Patents by Inventor CHIN-WEI YANG
CHIN-WEI YANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11942398Abstract: A semiconductor device includes a substrate, at least one via, a liner layer and a conductive layer. The substrate includes an electronic circuitry. The at least one via passes through the substrate. The at least one via includes a plurality of concave portions on a sidewall thereof. The liner layer fills in the plurality of concave portions of the at least one via. The conductive layer is disposed on the sidewall of the at least one via, covers the liner layer, and extends onto a surface of the substrate. The thickness of the conductive layer on the sidewall of the at least one via is varied.Type: GrantFiled: August 30, 2021Date of Patent: March 26, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ting-Li Yang, Wen-Hsiung Lu, Jhao-Yi Wang, Fu Wei Liu, Chin-Yu Ku
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Publication number: 20240083742Abstract: A micro electro mechanical system (MEMS) includes a circuit substrate comprising electronic circuitry, a support substrate having a recess, a bonding layer disposed between the circuit substrate and the support substrate, through holes passing through the circuit substrate to the recess, a first conductive layer disposed on a front side of the circuit substrate, and a second conductive layer disposed on an inner wall of the recess. The first conductive layer extends into the through holes and the second conductive layer extends into the through holes and coupled to the first conductive layer.Type: ApplicationFiled: November 15, 2023Publication date: March 14, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ting-Li YANG, Kai-Di WU, Ming-Da CHENG, Wen-Hsiung LU, Cheng Jen LIN, Chin Wei KANG
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Patent number: 11922724Abstract: A device and a method and a non-transitory readable storage medium, for face recognition are provided, the method comprise: extracting a face sample image from a predetermined face sample library and performing feature point detection to obtain multiple face feature points; obtaining multiple mask images; selecting first to fourth face feature points from the multiple face feature points; defining a distance between the first and second face feature point as a mask image height, and defining a distance between the third and fourth face feature point as a mask image width; adjusting a size of each mask image according to the mask image height and the mask image width; fusing each adjusted mask image with the face sample image to obtain multiple face mask images to save into the predetermined face sample library; training a face recognition model based on the predetermined face sample library for face recognition.Type: GrantFiled: October 12, 2020Date of Patent: March 5, 2024Assignee: HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD.Inventor: Chin-Wei Yang
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Publication number: 20240071822Abstract: A method for manufacturing a semiconductor structure includes forming a first interconnect feature in a first dielectric feature, the first interconnect feature including a first conductive element exposed from the first dielectric feature; forming a first cap feature over the first conductive element, the first cap feature including a first cap element which includes a two-dimensional material; forming a second dielectric feature with a first opening that exposes the first cap element; forming a barrier layer over the second dielectric feature while exposing the first cap element from the barrier layer; removing a portion of the first cap element exposed from the barrier layer; and forming a second conductive element in the first opening.Type: ApplicationFiled: August 31, 2022Publication date: February 29, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chin-Lung CHUNG, Shin-Yi YANG, Yu-Chen CHAN, Han-Tang HUNG, Shu-Wei LI, Ming-Han LEE
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Publication number: 20220327861Abstract: A method for recognizing masked faces includes: obtaining a face image to be recognized; detecting whether the face image to be recognized has a mask; extracting feature vectors of a whole face in the face image to be recognized when the face image to be recognized does not have a mask; comparing the feature vectors of the whole face with face images in a first database, and outputting a face recognition result; extracting feature vectors of an upper half face in the face image to be recognized when the face image to be recognized has a mask; comparing the feature vectors of the upper half face with face images in a second database, and outputting the face recognition result. The method of the present disclosure processes images of faces with and without masks, expanding application scenario of face recognition and improving the accuracy of recognition.Type: ApplicationFiled: December 20, 2021Publication date: October 13, 2022Inventor: CHIN-WEI YANG
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Publication number: 20220327862Abstract: A method for detecting whether a face is masked includes acquiring a face image to be recognized; performing face detection on the face image to be recognized to determine a first face area; preprocessing the first face area to obtain a first square face image; performing face recognition on the first square face image using a face recognition model and outputting a result of recognition or non-recognition. The method of the present disclosure obtains a square face area by preprocessing face detection results, optimizing the process flow of masked-face recognition, and improves the accuracy of recognition.Type: ApplicationFiled: December 20, 2021Publication date: October 13, 2022Inventor: CHIN-WEI YANG
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Publication number: 20220327864Abstract: A device and a method and a non-transitory readable storage medium, for face recognition are provided, the method comprise: extracting a face sample image from a predetermined face sample library and performing feature point detection to obtain multiple face feature points; obtaining multiple mask images; selecting first to fourth face feature points from the multiple face feature points; defining a distance between the first and second face feature point as a mask image height, and defining a distance between the third and fourth face feature point as a mask image width; adjusting a size of each mask image according to the mask image height and the mask image width; fusing each adjusted mask image with the face sample image to obtain multiple face mask images to save into the predetermined face sample library; training a face recognition model based on the predetermined face sample library for face recognition.Type: ApplicationFiled: October 12, 2020Publication date: October 13, 2022Inventor: CHIN-WEI YANG
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Patent number: 11036971Abstract: A method for recognizing, identifying, and authenticating persons to be identified from their faces in a preset scenario, includes uploading a first image of users to a server, and receiving the first image on which first facial rectangles and user information have been imposed, and capturing a second image and detecting second facial rectangles therefrom. The method determines whether a number of faces of the second image is equal to a number of faces of the first image, and uploading the second image to the server for identifying third facial rectangles of the second image. A plurality of distances is obtained by calculating at least one distance between third and second facial rectangles of each user shown in the second image and determining whether the users shown in the second image are the same as users shown in the first image based on the plurality of distances.Type: GrantFiled: October 11, 2019Date of Patent: June 15, 2021Assignees: HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD., HON HAI PRECISION INDUSTRY CO., LTD.Inventor: Chin-Wei Yang
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Patent number: 10915739Abstract: A face recognition method applied to establish authentic or artificial faces before searching for a person match in a database includes establishing a deep network model, obtaining training data and training the deep network model using the training data. An original image of a human face and a depth image corresponding to the original image are obtained, and authenticity or artificiality is determined by preset methods including use of cosine similarity algorithm. Matching an original image determined as authentic against face images pre-stored in an image database and outputting any match, when the original image is the image of a real person. A face recognition device is also provided.Type: GrantFiled: April 11, 2019Date of Patent: February 9, 2021Assignees: HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD., HON HAI PRECISION INDUSTRY CO., LTD.Inventor: Chin-Wei Yang
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Publication number: 20200387694Abstract: A method for recognizing, identifying, and authenticating persons to be identified from their faces in a preset scenario, includes uploading a first image of users to a server, and receiving the first image on which first facial rectangles and user information have been imposed, and capturing a second image and detecting second facial rectangles therefrom. The method determines whether a number of faces of the second image is equal to a number of faces of the first image, and uploading the second image to the server for identifying third facial rectangles of the second image. A plurality of distances is obtained by calculating at least one distance between third and second facial rectangles of each user shown in the second image and determining whether the users shown in the second image are the same as users shown in the first image based on the plurality of distances.Type: ApplicationFiled: October 11, 2019Publication date: December 10, 2020Inventor: CHIN-WEI YANG
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Publication number: 20200210687Abstract: A face recognition method applied to establish authentic or artificial faces before searching for a person match in a database includes establishing a deep network model, obtaining training data and training the deep network model using the training data. An original image of a human face and a depth image corresponding to the original image are obtained, and authenticity or artificiality is determined by preset methods including use of cosine similarity algorithm. Matching an original image determined as authentic against face images pre-stored in an image database and outputting any match, when the original image is the image of a real person. A face recognition device is also provided.Type: ApplicationFiled: April 11, 2019Publication date: July 2, 2020Inventor: CHIN-WEI YANG
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Patent number: 10083899Abstract: A method of forming a semiconductor device package includes providing a lead frame having a peripheral structure and a heat slug having an upper and lower surface, the heat slug being attached to the peripheral structure. A semiconductor die is attached to the heat slug. The semiconductor die is encapsulated with a molding compound while the heat slug is attached to the peripheral structure. The heat slug is completely devoid of fasteners before the encapsulating.Type: GrantFiled: January 23, 2017Date of Patent: September 25, 2018Assignee: Infineon Technologies AGInventors: Mohd Kahar Bajuri, Edmund Sales Cabatbat, Gaylord Evangelista Cruz, Amirul Afiq Hud, Teck Sim Lee, Norbert Joson Santos, Chiew Li Tai, Chin Wei Yang
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Publication number: 20180211907Abstract: A method of forming a semiconductor device package includes providing a lead frame having a peripheral structure and a heat slug having an upper and lower surface, the heat slug being attached to the peripheral structure. A semiconductor die is attached to the heat slug. The semiconductor die is encapsulated with a molding compound while the heat slug is attached to the peripheral structure. The heat slug is completely devoid of fasteners before the encapsulating.Type: ApplicationFiled: January 23, 2017Publication date: July 26, 2018Inventors: Mohd Kahar Bajuri, Edmund Sales Cabatbat, Gaylord Evangelista Cruz, Amirul Afiq Hud, Teck Sim Lee, Norbert Joson Santos, Chiew Li Tai, Chin Wei Yang
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Publication number: 20080124485Abstract: Method of successively depositing a multi-film is disclosed. An electric charge removing process is performed after a deposition process of the last film of the multi-film or between the two neighboring film deposition processes. The electric charge removing process includes introducing an inert gas into a reaction chamber of the deposition system and pumping out the inert gas from the reaction chamber.Type: ApplicationFiled: November 27, 2006Publication date: May 29, 2008Applicant: UNITED MICROELECTRONICS CORP.Inventors: CHAO-SHENG CHIANG, PING-WEI LIN, CHIN-WEI YANG