Patents by Inventor Ching-Hsiang Hsu

Ching-Hsiang Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240361609
    Abstract: Disclosed is a method to fabricate a multifunctional collimator structure In one embodiment, an optical collimator, includes: a dielectric layer; a substrate; and a plurality of via holes, wherein the dielectric layer is formed over the substrate, wherein the plurality of via holes are configured as an array along a lateral direction of a first surface of the dielectric layer, wherein each of the plurality of via holes extends through the dielectric layer and the substrate from the first surface of the dielectric layer to a second surface of the substrate in a vertical direction, wherein the substrate has a bulk impurity doping concentration equal to or greater than 1×1019 per cubic centimeter (cm?3) and a first thickness, and wherein the bulk impurity doping concentration and the first thickness of the substrate are configured so as to allow the optical collimator to filter light in a range of wavelengths.
    Type: Application
    Filed: July 11, 2024
    Publication date: October 31, 2024
    Inventors: Hsin-Yu CHEN, Chun-Peng LI, Chia-Chun HUNG, Ching-Hsiang HU, Wei-Ding WU, Jui-Chun WENG, Ji-Hong CHIANG, Yen Chiang LIU, Jiun-Jie CHIOU, Li-Yang TU, Jia-Syuan LI, You-Cheng JHANG, Shin-Hua CHEN, Lavanya SANAGAVARAPU, Han-Zong PAN, Hsi-Cheng HSU
  • Patent number: 12092839
    Abstract: Disclosed is a method to fabricate a multifunctional collimator structure In one embodiment, an optical collimator, includes: a dielectric layer; a substrate; and a plurality of via holes, wherein the dielectric layer is formed over the substrate, wherein the plurality of via holes are configured as an array along a lateral direction of a first surface of the dielectric layer, wherein each of the plurality of via holes extends through the dielectric layer and the substrate from the first surface of the dielectric layer to a second surface of the substrate in a vertical direction, wherein the substrate has a bulk impurity doping concentration equal to or greater than 1×1019 per cubic centimeter (cm?3) and a first thickness, and wherein the bulk impurity doping concentration and the first thickness of the substrate are configured so as to allow the optical collimator to filter light in a range of wavelengths.
    Type: Grant
    Filed: July 14, 2023
    Date of Patent: September 17, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hsin-Yu Chen, Chun-Peng Li, Chia-Chun Hung, Ching-Hsiang Hu, Wei-Ding Wu, Jui-Chun Weng, Ji-Hong Chiang, Yen Chiang Liu, Jiun-Jie Chiou, Li-Yang Tu, Jia-Syuan Li, You-Cheng Jhang, Shin-Hua Chen, Lavanya Sanagavarapu, Han-Zong Pan, Hsi-Cheng Hsu
  • Publication number: 20240297356
    Abstract: The present application provides a recycling method of a lithium iron phosphate battery. The method comprises the following steps: i) providing a first powder comprising lithium iron phosphate battery waste; ii) removing copper and aluminum from the first powder to obtain a second powder, iii) dissolving the second powder obtained in step ii) in nitric acid to obtain a solution; iv) adding carbonic acid in the solution obtained in step iii) and separating a lithium carbonate precipitate; and v) removing a remaining solution of step iv) by vacuum distillation to obtain a ferric nitrate crystal.
    Type: Application
    Filed: June 20, 2023
    Publication date: September 5, 2024
    Applicant: UWin Resource Regeneration Inc.
    Inventors: Ching-Hsiang HSU, Jia-Hao HU
  • Patent number: 12066760
    Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the fractions are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.
    Type: Grant
    Filed: March 25, 2022
    Date of Patent: August 20, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Ching-Hsiang Hsu, James Jeng-Jyi Hwang, Feng Yuan Hsu
  • Patent number: 12054382
    Abstract: A micro-electromechanical-system (MEMS) device may be formed to include an anti-stiction polysilicon layer on one or more moveable MEMS structures of a device wafer of the MEMS device to reduce, minimize, and/or eliminate stiction between the moveable MEMS structures and other components or structures of the MEMS device. The anti-stiction polysilicon layer may be formed such that a surface roughness of the anti-stiction polysilicon layer is greater than the surface roughness of a bonding polysilicon layer on the surfaces of the device wafer that are to be bonded to a circuitry wafer of the MEMS device. The higher surface roughness of the anti-stiction polysilicon layer may reduce the surface area of the bottom of the moveable MEMS structures, which may reduce the likelihood that the one or more moveable MEMS structures will become stuck to the other components or structures.
    Type: Grant
    Filed: April 28, 2023
    Date of Patent: August 6, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsi-Cheng Hsu, Kuo-Hao Lee, Jui-Chun Weng, Ching-Hsiang Hu, Ji-Hong Chiang, Lavanya Sanagavarapu, Chia-Yu Lin, Chia-Chun Hung, Jia-Syuan Li, Yu-Pei Chiang
  • Patent number: 11989533
    Abstract: A random bit generator includes a voltage source, a bit data cell, and a sensing control circuit. The voltage source provides a scan voltage during enroll operations. The data cell includes a first transistor and a second transistor. The first transistor has a first terminal coupled to a first bit line, a second terminal coupled to the voltage source, and a control terminal. The second transistor has a first terminal coupled to a second bit line, a second terminal coupled to the voltage source, and a control terminal. The sensing control circuit is coupled to the first bit line and the second bit line, and outputs a random bit data according to currents generated through the first transistor and the second transistor during an enroll operation of the bit data cell.
    Type: Grant
    Filed: June 5, 2023
    Date of Patent: May 21, 2024
    Assignee: eMemory Technology Inc.
    Inventor: Ching-Hsiang Hsu
  • Publication number: 20230384662
    Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer including molybdenum layers and silicon layers over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and performing a treatment to form a border region including molybdenum silicide in the reflective layer.
    Type: Application
    Filed: July 30, 2023
    Publication date: November 30, 2023
    Inventors: FENG YUAN HSU, TRAN-HUI SHEN, CHING-HSIANG HSU
  • Patent number: 11782338
    Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and treating the reflective layer by a laser beam to form a border region. The borderer region has a reflectivity less than about 0.1%.
    Type: Grant
    Filed: April 15, 2022
    Date of Patent: October 10, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Feng Yuan Hsu, Tran-Hui Shen, Ching-Hsiang Hsu
  • Publication number: 20230315393
    Abstract: A random bit generator includes a voltage source, a bit data cell, and a sensing control circuit. The voltage source provides a scan voltage during enroll operations. The data cell includes a first transistor and a second transistor. The first transistor has a first terminal coupled to a first bit line, a second terminal coupled to the voltage source, and a control terminal. The second transistor has a first terminal coupled to a second bit line, a second terminal coupled to the voltage source, and a control terminal. The sensing control circuit is coupled to the first bit line and the second bit line, and outputs a random bit data according to currents generated through the first transistor and the second transistor during an enroll operation of the bit data cell.
    Type: Application
    Filed: June 5, 2023
    Publication date: October 5, 2023
    Applicant: eMemory Technology Inc.
    Inventor: Ching-Hsiang Hsu
  • Patent number: 11709656
    Abstract: A random bit generator includes a voltage source, a bit data cell, and a sensing control circuit. The voltage source provides a scan voltage during enroll operations. The data cell includes a first transistor and a second transistor. The first transistor has a first terminal coupled to a first bit line, a second terminal coupled to the voltage source, and a control terminal. The second transistor has a first terminal coupled to a second bit line, a second terminal coupled to the voltage source, and a control terminal. The sensing control circuit is coupled to the first bit line and the second bit line, and outputs a random bit data according to currents generated through the first transistor and the second transistor during an enroll operation of the bit data cell.
    Type: Grant
    Filed: April 2, 2019
    Date of Patent: July 25, 2023
    Assignee: eMemory Technology Inc.
    Inventor: Ching-Hsiang Hsu
  • Patent number: 11650114
    Abstract: A torque detection device includes a base, a load sensing member, a push member, a transmission module, and a drive module. The push member has a first extension wall and a second extension wall. The transmission module includes two adjustable transmission sets each including a torque transmission part. The torque transmission part respectively rests on the first extension wall and the second extension wall of the push member. The torque transmission part of the transmission module applies a force to push and press the push member reciprocatingly. The push member transmits the force of the torque transmission part to the load sensing member which cooperates with an electronic device to measure the maximum static friction torque of a detected workpiece.
    Type: Grant
    Filed: May 26, 2021
    Date of Patent: May 16, 2023
    Assignee: Shin Zu Shing Co., Ltd.
    Inventors: Shen-Ding Chen, Po-Jung Chen, Ching-Hsiang Hsu, Jeng-Hung Tsai, King-Ho Tsai
  • Publication number: 20220381632
    Abstract: A torque detection device includes a base, a load sensing member, a push member, a transmission module, and a drive module. The push member has a first extension wall and a second extension wall. The transmission module includes two adjustable transmission sets each including a torque transmission part. The torque transmission part respectively rests on the first extension wall and the second extension wall of the push member. The torque transmission part of the transmission module applies a force to push and press the push member reciprocatingly. The push member transmits the force of the torque transmission part to the load sensing member which cooperates with an electronic device to measure the maximum static friction torque of a detected workpiece.
    Type: Application
    Filed: May 26, 2021
    Publication date: December 1, 2022
    Inventors: Shen-Ding Chen, Po-Jung Chen, Ching-Hsiang Hsu, Jeng-Hung Tsai, King-Ho Tsai
  • Patent number: 11404958
    Abstract: A random code generator includes a power source, a sensing circuit, a first memory cell and a second memory cell. A first terminal of the first memory cell is connected with the power source. A second terminal of the first memory cell is connected with the sensing circuit. A first terminal of the second memory cell is connected with the power source. A second terminal of the second memory cell is connected with the sensing circuit. The power source provides a supplying voltage to both the first memory cell and the second memory cell during an enrollment. A random code is then determined according to the resistance difference between the first memory cell and the second memory cell after the enrollment.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: August 2, 2022
    Assignee: EMEMORY TECHNOLOGY INC.
    Inventor: Ching-Hsiang Hsu
  • Publication number: 20220236637
    Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and treating the reflective layer by a laser beam to form a border region. The borderer region has a reflectivity less than about 0.1%.
    Type: Application
    Filed: April 15, 2022
    Publication date: July 28, 2022
    Inventors: FENG YUAN HSU, TRAN-HUI SHEN, CHING-HSIANG HSU
  • Publication number: 20220214620
    Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the fractions are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.
    Type: Application
    Filed: March 25, 2022
    Publication date: July 7, 2022
    Inventors: CHING-HSIANG HSU, JAMES JENG-JYI HWANG, FENG YUAN HSU
  • Patent number: 11307489
    Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and treating the reflective layer by a laser beam to form a border region. The laser beam includes a pulse duration of less than about ten picoseconds.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: April 19, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Feng Yuan Hsu, Tran-Hui Shen, Ching-Hsiang Hsu
  • Patent number: 11287745
    Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the protrusion structures are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: March 29, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Ching-Hsiang Hsu, James Jeng-Jyi Hwang, Feng Yuan Hsu
  • Patent number: 11255658
    Abstract: An ellipsometer includes a light source, a polarizer, an asymmetric wavelength retarder, an analyzer and an optical detection component. The light source is configured to provide a light beam having multiple wavelengths incident to a sample. The polarizer is disposed between the light source and the sample, and configured to polarize the light beam. The asymmetric wavelength retarder is configured to provide a varied retardation effect on the light beam varied by wavelength. The analyzer is configured to analyze a polarization state of the light beam reflected by the sample. The optical detection component is configured to detect the light beam from the analyzer.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: February 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Feng Yuan Hsu, Chi-Ming Yang, Ching-Hsiang Hsu, Chyi Shyuan Chern
  • Patent number: 11200844
    Abstract: Methods and apparatuses for controlling brightness of a display are disclosed in the present disclosure. One method includes: determining a first brightness value of a display at a current brightness adjustment level; determining, based on a gamma correction lookup table, a first input grayscale value corresponding to the first brightness value, wherein the gamma correction lookup table comprises a gamma correction relationship between a brightness value of the display and an initial input grayscale value of the display at a predetermined brightness adjustment levels; and controlling an output brightness value of the display based on the first input grayscale value.
    Type: Grant
    Filed: November 4, 2020
    Date of Patent: December 14, 2021
    Assignee: Huawei Technologies Co., Ltd.
    Inventors: Ching Hsiang Hsu, Dustin Yuk Lun Wai, Zeyu Niu
  • Patent number: 11180826
    Abstract: The present invention provides an additive for tin stripping, comprising 0.1 to 20 wt % of copper corrosion inhibitor and 0.1 to 20 wt % of nickel corrosion inhibitor; wherein said weight percentage is based on the total weight of said additive. The present additive can be used with nitric acid conventionally used for metal-stripping for not only reducing the usage of nitric acid but also improving the efficiency of tin stripping. The present invention also provides a method for Tin recycle and a reaction tank for metal recycle. Both of them are favorable for satisfying the needs of metal recycle (especially, tin recycle) in the field.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: November 23, 2021
    Assignee: UWIN NANOTECH CO., LTD.
    Inventor: Ching-Hsiang Hsu