Abstract: A polishing head for a chemical-mechanical polishing system includes a carrier head, at least one electromagnetism actuated pressure sector and a membrane. The electromagnetism actuated pressure sector is disposed on the carrier head. The membrane covers the electromagnetism actuated pressure sector.

Abstract: In some implementations, power provided to a computing system, such as a rack system, may be interrupted. This interruption is detected, and in response, power from a battery backup system is directed to the computing system to replace the interrupted power source, which in some implementations may be a main AC power grid source. A signal is received indicating that a backup power source, for example a backup generator system, is online and prepared to deliver power to the computing system. For an initial period of time, this backup power source is prevented from providing power to the computing system. For example, the backup generator system may be providing power to a power supply unit of the computing system, but the power is not allowed to flow to the computing system.

Abstract: A rack server system including at least one server and a battery backup unit (BBU) is provided. A power supplier is coupled to the server for converting an input voltage into a first output voltage when the input voltage is normal and for providing the first output voltage to the server. The BBU is coupled to the server and the power supplier for detecting the first output voltage outputted from the power supplier and for providing a second output voltage to the server when the input voltage and/or the first output voltage are abnormal.

Abstract: A platen assembly includes a platen body, a polishing pad, and a fountain slurry supplier. The platen body has an upper surface. The polishing pad is disposed on the upper surface of the platen body. The fountain slurry supplier is at least partially disposed on the upper surface of the platen body for supplying slurry up onto the polishing pad.

Abstract: A polishing head for a chemical-mechanical polishing system includes a carrier head, at least one electromagnetism actuated pressure sector and a membrane. The electromagnetism actuated pressure sector is disposed on the carrier head. The membrane covers the electromagnetism actuated pressure sector.

Abstract: A rack server system and an operating method applicable thereto are provided. The rack server system includes a battery backup unit (BBU) and at least one server. The operating method includes: communicating the server and the BBU with each other; the BBU providing a status information and a previous self-discharging test information to the server for the server to judge a status of the BBU; and providing power from the BBU to the server and adjusting a loading of the server according to the status information of the BBU when an input power is interrupted.

Abstract: A rack server system and an operating method applicable thereto are provided. The rack server system includes a battery backup unit (BBU) and at least one server. The operating method includes: communicating the server and the BBU with each other; the BBU providing a status information and a previous self-discharging test information to the server for the server to judge a status of the BBU; and providing power from the BBU to the server and adjusting a loading of the server according to the status information of the BBU when an input power is interrupted.

Abstract: A rack server system and an operating method applicable thereto are provided. The rack server system includes a battery backup unit (BBU) and at least one server. The operating method includes: communicating the server and the BBU with each other; the BBU providing a status information and a previous self-discharging test information to the server for the server to judge a status of the BBU; and providing power from the BBU to the server and adjusting a loading of the server according to the status information of the BBU when an input power is interrupted.

Abstract: A rack server system including at least one server and a battery backup unit (BBU) is provided. A power supplier is coupled to the server for converting an input voltage into a first output voltage when the input voltage is normal and for providing the first output voltage to the server. The BBU is coupled to the server and the power supplier for detecting the first output voltage outputted from the power supplier and for providing a second output voltage to the server when the input voltage and/or the first output voltage are abnormal.

Abstract: A rack server system and a control method thereof are provided. The rack server system establishes a communication link for communicating with a battery backup unit. The battery backup unit is connected to a power input port of the rack server system, and includes a number of battery modules connected with each other in parallel. The rack server system controls the battery backup unit to perform validity test on a first battery module during a first period and to perform validity test on a second battery module during a second period, wherein the first period and the second period are not overlapped with each other.