment.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: January 22, 2013
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Wen Dar Liu, Yi Chia Lee, Archie Liao, Madhukar Bhaskara Rao, Matthew I. Egbe, Chimin Sheu, Michael Walter Legenza
  • Stripper For Copper/Low k BEOL Clean
    Publication number: 20090229629
    Abstract: The present invention is a chemical stripper formulation for removing photoresist and the residue of etching and ashing of electronic device substrates, comprising: deionized water, acetic acid, polyethylene glycol, dipropylene glycol monomethyl ether and ammonium fluoride. The present invention is also a process for removing photoresist and the residue of etching and ashing of electronic device substrates by contacting the substrate with a formulation, comprising: deionized water, acetic acid, polyethylene glycol, dipropylene glycol monomethyl ether and ammonium fluoride.
    Type: Application
    Filed: March 9, 2009
    Publication date: September 17, 2009
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Yi-Chia Lee, Wen Dar Liu, Archie Liao, Matthew I. Egbe, Madhukar Bhaskara Rao, Michael Walter Legenza, Chimin Sheu
  • Stripper For Dry Film Removal
    Publication number: 20090227483
    Abstract: The present invention, in a preferred embodiment, is a photoresist stripper formulation, comprising: Hydroxylamine ; Water; a solvent selected from the group consisting of dimethylsulfoxide; N-methylpyrrrolidine; dimethylacetamide; dipropylene glycol monomethyl ether; monoethanolamine and mixtures thereof; a base selected from the group consisting of choline hydroxide, monoethanolamine, tetramethylammonium hydroxide; aminoethylethanolamine and mixtures thereof; a metal corrosion inhibitor selected from the group consisting of catechol, gallic acid, lactic acid, benzotriazole and mixtures thereof; and a bath life extending agent selected from the group consisting of glycerine, propylene glycol and mixtures thereof. The present invention is also a method for using formulations as exemplified in the preferred embodiment.
    Type: Application
    Filed: February 27, 2009
    Publication date: September 10, 2009
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Wen Dar Liu, Yi Chia Lee, Archie Liao, Madhukar Bhaskara Rao, Matthew I. Egbe, Chimin Sheu, Michael Walter Legenza