Patents by Inventor Ching-Fang LEE

Ching-Fang LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250064345
    Abstract: A gait evaluating system including a processor is provided. The processor identifies whether a gait type of the user belongs to a normal gait, a non-neuropathic gait or a neuropathic gait based on step feature values of a user and walking limb feature values of the user. In response to that the gait type of the user belongs to the non-neuropathic gait, the processor controls the display panel to display a first auxiliary information, a second auxiliary information, and a third auxiliary information. The first auxiliary information indicates a potential sarcopenia of the user. The second auxiliary information indicates a dietary guideline for muscle building and muscle strengthening. The third auxiliary information shows a motion instruction video for regaining or maintaining muscle strength of the user.
    Type: Application
    Filed: October 18, 2024
    Publication date: February 27, 2025
    Applicant: Industrial Technology Research Institute
    Inventors: Je-Ping Hu, Keng-Hsun Lin, Shih-Fang Yang Mao, Pin-Chou Li, Jian-Hong Wu, Szu-Ju Li, Hui-Yu Cho, Yu-Chang Chen, Yen-Nien Lu, Jyun-Siang Hsu, Nien-Ya Lee, Kuan-Ting Ho, Ming-Chieh Tsai, Ching-Yu Huang
  • Publication number: 20250060660
    Abstract: A method includes: generating a designed mask overlay mark associated with an actual mask overlay mark to be formed in a mask; forming the actual mask overlay mark in the mask based on the designed mask overlay mark, the actual mask overlay mark including a plurality of overlay patterns; forming a device feature pattern adjacent to the actual mask overlay mark; forming an alignment of the mask by a mask metrology apparatus including a light source having a wavelength and a numerical aperture, wherein a pitch between adjacent two of the plurality of overlay patterns does not exceed the wavelength divided by twice the numerical aperture; and forming a pattern in a layer of a wafer by transferring the device feature pattern while the mask is under the alignment.
    Type: Application
    Filed: January 3, 2024
    Publication date: February 20, 2025
    Inventors: Cheng-Yeh LEE, Ching-Fang YU, Hsueh-Wei HUANG, Yen-Cheng HO, Wei-Cheng LIN, Hsin-Yi YIN
  • Publication number: 20250048671
    Abstract: A transistor structure including a substrate, a gate dielectric layer, a gate, a first doped region, a second doped region, a first drift region, and a dummy gate is provided. The gate dielectric layer is located on the substrate. The gate dielectric layer includes first and second portions. The second portion is connected to the first portion. The thickness of the second portion is greater than the thickness of the first portion. The gate is located on the first and second portions. The first doped region and the second doped region are located in the substrate on two sides of the gate dielectric layer. The first drift region is located in the substrate on one side of the gate. The second doped region is located in the first drift region. The dummy gate is located on the second portion between the gate and the second doped region.
    Type: Application
    Filed: September 1, 2023
    Publication date: February 6, 2025
    Applicant: United Microelectronics Corp.
    Inventors: Hsuan-Kai Chen, Tun-Jen Cheng, Ching-Chung Yang, Nien-Chung Li, Wen-Fang Lee, Chiu-Te Lee
  • Publication number: 20250031438
    Abstract: A semiconductor structure includes a substrate comprising a first well region of a first conductive type, a second well region of a second conductive type, and a junction between the first well region and the second well region, wherein the first conductive type and the second conductive type are complementary. An isolation structure is formed in the substrate to define a plurality of first dummy diffusions and second dummy diffusions and at least a first active region in the first well region, wherein the first dummy diffusions are adjacent to the junction, the first dummy diffusions are between the second dummy diffusions and the first active region, and wherein the second dummy diffusions respectively comprise a metal silicide portion. A plurality of first dummy gates are disposed on the first dummy diffusions and completely cover the first dummy diffusions, respectively.
    Type: Application
    Filed: October 7, 2024
    Publication date: January 23, 2025
    Applicant: United Microelectronics Corp.
    Inventors: Chang-Po Hsiung, Ching-Chung Yang, Shan-Shi Huang, Wen-Fang Lee
  • Patent number: 12053944
    Abstract: A dyeing method for functional contact lenses includes the following steps: providing a dry lens body, including hydrogel with 0-90% water content, silicone hydrogel with 0-90% water content, or a combination thereof; preparing an amphoteric polymethyl ether prepolymer, combining the amphoteric polymethyl ether prepolymer with a hydrophilic monomer to form a masking ring material, and attaching the masking ring material to an inner surface of the dry lens body to form a masking ring layer; dropping a colorant onto the inner surface, making the masking ring layer surround the colorant, irradiating the colorant with an ultraviolet light and then heating and fixing the colorant to form a dyed layer on the inner surface; and placing the dry lens body in water to hydrate and removing the masking ring layer to obtain a wet lens body.
    Type: Grant
    Filed: August 29, 2022
    Date of Patent: August 6, 2024
    Assignee: VIZIONFOCUS INC.
    Inventors: Wen-Ching Lin, Ching-Fang Lee, Chi-Ching Chen, Hsiao-Chun Lin
  • Publication number: 20240066816
    Abstract: A dyeing method for functional contact lenses includes the following steps: providing a dry lens body, including hydrogel with 0-90% water content, silicone hydrogel with 0-90% water content, or a combination thereof; preparing an amphoteric polymethyl ether prepolymer, combining the amphoteric polymethyl ether prepolymer with a hydrophilic monomer to form a masking ring material, and attaching the masking ring material to an inner surface of the dry lens body to form a masking ring layer; dropping a colorant onto the inner surface, making the masking ring layer surround the colorant, irradiating the colorant with an ultraviolet light and then heating and fixing the colorant to form a dyed layer on the inner surface; and placing the dry lens body in water to hydrate and removing the masking ring layer to obtain a wet lens body.
    Type: Application
    Filed: August 29, 2022
    Publication date: February 29, 2024
    Inventors: Wen-Ching LIN, Ching-Fang LEE, Chi-Ching CHEN, Hsiao-Chun LIN
  • Publication number: 20210011200
    Abstract: A method for dyeing a functional contact lens includes steps of: providing a lens body; formulating a first solution, wherein the first solution is an ionic salt solution containing an alkali; placing the lens body in the first solution and reacting at 30° C. to 80° C.; formulating a second solution, wherein the second solution is an ionic salt solution containing at least one reactive dye; and placing the lens body in the second solution and reacting at 30° C. to 80° C.; wherein the at least one reactive dye reacts with the lens body to be fixed to a surface portion of the lens body. In order to achieve one or a portion or all of the above or other objects, the present invention further provides a functional contact lens including a lens body and a dye layer on a surface of the lens body and can be obtained by the aforementioned method.
    Type: Application
    Filed: October 25, 2019
    Publication date: January 14, 2021
    Inventors: Wen-Ching LIN, Ching-Fang LEE, Chi-Ching CHEN, Yan-Zuo LIN