Abstract: A solar cell structure including a photovoltaic layer, an upper electrode, a lower electrode, and a passivation layer is provided. The photovoltaic layer has an upper surface, a lower surface and a plurality of side surfaces, wherein the photovoltaic layer includes a first type and a second type semiconductor layer. The upper electrode is disposed at the upper surface of the photovoltaic layer and electrically connected with the second type semiconductor layer, wherein the second type semiconductor layer is between the upper electrode and the first type semiconductor layer. The bottom electrode is disposed at the bottom surface of the photovoltaic layer and electrically connected with the first type semiconductor layer, wherein the first type semiconductor layer is between the bottom electrode and the second type semiconductor. The passivation layer covers at least one of the side surfaces so as to reduce the leakage current formed on the side surfaces.

Abstract: A method for manufacturing a thin-film solar cell including the follow processes is provided. First, a substrate is provided. Then, a first conductive layer is formed on the substrate. Afterward, a first photovoltaic layer is formed on the first conductive layer. Then, the first photovoltaic layer is processed by a stabilized process, so as to reduce the light induced degradation as the first photovoltaic layer is illuminated. The material of the first photovoltaic layer is an amorphous semiconductor material. Later, a second photovoltaic layer is formed on the first photovoltaic layer. Then, a second conductive layer is formed on the second photovoltaic layer. A thin-film solar cell is also provided.

Abstract: A solar cell including a substrate, a first conductive layer, a photovoltaic layer, a second conductive layer and at least one passivation layer is provided. The first conductive layer is disposed on the substrate. The photovoltaic layer generates electron-hole pairs after receiving light, wherein the photovoltaic layer is disposed on the first conductive layer and has a plurality of doped films. The second conductive layer is disposed on the photovoltaic layer. The passivation layer is disposed onto at least one of the positions between the first conductive layer and the photovoltaic layer, between the doped films within the photovoltaic layer, and between the photovoltaic layer and the second conductive layer, so as to reduce the chance for the electron-hole pairs resulting in recombination on at least one of the surfaces of the photovoltaic layer. A manufacturing method of the solar cell is also provided.

Abstract: A solar cell is provided, including a substrate, a first electrode, a second electrode, an n-type semiconductor layer and a p-type semiconductor layer. The first electrode is disposed on the substrate. The second electrode is disposed between the first electrode and the substrate. The n-type semiconductor layer is disposed between the first electrode and the second electrode. The material of the n-type semiconductor layer is microcrystalline silicon (?c-Si) or polysilicon. The p-type semiconductor layer is disposed between the first electrode and the n-type semiconductor layer.

Abstract: A thin film solar cell including a substrate, a first conductive layer, a photoelectric conversion layer, a second conductive layer and a passivation layer is provided. The first conductive layer disposed on the substrate has a plurality of first openings, so as to divide the first conductive layer into bottom electrodes of a plurality of photovoltaic elements. The photoelectric conversion layer disposed on the first conductive layer has a plurality of second openings. The second conductive layer is disposed on the photoelectric conversion layer and electrically connected to the first conductive layer through the second openings. The passivation layer is disposed on the sidewall of the photoelectric conversion layer, so that the second conductive layer in the second openings is electrically isolated from the photoelectric conversion layer. A manufacturing method of the thin film solar cell is also provided.

Abstract: A thin film solar cell including a substrate, a first conductive layer, a first photovoltaic layer, a second conductive layer and a crystallization layer is provided. The first conductive layer is disposed on the substrate. The first photovoltaic layer is disposed on the first conductive layer. The second conductive layer is disposed on the first photovoltaic layer. The crystallization layer is at least partially disposed between the first photovoltaic layer and the first conductive layer or between the first photovoltaic layer and the second conductive layer. A manufacturing method of the thin film solar cell is also provided.

Abstract: A thin film solar cell having an active area and a dead area is provided. The thin film solar cell includes a first substrate, a first conductive layer, an photovoltaic layer, a second conductive layer, a first passivation layer, and a second passivation layer. The first conducting layer, the photovoltaic layer, the second conductive layer, and the first passivation layer are respectively disposed on the first substrate, the first conductive layer, the photovoltaic layer, and the second conductive layer, and all of them are located in the active area. The second passivation layer is disposed on a peripheral of the photovoltaic layer and located in the dead area, so as to avoid the photovoltaic layer from contacting with moisture in air. A fabrication method of the thin film solar cell is also provided.

Abstract: This invention is a new type of GaInP/AlGaInP for a visible separate-confinement-heterostructure strained quantum well(SCH-S-QW) laser with passive wave guides in the cladding layers. By using this structure, we can significantly improve the transverse beam divergence with only a slight increase of the threshold current. With proper choice of parameters, the transverse beam divergence as narrow as 18.degree.. FWHM can be achieved while the threshold current only becomes 1.12 factor than the lasers without the passive waveguide structure. This type of structure has three advantages:(1) It increases the spectrum dissolution rate between the laser and its optic element to increase the efficiency in actual operation.(2) Smaller oval ratio makes the light beams appears circular, and avoids the problem of non-paralleled focusing in optical instruments. It also eliminates cumbersome non-paralleled focusing in traditional GaInP/AlGaInP, and is more cost efficient.

Abstract: The present invention is related to a high efficiency indium gallium phosphide NIP solar cell, wherein an intrinsic layer between a emitter layer and base layer can suppress the Zn memory effect and interdiffusion and also a higher doping concentration in n-type AlInP window layer can be attained and the lifetime of minority carriers also increase for improving the conversion efficiency, thus the present invention may be used in the superhigh efficiency tandom cell so as to be used in the space or in earth as an regenerated energy.