Patents by Inventor Chin-Chen Kuo
Chin-Chen Kuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11972562Abstract: A method for determining a plant growth curve includes obtaining color images and depth images of a plant to be detected at different time points, performing alignment processing on each color image and each depth image to obtain an alignment image, detecting the color image through a pre-trained target detection model to obtain a target bounding box, calculating an area ratio of the target bounding box in the color image, determining a depth value of all pixel points in the target boundary frame according to the aligned image, performing denoising processing on each depth value to obtain a target depth value, generating a first growth curve of the plant to be detected according to the target depth values and corresponding time points, and generating a second growth curve of the plant to be detected according to the area ratios and the corresponding time points.Type: GrantFiled: January 7, 2022Date of Patent: April 30, 2024Assignee: HON HAI PRECISION INDUSTRY CO., LTD.Inventors: Chih-Te Lu, Chin-Pin Kuo, Tzu-Chen Lin
-
Patent number: 11974479Abstract: An electrical connection structure is provided. The electrical connection structure includes a through hole, a first pad, a second pad and a conductive bridge. The through hole has a first end and a second end. The first pad at least partially surrounds the first end of the through hole and is electrically connected to a first circuit. The second pad is located at the second end of the through hole and is electrically connected to a second circuit. The conductive bridge is connected to the first pad and second pad through the through hole, thereby making the first and second circuits electrically connected to each other.Type: GrantFiled: December 11, 2020Date of Patent: April 30, 2024Assignee: INNOLUX CORPORATIONInventors: Shun-Yuan Hu, Chin-Lung Ting, Li-Wei Mao, Ming-Chun Tseng, Kung-Chen Kuo, Yi-Hua Hsu, Ker-Yih Kao
-
Patent number: 11954875Abstract: A method for determining a height of a plant, an electronic device, and a storage medium are disclosed. In the method, a target image is obtained by mapping an obtained color image with an obtained depth image. The electronic device processes the color image by using a pre-trained mobilenet-ssd network, obtains a detection box appearance of the plant, and extracts target contours of the plant to be detected from the detection box. The electronic device determines a depth value of each of pixel points in the target contour according to the target image. Target depth values are obtained by performing a de-noising on depth values of the pixel points, and a height of the plant to be detected is determined according to the target depth value. The method improves accuracy of height determination of a plant.Type: GrantFiled: January 10, 2022Date of Patent: April 9, 2024Assignee: HON HAI PRECISION INDUSTRY CO., LTD.Inventors: Tzu-Chen Lin, Chih-Te Lu, Chin-Pin Kuo
-
Patent number: 11397377Abstract: A bracket includes a bracket body and an imaging module. The imaging module includes a first light source, a first pattern plate, a second light source, a second pattern plate and an imaging screen. The first light source projects a first illumination light. The first pattern plate having a first transmissive pattern is located on an optical path of the first illumination light, such that the first illumination light passing through the first transmissive pattern becomes a first pattern light. The second light source projects a second illumination light. The second pattern plate having a second transmissive pattern is located on an optical path of the second illumination light, such that the second illumination light passing through the second transmissive pattern becomes a second pattern light. The imaging screen receives the projection of the first and second pattern light.Type: GrantFiled: March 26, 2021Date of Patent: July 26, 2022Assignee: Qisda CorporationInventors: Shin-Hao Wu, Chin-Chen Kuo, Hsin-Hung Lin, Han-Kuang Ho
-
Publication number: 20210302814Abstract: A bracket includes a bracket body and an imaging module. The imaging module includes a first light source, a first pattern plate, a second light source, a second pattern plate and an imaging screen. The first light source projects a first illumination light. The first pattern plate having a first transmissive pattern is located on an optical path of the first illumination light, such that the first illumination light passing through the first transmissive pattern becomes a first pattern light. The second light source projects a second illumination light. The second pattern plate having a second transmissive pattern is located on an optical path of the second illumination light, such that the second illumination light passing through the second transmissive pattern becomes a second pattern light. The imaging screen receives the projection of the first and second pattern light.Type: ApplicationFiled: March 26, 2021Publication date: September 30, 2021Applicant: Qisda CorporationInventors: Shin-Hao WU, Chin-Chen KUO, Hsin-Hung LIN, Han-Kuang HO
-
Publication number: 20200118481Abstract: An imaging module includes abase, a light source, a light shielding member and a light transmissive member. The light source is disposed in the base. The light shielding member is connected to the base and includes a light transmissive region. The light transmissive member is selectively connected to one of the base and the light shielding member. The light source emits a light towards the light shielding member. The light passes through the light transmissive region and is projected to the light transmissive member, such that the light forms a light pattern corresponding to the light transmissive region through the light transmissive member.Type: ApplicationFiled: January 29, 2019Publication date: April 16, 2020Inventors: Chun-Yi Yen, Chin-Chen Kuo, Shin-Hao Wu
-
Publication number: 20190279871Abstract: A method of enhancing generation efficiency of patterned optical coating is disclosed. When an exposure and development process is performed after a photoresist process on the silicon wafer, a dummy pattern is formed on a scribe line around a chip as a sacrificial layer. After an optical coating process is completed, the dummy pattern from the photoresist to be removed can be selected as the starting point of a photoresist lift-off process, such that the photoresist removal can be more efficient and accurate, and the generation efficiency of patterned optical coating is enhanced.Type: ApplicationFiled: March 9, 2018Publication date: September 12, 2019Inventors: Wei-Kuo CHENG, Chin-Chen KUO, Tsung-Hsiu WU, Yun-Hui TAI, Cheng-Hung CHEN
-
Publication number: 20190011617Abstract: A multi-functional hybrid filter comprises a transparent substrate having a hybrid light filtering portion and an infrared light filtering portion; wherein, said hybrid light filtering portion is constructed by an infrared light absorbing material layer and a reflective interference type infrared cut filtering layer (IRCF) formed on the surface of said transparent substrate.Type: ApplicationFiled: July 10, 2017Publication date: January 10, 2019Inventors: Wei-Kuo CHENG, Chin-Chen KUO, Tsung-Hsiu WU
-
Publication number: 20170023214Abstract: Disclosed is a composite multi-layer circuit board and the manufacturing method thereof, on which at least two sets of circuits are formed on a ceramic substrate for supplying power to two groups of different color temperature LEDs respectively; specifically, the two sets of circuits are intertwined with each other, so that the first color temperature LED and the second color temperature LED are disposed adjacently. Also, one of the circuits is embedded in the surface of the ceramic substrate.Type: ApplicationFiled: July 23, 2015Publication date: January 26, 2017Inventors: Wei-Kuo CHENG, Chin-Chen KUO, Sheng-Wei WANG
-
Patent number: 8129762Abstract: A method is provided for processing a substrate. The substrate has at least one filter region, a plurality of bond pads, and a plurality of scribe lines arranged around the filter region and bond pads. A first planarization layer is formed above the substrate. The planarization layer has a substantially flat top surface overlying the filter region, the bond pads and the scribe lines. At least one color resist layer is formed over the first planarization layer and within the filter region while the first planarization layer covers the bond pads and the scribe lines.Type: GrantFiled: December 31, 2008Date of Patent: March 6, 2012Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Fu-Tien Weng, Yu-Kung Hsiao, Hung-Jen Hsu, Yi-Ming Dai, Chin Chen Kuo, Te-Fu Tseng, Chih-Kung Chang, Jack Deng, Chung-Sheng Hsiung, Bii-Junq Chang
-
Patent number: 7812302Abstract: The present invention provides an image sensor which comprises improved microlenses to cope with different optical requirements for oblique incident light or different components of light. In one embodiment, the image sensor comprises at least two microlenses having different radii of curvature. In another embodiment, the image sensor comprises at least one asymmetrical microlens.Type: GrantFiled: October 17, 2008Date of Patent: October 12, 2010Assignee: VisEra Technologies Company LimitedInventors: Chin-Chen Kuo, Wu-Chieh Liu, Hsiao-Wen Lee, Bii-Cheng Chang
-
Publication number: 20090104547Abstract: A method is provided for processing a substrate. The substrate has at least one filter region, a plurality of bond pads, and a plurality of scribe lines arranged around the filter region and bond pads. A first planarization layer is formed above the substrate. The planarization layer has a substantially flat top surface overlying the filter region, the bond pads and the scribe lines. At least one color resist layer is formed over the first planarization layer and within the filter region while the first planarization layer covers the bond pads and the scribe lines.Type: ApplicationFiled: December 31, 2008Publication date: April 23, 2009Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Fu-Tien Weng, Yu-Kung Hsiao, Hung-Jen Hsu, Yi-Ming Dai, Chin Chen Kuo, Te-Fu Tseng, Chih-Kung Chang, Jack Deng, Chung-Sheng Hsiung, Bii-Junq Chang
-
Publication number: 20090078855Abstract: The present invention provides an image sensor which comprises improved microlenses to cope with different optical requirements for oblique incident light or different components of light. In one embodiment, the image sensor comprises at least two microlenses having different radii of curvature. In another embodiment, the image sensor comprises at least one asymmetrical microlens.Type: ApplicationFiled: October 17, 2008Publication date: March 26, 2009Inventors: Chin-Chen Kuo, Wu-Chieh Liu, Hsiao-Wen Lee, Bii-Cheng Chang
-
Patent number: 7507598Abstract: A method is provided for processing a substrate. The substrate has at least one filter region, a plurality of bond pads, and a plurality of scribe lines arranged around the filter region and bond pads. A first planarization layer is formed above the substrate. The planarization layer has a substantially flat top surface overlying the filter region, the bond pads and the scribe lines. At least one color resist layer is formed over the first planarization layer and within the filter region while the first planarization layer covers the bond pads and the scribe lines.Type: GrantFiled: June 20, 2005Date of Patent: March 24, 2009Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Fu-Tien Weng, Yu-Kung Hsiao, Hung-Jen Hsu, Yi-Ming Dai, Chin Chen Kuo, Te-Fu Tseng, Chih-Kung Chang, Jack Deng, Chung-Sheng Hsiung, Bii-Junq Chang
-
Patent number: 7505206Abstract: A method of manufacturing a microlens device by depositing a microlens material layer over a substrate that includes photo-sensors. The microlens material layer is then exposed and developed to define microlens material elements, including first microlens material elements and second microlens material elements. Each second microlens material element is substantially greater in thickness relative to each first microlens material element. The microlens material elements are then heated to form a microlens array that includes first microlens array elements, each corresponding to a first microlens material element, and second microlens array elements, each corresponding to a second microlens material element. Each first microlens array element has a substantially greater focal length relative to each second microlens array element. For example, each second microlens array element is substantially greater in thickness relative to each first microlens array element.Type: GrantFiled: July 10, 2006Date of Patent: March 17, 2009Assignee: Taiwan Semiconductor Manufacturing CompanyInventors: Jack Deng, Chih-Kung Chang, Chin Chen Kuo, Ming-Chang Kao, Fu-Tien Weng, Bii-Junq Chang
-
Patent number: 7372497Abstract: An image sensor device and method for forming said device are described. The image sensor structure comprises a substrate with photodiodes, an interconnect structure formed on the substrate, a color filter layer above the interconnect structure, a first microlens array, an overcoat layer, and a second microlens array. A key feature is that a second microlens has a larger radius of curvature than a first microlens. Additionally, each first microlens and second microlens is a flat convex lens. Thus, a thicker second microlens with a short focal length is aligned above a thinner first microlens having a long focal length. A light column that includes a first microlens, a second microlens and a color filter region is formed above each photodiode. A second embodiment involves replacing a second microlens in each light column with a plurality of smaller second microlenses that focus light onto a first microlens.Type: GrantFiled: April 28, 2004Date of Patent: May 13, 2008Assignee: Taiwan Semiconductor Manufacturing CompanyInventors: Fu-Tien Weng, Yu-Kung Hsiao, Chin-Kung Chang, Hung-Jen Hsu, Yi-Ming Dai, Chin-Chen Kuo
-
Publication number: 20080011936Abstract: The present invention provides an image sensor which comprises improved microlenses to cope with different optical requirements for oblique incident light or different components of light. In one embodiment, the image sensor comprises at least two microlenses having different radii of curvature. In another embodiment, the image sensor comprises at least one asymmetrical microlens.Type: ApplicationFiled: July 14, 2006Publication date: January 17, 2008Inventors: Chin-Chen Kuo, Wu-Chieh Liu, Hsiao-Wen Lee, Bii-Cheng Chang
-
Publication number: 20080007839Abstract: A method of manufacturing a microlens device by depositing a microlens material layer over a substrate that includes photo-sensors. The microlens material layer is then exposed and developed to define microlens material elements, including first microlens material elements and second microlens material elements. Each second microlens material element is substantially greater in thickness relative to each first microlens material element. The microlens material elements are then heated to form a microlens array that includes first microlens array elements, each corresponding to a first microlens material element, and second microlens array elements, each corresponding to a second microlens material element. Each first microlens array element has a substantially greater focal length relative to each second microlens array element. For example, each second microlens array element is substantially greater in thickness relative to each first microlens array element.Type: ApplicationFiled: July 10, 2006Publication date: January 10, 2008Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Jack DENG, Chih-Kung CHANG, Chin Chen KUO, M. C. KAO, Fu-Tien WENG, Bii-Junq CHANG
-
Patent number: 7264976Abstract: A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of patterned photoresist features each disposed within one of the plurality of openings. The plurality of patterned photoresist features can then be reflowed inside the grid.Type: GrantFiled: February 23, 2005Date of Patent: September 4, 2007Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Jack Deng, Chin Chen Kuo, Fu-Tien Weng, Chih-Kung Chang, Bii-Junq Chang
-
Publication number: 20060206631Abstract: A data duplication method and system used between USB devices is exploited to control data transmission between a source USB device and at least a target USB device without any assistance from a computer. The duplication system comprises at least a serial interface engine circuit, a CPU, and a data buffer unit. The CPU is connected to the source USB device and these target USB devices via these serial interface engine circuits. The CPU controls these serial interface engine circuits to transmit digital data in the source USB device to these target USB devices. The data buffer unit is connected to these serial interface engine circuits and the CPU, and is used to provide memory buffer space required during the digital data duplication process.Type: ApplicationFiled: March 9, 2005Publication date: September 14, 2006Inventors: Chin-Chen Kuo, Fok-Kei Loo