Patents by Inventor Chin-Yung Chang

Chin-Yung Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11943936
    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a first transistor, a first resistive random access memory (RRAM) resistor, and a second RRAM resistor. The first resistor includes a first resistive material layer, a first electrode shared by the second resistor, and a second electrode. The second resistor includes the first electrode, a second resistive material layer, and a third electrode. The first electrode is electrically coupled to the first transistor.
    Type: Grant
    Filed: August 12, 2021
    Date of Patent: March 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Yu-Der Chih, May-Be Chen, Yun-Sheng Chen, Jonathan Tsung-Yung Chang, Wen Zhang Lin, Chrong Jung Lin, Ya-Chin King, Chieh Lee, Wang-Yi Lee
  • Patent number: 11921164
    Abstract: A battery pack for an information handling system includes a battery cell configured to provide current to the information handling system, and a battery management unit including an output to the information handling system. The output provides a maximum continuous current (MCC) indication and a peak power (PP) indication. The battery management unit determines an amount of current that the battery cell provides to the information handling system and determines an optimum MCC value that the battery cell can provide to the information handling system. The battery management unit further provides a first value on the PP indication, the first value being greater than the optimum MCC value, sums the amount of current provided to the information handling system that is in excess of the optimum MCC value, determines that the sum is greater than a threshold, and provides a second value on the PP indication, the second value being less than the optimum MCC value.
    Type: Grant
    Filed: June 16, 2021
    Date of Patent: March 5, 2024
    Assignee: Dell Products L.P.
    Inventors: Wen-Yung Chang, Chin-Jui Liu, Chien-Hao Chiu
  • Publication number: 20140126865
    Abstract: A cable structure for underwater equipment is disclosed, which comprises a waterproof layer, a tension-resistant layer, a buoyant layer, and a communication thread. The tension-resistant layer is enveloped in the waterproof layer. The buoyant layer is enveloped in the tension-resistant layer. The communication thread is enveloped in the buoyant layer. In use, the waterproof layer can protect the communication thread from contacting with water. The tension-resistant layer can enhance the tensile strength of the cable structure, so that the cable structure can be protected from damages upon being pulled. The buoyant layer can provide buoyancy for the cable structure, so that the cable structure can avoid excessive cable being submerged in the water, so that entwining or entangling of the submerged cable section can be prevented. Accordingly, the present invention is a useful contrivance that can avoid cable entanglement and has a tension-resistant capability.
    Type: Application
    Filed: November 8, 2012
    Publication date: May 8, 2014
    Applicants: CHIENG MING INDUSTRIES CO., LTD., YOU-FENG COMPANY LIMITED
    Inventor: CHIN-YUNG CHANG
  • Patent number: 8455342
    Abstract: A mask ROM fabrication method which comprises steps: sequentially forming a gate dielectric layer and a first photoresist layer on a substrate; letting a light having a wavelength of 365 nm pass through a first phase shift mask to photolithographically form on the first photoresist layer a plurality of first trenches having a width of 243-365 nm; doping the substrate to form a plurality of embedded bit lines having a width of 243-365 nm; removing the first photoresist layer; sequentially forming a polysilicon layer and a second photoresist layer on the gate dielectric layer; and letting the light pass through a second phase shift mask to photolithographically form a plurality of polysilicon word lines on the polysilicon layer. Thereby is reduced the line width of mask ROM to 243-365 nm and decreased the area of mask ROM.
    Type: Grant
    Filed: October 17, 2011
    Date of Patent: June 4, 2013
    Assignees: Nyquest Technology Corporation Limited, Nuvoton Technology Corporation
    Inventors: Kuang-Chu Chen, Cheng Tao Chen, Chung-Lung Hsu, Chun-Yao Chiu, Chin-Yung Chang
  • Publication number: 20130095628
    Abstract: A mask ROM fabrication method which comprises steps: sequentially forming a gate dielectric layer and a first photoresist layer on a substrate; letting a light having a wavelength of 365 nm pass through a first phase shift mask to photolithographically form on the first photoresist layer a plurality of first trenches having a width of 243-365 nm; doping the substrate to form a plurality of embedded bit lines having a width of 243-365 nm; removing the first photoresist layer; sequentially forming a polysilicon layer and a second photoresist layer on the gate dielectric layer; and letting the light pass through a second phase shift mask to photolithographically form a plurality of polysilicon word lines on the polysilicon layer. Thereby is reduced the line width of mask ROM to 243-365 nm and decreased the area of mask ROM.
    Type: Application
    Filed: October 17, 2011
    Publication date: April 18, 2013
    Inventors: Kuang-Chu Chen, Cheng Tao Chen, Chung-Lung Hsu, Chun-Yao Chiu, Chin-Yung Chang
  • Patent number: 7130707
    Abstract: A customer-orientated manufacturing planning and controlling system. An order management module is programmed to receive an order for a product and reserve a capacity for the order based on a capacity model that considers a plurality of capacity vectors in a production system. A plan engine generates a fixed production schedule for the order based on the capacity model. A priority management engine provides a priority for the order. A production schedule monitor and evaluation module determines whether the order in process conforms to the fixed production schedule by statistical process control (SPC) and whether to adjust the fixed production schedule and to adjust the priority based on a dynamic achievement model of historical fixed production schedules, based on historical production information in a production database storing production information of the production system.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: October 31, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jen-Lin Chao, Chen-Wei Hsu, Chin-Yung Chang, Chiang-Chou Lo, Wei-Chuan Huang, Cheng-Hsi Wen
  • Patent number: 7103435
    Abstract: A system and method for control factor management for a work-in-process (WIP) in a production system. A plan engine is programmed to receive an order for a product, reserve a capacity for the order based on a capacity model that considers a plurality of capacity vectors, and generate a plan for the WIP of the order according to a control factor. A control factor management module adjusts the control factor of the plan engine according to a current value of the control factor in the production system, a target value of the control factor, and a priority of the WIP. Preferably, a control factor matrix of the product is provided in the control factor management module as a function of the current value of the control factor in the production system, the target value of the control factor, the priority of the WIP, and a target date of the order.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: September 5, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jen-Lin Chao, Chin-Yung Chang, Wei-Kuo Yen
  • Patent number: 7073160
    Abstract: A system and method for MPW shuttle service. The system includes at least a first MPW shuttle reserving for a first group of device designs, a second MPW shuttle reserving for a second group of device designs, and a checking unit. The checking unit determines whether mask data for the first group has been provided by a cut off date for the first MPW shuttle, and exchanges a first target device design from the first group with a second target device design from the second group if the mask data of the first target device design has not been provided and that of the second target device design has been provided by the cut off date.
    Type: Grant
    Filed: January 2, 2004
    Date of Patent: July 4, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jen-Lin Chao, Chin Yung Chang
  • Patent number: 7031795
    Abstract: A system and method of coinsurance wafer management. The system includes at least one production line and an order management unit. The production line processes a MPW shuttle including original wafers and coinsurance wafers with a common fabrication process before metal layering, processes the original wafers with different metal layering fabrication processes according to a metal layering technology of each device design of the MPW shuttle, and withholds the coinsurance wafers without further fabrication. The order management unit receives a request for a designated device design before a cutoff date, and the production line releases and processes coinsurance wafers with the metal layering fabrication process corresponding to the designated device design when the request is received.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: April 18, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jen-Lin Chao, Chin-Yung Chang
  • Publication number: 20050203658
    Abstract: A system and method of coinsurance wafer management. The system includes at least one production line and an order management unit. The production line processes a MPW shuttle including original wafers and coinsurance wafers with a common fabrication process before metal layering, processes the original wafers with different metal layering fabrication processes according to a metal layering technology of each device design of the MPW shuttle, and withholds the coinsurance wafers without further fabrication. The order management unit receives a request for a designated device design before a cutoff date, and the production line releases and processes coinsurance wafers with the metal layering fabrication process corresponding to the designated device design when the request is received.
    Type: Application
    Filed: March 10, 2004
    Publication date: September 15, 2005
    Inventors: Jen-Lin Chao, Chin-Yung Chang
  • Patent number: 6920365
    Abstract: A system for planning and controlling a pull-in request of an order with demanded capacity in a production system. A plan engine is programmed to receive a pull-in request for the order, release original demanded capacity, reserve a capacity for the pull-in order, and generate a fixed production schedule for the pull-in order based on a capacity model that considers a plurality of capacity vectors in the production system. A production schedule monitor and evaluation module determines whether the relevant current pull-in order conforms to the fixed production schedule and whether to adjust the fixed production schedule when the relevant current pull-in order deviates from the fixed production schedule.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: July 19, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jen-Lin Chao, Chao-Hsien Lin, Chen-Wei Hsu, Chin-Yung Chang
  • Publication number: 20050149899
    Abstract: A system and method for MPW shuttle service. The system includes at least a first MPW shuttle reserving for a first group of device designs, a second MPW shuttle reserving for a second group of device designs, and a checking unit. The checking unit determines whether mask data for the first group has been provided by a cut off date for the first MPW shuttle, and exchanges a first target device design from the first group with a second target device design from the second group if the mask data of the first target device design has not been provided and that of the second target device design has been provided by the cut off date.
    Type: Application
    Filed: January 2, 2004
    Publication date: July 7, 2005
    Inventors: Jen-Lin Chao, Chin Yung Chang
  • Publication number: 20050137733
    Abstract: A system for planning and controlling a pull-in request of an order with demanded capacity in a production system. A plan engine is programmed to receive a pull-in request for the order, release original demanded capacity, reserve a capacity for the pull-in order, and generate a fixed production schedule for the pull-in order based on a capacity model that considers a plurality of capacity vectors in the production system. A production schedule monitor and evaluation module determines whether the relevant current pull-in order conforms to the fixed production schedule and whether to adjust the fixed production schedule when the relevant current pull-in order deviates from the fixed production schedule.
    Type: Application
    Filed: December 18, 2003
    Publication date: June 23, 2005
    Inventors: Jen-Lin Chao, Chao-Hsien Lin, Chen-Wei Hsu, Chin-Yung Chang
  • Publication number: 20050137732
    Abstract: A customer-orientated manufacturing planning and controlling system. An order management module is programmed to receive an order for a product and reserve a capacity for the order based on a capacity model that considers a plurality of capacity vectors in a production system. A plan engine generates a fixed production schedule for the order based on the capacity model. A priority management engine provides a priority for the order. A production schedule monitor and evaluation module determines whether the order in process conforms to the fixed production schedule by statistical process control (SPC) and whether to adjust the fixed production schedule and to adjust the priority based on a dynamic achievement model of historical fixed production schedules, based on historical production information in a production database storing production information of the production system.
    Type: Application
    Filed: December 18, 2003
    Publication date: June 23, 2005
    Inventors: Jen-Lin Chao, Chen-Wei Hsu, Chin-Yung Chang, Chiang-Chou Lo, Wei-Chuan Huang, Cheng-Hsi Wen
  • Publication number: 20050075747
    Abstract: A system and method for control factor management for a work-in-process (WIP) in a production system. A plan engine is programmed to receive an order for a product, reserve a capacity for the order based on a capacity model that considers a plurality of capacity vectors, and generate a plan for the WIP of the order according to a control factor. A control factor management module adjusts the control factor of the plan engine according to a current value of the control factor in the production system, a target value of the control factor, and a priority of the WIP. Preferably, a control factor matrix of the product is provided in the control factor management module as a function of the current value of the control factor in the production system, the target value of the control factor, the priority of the WIP, and a target date of the order.
    Type: Application
    Filed: October 2, 2003
    Publication date: April 7, 2005
    Inventors: Jen-Lin Chao, Chin-Yung Chang, Wei-Kuo Yen