Abstract: A mapping method is provided. The environment is scanned to obtain depth information of environmental obstacles. The image of the environment is captured to generate an image plane. The depth information of environmental obstacles is projected onto the image plane, so as to obtain projection positions. At least one feature vector is calculated from a predetermined range around each projection position. The environmental obstacle depth information and the environmental feature vector are merged to generate a sub-map at a certain time point. Sub-maps at all time points are combined to generate a map. In addition, a localization method using the map is also provided.

Abstract: A positioning system and a method thereof are provided. In the positioning method, a first and a second pose information of a moving device are obtained by a first positioning device and a second positioning device respectively, wherein the first pose information corresponds to the second pose information. In addition, a plurality of first candidacy pose information is generated in an error range of the first pose information. Furthermore, a plurality of second candidacy pose information is generated according to the first pose information respectively. One of the second candidacy pose information having a smallest error derived from the second pose information is selected for updating the pose information of the first positioning device and parameter information of the second positioning device. Thereby, pose information of the moving device is updated and parameter information of the second orientation devices is calibrated simultaneously.

Abstract: A mapping method is provided. The environment is scanned to obtain depth information of environmental obstacles. The image of the environment is captured to generate an image plane. The depth information of environmental obstacles is projected onto the image plane, so as to obtain projection positions. At least one feature vector is calculated from a predetermined range around each projection position. The environmental obstacle depth information and the environmental feature vector are merged to generate a sub-map at a certain time point. Sub-maps at all time points are combined to generate a map. In addition, a localization method using the map is also provided.

Abstract: A camera with dynamic calibration and a method thereof is provided. The camera is first subject to an initial calibration. Then, a motion amount of the camera is calculated, and a plurality of motion amount estimation samples of the camera is generated according to the motion amount. Then, a weight of each of the motion amount estimation samples is calculated. Thereafter, the plurality of motion amount estimation samples is re-sampled based on the weights, and the camera is calibrated by the re-sampled estimated motion samples.

Abstract: A positioning system and a method thereof are provided. In the positioning method, a first and a second pose information of a moving device are obtained by a first positioning device and a second positioning device respectively, wherein the first pose information corresponds to the second pose information. In addition, a plurality of first candidacy pose information is generated in an error range of the first pose information. Furthermore, a plurality of second candidacy pose information is generated according to the first pose information respectively. One of the second candidacy pose information having a smallest error derived from the second pose information is selected for updating the pose information of the first positioning device and parameter information of the second positioning device. Thereby, pose information of the moving device is updated and parameter information of the second orientation devices is calibrated simultaneously.

Abstract: A method for fabricating a metal-insulator-metal capacitor is described. A first metal layer is formed on a substrate. A plasma treatment is performed on the surface of the first metal layer. Then, a first oxide layer, a nitride layer and a second oxide layer are formed in sequence over the first metal layer. Thereafter, a second metal layer is formed on the second oxide layer. The second metal layer, the second oxide layer, the nitride layer, the first oxide layer and the first metal layer are defined to form the metal-insulator-metal capacitor.

Abstract: A method for fabricating a metal-insulator-metal capacitor is described. A first metal layer is formed on a substrate. A plasma treatment is performed on the surface of the first metal layer. Then, a first oxide layer, a nitride layer and a second oxide layer are formed in sequence over the first metal layer. Thereafter, a second metal layer is formed on the second oxide layer. The second metal layer, the second oxide layer, the nitride layer, the first oxide layer and the first metal layer are defined to form the metal-insulator-metal capacitor.

Abstract: A method for fabricating a metal-insulator-metal capacitor is described. A first metal layer is formed on a substrate. A plasma treatment is performed on the surface of the first metal layer. Then, a first oxide layer, a nitride layer and a second oxide layer are formed in sequence over the first metal layer. Thereafter, a second metal layer is formed on the second oxide layer. The second metal layer, the second oxide layer, the nitride layer, the first oxide layer and the first metal layer are defined to form the metal-insulator-metal capacitor.