Patents by Inventor Chin-Piao Weng

Chin-Piao Weng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of making hidden patterns and characters
    Publication number: 20040263912
    Abstract: The present invention is to disclose a method of hidden patterns and characters, which comprises the following steps of: 1. finishing an original document after a printing design is formed; 2. transforming the original document into a digital document; and 3. performing an anti-counterfeiting treatment to the digital document; 3-1. single-selecting a color plate from a design pattern file of the digital document; 3-2. forming a filter file of the digital document; 3-3. performing a graphic arts lining treatment, which comprises: aligning and overlapping the filter file and the selected color plate and transforming a pattern of the color plate with a darkness/lightness ratio into a linear filling pattern with a corresponding thickness/thinness ratio; and 3-4.
    Type: Application
    Filed: June 16, 2004
    Publication date: December 30, 2004
    Applicant: Cheng May Enterprise Co., Ltd.
    Inventor: Chin-Piao Weng