Patents by Inventor Chin-Chiang Tu

Chin-Chiang Tu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming multiple layer attenuating phase shifting masks
    Patent number: 5897979
    Abstract: This invention describes a new method of forming a double layer attenuating phase shifting mask. A first pattern is formed in a layer of attenuating phase shifting material and an alignment pattern is formed in a layer of opaque material. A first resist is used to form the first pattern. A pellicle is used to restrict the deposition of a second resist to the alignment region of the mask only and as a result neither the first resist nor the second resist must withstand dry etching steps. The first resist is removed before the step of forming the first pattern in the attenuating phase shifting material and cleaning before is step is carried out is thereby improved.
    Type: Grant
    Filed: March 2, 1998
    Date of Patent: April 27, 1999
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: San-De Tzu, Jia-Jing Wang, Chin-Chiang Tu, Wen-Hong Huang