Patents by Inventor Chin Hsian Lin

Chin Hsian Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for processing masks with oblique features
    Patent number: 7314689
    Abstract: A method and system is disclosed for processing one or more oblique features on a mask or reticle substrate. After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed on the mask or reticle substrate with regard to either the horizontal or vertical reference direction of the predetermined reference system is determined. The mask or reticle substrate is rotated in a predetermined direction by the offset angle; and the feature on the mask or reticle substrate is processed using the predetermined reference system wherein the feature is processed in either the horizontal or vertical reference direction thereof.
    Type: Grant
    Filed: January 27, 2004
    Date of Patent: January 1, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Burn Jeng Lin, Ping Yang, Hong Chang Hsieh, Yao Ching Ku, Chin Hsian Lin, Chiu Shan Yoo