Abstract: A burglarproof security system includes a substrate, a conducting wire layer, a sensing control unit, an alarm device and a power supply. The conducting wire layer is disposed on the substrate, and includes plural conducting wires. The plural conducting wires collectively define either a resistive sensing circuit or a capacitive sensing circuit. The sensing control unit is electrically connected with the plural conducting wires of the conducting wire layer for controlling and selectively switching the plural conducting wires to define either the resistive sensing circuit or the capacitive sensing circuit, and detecting the resistive sensing circuit or the capacitive sensing circuit, thereby generating a detecting signal. When the detecting signal from the sensing control unit is received by the alarm device, the alarm device generates a warning signal. The power supply is electrically connected with the sensing control unit and the alarm device for providing electric power.

Abstract: A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.

Abstract: A new sequence and chemical composition for cleaning the surface of a halftone shift masks that use MoSiON as shifter material is provided. For purposes of repair or rework, the pellicle is removed from the mask so that the mask can be accessed. After the rework or repair has been completed, a new clean process is performed, for the new clean process the sequence of steps that is conventionally performed has been modified. After the new clean process has been completed, the pellicle is reinstalled over the surface of the mask.

Abstract: A method for repairing a defective photomask having contained therein a minimum of one defect first provides forming a masking layer upon the defective photomask such as to leave exposed the minimum of one defect. Within the invention the minimum of one defect within the defective photomask may be repaired while employing the masking layer as a defect repair masking layer, to thus form a repaired photomask from the defective photomask. The method provides for efficient repairing of the defective photomask, absent transparent substrate damage.