Patents by Inventor CHIN-TI KO

CHIN-TI KO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Detection of defects on wafer during semiconductor fabrication
    Patent number: 9466101
    Abstract: Among other things, systems and techniques are provided for detecting defects on a wafer based upon non-correctable error data yielded from a scan of the wafer to determine a topology of the wafer. The non-correctable error data is reconstructed to generate a non-correctable error image map, which is transformed to generate a projection. In some embodiments, the non-correctable error image map is transformed via a feature extraction transform such as a Hough transform or a Radon transform. In some embodiments, the projection is compared to a set of rules to identify a signature in the non-correctable error image map indicative of a defect.
    Type: Grant
    Filed: July 25, 2013
    Date of Patent: October 11, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    Inventors: Chun-Hsien Lin, Liu Bo-Tsun, Chin-Ti Ko, Wu Cheng-Hung, Kuo-Hung Chao, Peng Jui-Chun, Fei-Gwo Tsai, Heng-Hsin Liu, Jong-I Mou
  • DETECTION OF DEFECTS ON WAFER DURING SEMICONDUCTOR FABRICATION
    Publication number: 20140328534
    Abstract: Among other things, systems and techniques are provided for detecting defects on a wafer based upon non-correctable error data yielded from a scan of the wafer to determine a topology of the wafer. The non-correctable error data is reconstructed to generate a non-correctable error image map, which is transformed to generate a projection. In some embodiments, the non-correctable error image map is transformed via a feature extraction transform such as a Hough transform or a Radon transform. In some embodiments, the projection is compared to a set of rules to identify a signature in the non-correctable error image map indicative of a defect.
    Type: Application
    Filed: July 25, 2013
    Publication date: November 6, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    Inventors: CHUN-HSIEN LIN, LIU BO-TSUN, CHIN-TI KO, WU CHENG-HUNG, KUO-HUNG CHAO, PENG JUI-CHUN, FEI-GWO TSAI, HENG-HSIN LIU, JONG-I MOU