Patents by Inventor Ching-Been Yang

Ching-Been Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7747419
    Abstract: A method of building a set of experimental prediction model that requires fewer experimental frequency, shorter prediction time and higher prediction accuracy by using the advantages of combining the experimental data of Taguchi method and neural network learning is disclosed. The error between the experimentally measured result of photolithography and the simulated result of the theoretical model of near field photolithography is set as an objective function of an inverse method for back calculating fiber probe aperture size, which is adopted in the following Taguchi experiment. The analytical result of Taguchi neural network model of the present invention proves that the Taguchi neural network model can provide more accurate prediction result than the conventional Taguchi network model, and at the same time, improve the demerit of requiring massive training examples of the conventional neural network.
    Type: Grant
    Filed: June 11, 2007
    Date of Patent: June 29, 2010
    Assignee: National Taiwan University of Science and Technology
    Inventors: Zone-Ching Lin, Ching-Been Yang
  • Patent number: 7716026
    Abstract: A non-destructive method to inverse-calculate a fiber probe aperture size, and a prediction method of the simulation and fabrication profile of near field photolithography are provided. The error between an experimental result of the photolithography and a simulation result of the theoretical model of near field photolithography is set as an objective function to inverse-calculate a fiber probe aperture size that can match with the photolithography experiment and the theoretical model of near field photolithography. Finally, by comparing the fabrication profile of the photolithography experiment and that of the simulation result of the inverse-calculated fiber probe aperture size, it is verified that the inverse-calculated fiber probe aperture size is reasonable and acceptable.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: May 11, 2010
    Assignee: National TAiwan University of Science and Technology
    Inventors: Zone-Ching Lin, Ching-Been Yang
  • Publication number: 20080222067
    Abstract: A method of building a set of experimental prediction model that requires fewer experimental frequency, shorter prediction time and higher prediction accuracy by using the advantages of combining the experimental data of Taguchi method and neural network learning is disclosed. The error between the experimentally measured result of photolithography and the simulated result of the theoretical model of near field photolithography is set as an objective function of an inverse method for back calculating fiber probe aperture size, which is adopted in the following Taguchi experiment. The analytical result of Taguchi neural network model of the present invention proves that the Taguchi neural network model can provide more accurate prediction result than the conventional Taguchi network model, and at the same time, improve the demerit of requiring massive training examples of the conventional neural network.
    Type: Application
    Filed: June 11, 2007
    Publication date: September 11, 2008
    Applicant: National Taiwan University of Science and Technology
    Inventors: Zone-Ching Lin, Ching-Been Yang
  • Publication number: 20080208545
    Abstract: A non-destructive method to inverse-calculate a fiber probe aperture size, and a prediction method of the simulation and fabrication profile of near field photolithography are provided. The error between an experimental result of the photolithography and a simulation result of the theoretical model of near field photolithography is set as an objective function to inverse-calculate a fiber probe aperture size that can match with the photolithography experiment and the theoretical model of near field photolithography. Finally, by comparing the fabrication profile of the photolithography experiment and that of the simulation result of the inverse-calculated fiber probe aperture size, it is verified that the inverse-calculated fiber probe aperture size is reasonable and acceptable.
    Type: Application
    Filed: May 16, 2007
    Publication date: August 28, 2008
    Applicant: National Taiwan University of Science and Technology
    Inventors: Zone-Ching Lin, Ching-Been Yang