Patents by Inventor Chin-Hsing SU

Chin-Hsing SU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas-supply system and method
    Patent number: 9632516
    Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.
    Type: Grant
    Filed: March 11, 2014
    Date of Patent: April 25, 2017
    Assignee: TAWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Yung-Long Chen, Chun-Feng Hsu, Heng-Yi Tseng, Chieh-Jan Huang, Chin-Hsing Su, Yung-Ching Chen
  • GAS-SUPPLY SYSTEM AND METHOD
    Publication number: 20150177745
    Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.
    Type: Application
    Filed: March 11, 2014
    Publication date: June 25, 2015
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Yung-Long CHEN, Chun-Feng HSU, Heng-Yi TSENG, Chieh-Jan HUANG, Chin-Hsing SU, Yung-Ching CHEN