Patents by Inventor Ching-Hsiang Hsu
Ching-Hsiang Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240361609Abstract: Disclosed is a method to fabricate a multifunctional collimator structure In one embodiment, an optical collimator, includes: a dielectric layer; a substrate; and a plurality of via holes, wherein the dielectric layer is formed over the substrate, wherein the plurality of via holes are configured as an array along a lateral direction of a first surface of the dielectric layer, wherein each of the plurality of via holes extends through the dielectric layer and the substrate from the first surface of the dielectric layer to a second surface of the substrate in a vertical direction, wherein the substrate has a bulk impurity doping concentration equal to or greater than 1×1019 per cubic centimeter (cm?3) and a first thickness, and wherein the bulk impurity doping concentration and the first thickness of the substrate are configured so as to allow the optical collimator to filter light in a range of wavelengths.Type: ApplicationFiled: July 11, 2024Publication date: October 31, 2024Inventors: Hsin-Yu CHEN, Chun-Peng LI, Chia-Chun HUNG, Ching-Hsiang HU, Wei-Ding WU, Jui-Chun WENG, Ji-Hong CHIANG, Yen Chiang LIU, Jiun-Jie CHIOU, Li-Yang TU, Jia-Syuan LI, You-Cheng JHANG, Shin-Hua CHEN, Lavanya SANAGAVARAPU, Han-Zong PAN, Hsi-Cheng HSU
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Patent number: 12092839Abstract: Disclosed is a method to fabricate a multifunctional collimator structure In one embodiment, an optical collimator, includes: a dielectric layer; a substrate; and a plurality of via holes, wherein the dielectric layer is formed over the substrate, wherein the plurality of via holes are configured as an array along a lateral direction of a first surface of the dielectric layer, wherein each of the plurality of via holes extends through the dielectric layer and the substrate from the first surface of the dielectric layer to a second surface of the substrate in a vertical direction, wherein the substrate has a bulk impurity doping concentration equal to or greater than 1×1019 per cubic centimeter (cm?3) and a first thickness, and wherein the bulk impurity doping concentration and the first thickness of the substrate are configured so as to allow the optical collimator to filter light in a range of wavelengths.Type: GrantFiled: July 14, 2023Date of Patent: September 17, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Hsin-Yu Chen, Chun-Peng Li, Chia-Chun Hung, Ching-Hsiang Hu, Wei-Ding Wu, Jui-Chun Weng, Ji-Hong Chiang, Yen Chiang Liu, Jiun-Jie Chiou, Li-Yang Tu, Jia-Syuan Li, You-Cheng Jhang, Shin-Hua Chen, Lavanya Sanagavarapu, Han-Zong Pan, Hsi-Cheng Hsu
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Publication number: 20240297356Abstract: The present application provides a recycling method of a lithium iron phosphate battery. The method comprises the following steps: i) providing a first powder comprising lithium iron phosphate battery waste; ii) removing copper and aluminum from the first powder to obtain a second powder, iii) dissolving the second powder obtained in step ii) in nitric acid to obtain a solution; iv) adding carbonic acid in the solution obtained in step iii) and separating a lithium carbonate precipitate; and v) removing a remaining solution of step iv) by vacuum distillation to obtain a ferric nitrate crystal.Type: ApplicationFiled: June 20, 2023Publication date: September 5, 2024Applicant: UWin Resource Regeneration Inc.Inventors: Ching-Hsiang HSU, Jia-Hao HU
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Patent number: 12066760Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the fractions are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.Type: GrantFiled: March 25, 2022Date of Patent: August 20, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Ching-Hsiang Hsu, James Jeng-Jyi Hwang, Feng Yuan Hsu
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Patent number: 12054382Abstract: A micro-electromechanical-system (MEMS) device may be formed to include an anti-stiction polysilicon layer on one or more moveable MEMS structures of a device wafer of the MEMS device to reduce, minimize, and/or eliminate stiction between the moveable MEMS structures and other components or structures of the MEMS device. The anti-stiction polysilicon layer may be formed such that a surface roughness of the anti-stiction polysilicon layer is greater than the surface roughness of a bonding polysilicon layer on the surfaces of the device wafer that are to be bonded to a circuitry wafer of the MEMS device. The higher surface roughness of the anti-stiction polysilicon layer may reduce the surface area of the bottom of the moveable MEMS structures, which may reduce the likelihood that the one or more moveable MEMS structures will become stuck to the other components or structures.Type: GrantFiled: April 28, 2023Date of Patent: August 6, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsi-Cheng Hsu, Kuo-Hao Lee, Jui-Chun Weng, Ching-Hsiang Hu, Ji-Hong Chiang, Lavanya Sanagavarapu, Chia-Yu Lin, Chia-Chun Hung, Jia-Syuan Li, Yu-Pei Chiang
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Patent number: 11989533Abstract: A random bit generator includes a voltage source, a bit data cell, and a sensing control circuit. The voltage source provides a scan voltage during enroll operations. The data cell includes a first transistor and a second transistor. The first transistor has a first terminal coupled to a first bit line, a second terminal coupled to the voltage source, and a control terminal. The second transistor has a first terminal coupled to a second bit line, a second terminal coupled to the voltage source, and a control terminal. The sensing control circuit is coupled to the first bit line and the second bit line, and outputs a random bit data according to currents generated through the first transistor and the second transistor during an enroll operation of the bit data cell.Type: GrantFiled: June 5, 2023Date of Patent: May 21, 2024Assignee: eMemory Technology Inc.Inventor: Ching-Hsiang Hsu
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Publication number: 20230384662Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer including molybdenum layers and silicon layers over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and performing a treatment to form a border region including molybdenum silicide in the reflective layer.Type: ApplicationFiled: July 30, 2023Publication date: November 30, 2023Inventors: FENG YUAN HSU, TRAN-HUI SHEN, CHING-HSIANG HSU
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Patent number: 11782338Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and treating the reflective layer by a laser beam to form a border region. The borderer region has a reflectivity less than about 0.1%.Type: GrantFiled: April 15, 2022Date of Patent: October 10, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Feng Yuan Hsu, Tran-Hui Shen, Ching-Hsiang Hsu
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Publication number: 20230315393Abstract: A random bit generator includes a voltage source, a bit data cell, and a sensing control circuit. The voltage source provides a scan voltage during enroll operations. The data cell includes a first transistor and a second transistor. The first transistor has a first terminal coupled to a first bit line, a second terminal coupled to the voltage source, and a control terminal. The second transistor has a first terminal coupled to a second bit line, a second terminal coupled to the voltage source, and a control terminal. The sensing control circuit is coupled to the first bit line and the second bit line, and outputs a random bit data according to currents generated through the first transistor and the second transistor during an enroll operation of the bit data cell.Type: ApplicationFiled: June 5, 2023Publication date: October 5, 2023Applicant: eMemory Technology Inc.Inventor: Ching-Hsiang Hsu
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Patent number: 11709656Abstract: A random bit generator includes a voltage source, a bit data cell, and a sensing control circuit. The voltage source provides a scan voltage during enroll operations. The data cell includes a first transistor and a second transistor. The first transistor has a first terminal coupled to a first bit line, a second terminal coupled to the voltage source, and a control terminal. The second transistor has a first terminal coupled to a second bit line, a second terminal coupled to the voltage source, and a control terminal. The sensing control circuit is coupled to the first bit line and the second bit line, and outputs a random bit data according to currents generated through the first transistor and the second transistor during an enroll operation of the bit data cell.Type: GrantFiled: April 2, 2019Date of Patent: July 25, 2023Assignee: eMemory Technology Inc.Inventor: Ching-Hsiang Hsu
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Patent number: 11650114Abstract: A torque detection device includes a base, a load sensing member, a push member, a transmission module, and a drive module. The push member has a first extension wall and a second extension wall. The transmission module includes two adjustable transmission sets each including a torque transmission part. The torque transmission part respectively rests on the first extension wall and the second extension wall of the push member. The torque transmission part of the transmission module applies a force to push and press the push member reciprocatingly. The push member transmits the force of the torque transmission part to the load sensing member which cooperates with an electronic device to measure the maximum static friction torque of a detected workpiece.Type: GrantFiled: May 26, 2021Date of Patent: May 16, 2023Assignee: Shin Zu Shing Co., Ltd.Inventors: Shen-Ding Chen, Po-Jung Chen, Ching-Hsiang Hsu, Jeng-Hung Tsai, King-Ho Tsai
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Publication number: 20220381632Abstract: A torque detection device includes a base, a load sensing member, a push member, a transmission module, and a drive module. The push member has a first extension wall and a second extension wall. The transmission module includes two adjustable transmission sets each including a torque transmission part. The torque transmission part respectively rests on the first extension wall and the second extension wall of the push member. The torque transmission part of the transmission module applies a force to push and press the push member reciprocatingly. The push member transmits the force of the torque transmission part to the load sensing member which cooperates with an electronic device to measure the maximum static friction torque of a detected workpiece.Type: ApplicationFiled: May 26, 2021Publication date: December 1, 2022Inventors: Shen-Ding Chen, Po-Jung Chen, Ching-Hsiang Hsu, Jeng-Hung Tsai, King-Ho Tsai
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Patent number: 11404958Abstract: A random code generator includes a power source, a sensing circuit, a first memory cell and a second memory cell. A first terminal of the first memory cell is connected with the power source. A second terminal of the first memory cell is connected with the sensing circuit. A first terminal of the second memory cell is connected with the power source. A second terminal of the second memory cell is connected with the sensing circuit. The power source provides a supplying voltage to both the first memory cell and the second memory cell during an enrollment. A random code is then determined according to the resistance difference between the first memory cell and the second memory cell after the enrollment.Type: GrantFiled: May 24, 2019Date of Patent: August 2, 2022Assignee: EMEMORY TECHNOLOGY INC.Inventor: Ching-Hsiang Hsu
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Publication number: 20220236637Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and treating the reflective layer by a laser beam to form a border region. The borderer region has a reflectivity less than about 0.1%.Type: ApplicationFiled: April 15, 2022Publication date: July 28, 2022Inventors: FENG YUAN HSU, TRAN-HUI SHEN, CHING-HSIANG HSU
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Publication number: 20220214620Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the fractions are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.Type: ApplicationFiled: March 25, 2022Publication date: July 7, 2022Inventors: CHING-HSIANG HSU, JAMES JENG-JYI HWANG, FENG YUAN HSU
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Patent number: 11307489Abstract: A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and treating the reflective layer by a laser beam to form a border region. The laser beam includes a pulse duration of less than about ten picoseconds.Type: GrantFiled: August 15, 2019Date of Patent: April 19, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Feng Yuan Hsu, Tran-Hui Shen, Ching-Hsiang Hsu
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Patent number: 11287745Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the protrusion structures are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.Type: GrantFiled: December 14, 2020Date of Patent: March 29, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Ching-Hsiang Hsu, James Jeng-Jyi Hwang, Feng Yuan Hsu
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Patent number: 11255658Abstract: An ellipsometer includes a light source, a polarizer, an asymmetric wavelength retarder, an analyzer and an optical detection component. The light source is configured to provide a light beam having multiple wavelengths incident to a sample. The polarizer is disposed between the light source and the sample, and configured to polarize the light beam. The asymmetric wavelength retarder is configured to provide a varied retardation effect on the light beam varied by wavelength. The analyzer is configured to analyze a polarization state of the light beam reflected by the sample. The optical detection component is configured to detect the light beam from the analyzer.Type: GrantFiled: August 25, 2020Date of Patent: February 22, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Feng Yuan Hsu, Chi-Ming Yang, Ching-Hsiang Hsu, Chyi Shyuan Chern
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Patent number: 11200844Abstract: Methods and apparatuses for controlling brightness of a display are disclosed in the present disclosure. One method includes: determining a first brightness value of a display at a current brightness adjustment level; determining, based on a gamma correction lookup table, a first input grayscale value corresponding to the first brightness value, wherein the gamma correction lookup table comprises a gamma correction relationship between a brightness value of the display and an initial input grayscale value of the display at a predetermined brightness adjustment levels; and controlling an output brightness value of the display based on the first input grayscale value.Type: GrantFiled: November 4, 2020Date of Patent: December 14, 2021Assignee: Huawei Technologies Co., Ltd.Inventors: Ching Hsiang Hsu, Dustin Yuk Lun Wai, Zeyu Niu
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Patent number: 11180826Abstract: The present invention provides an additive for tin stripping, comprising 0.1 to 20 wt % of copper corrosion inhibitor and 0.1 to 20 wt % of nickel corrosion inhibitor; wherein said weight percentage is based on the total weight of said additive. The present additive can be used with nitric acid conventionally used for metal-stripping for not only reducing the usage of nitric acid but also improving the efficiency of tin stripping. The present invention also provides a method for Tin recycle and a reaction tank for metal recycle. Both of them are favorable for satisfying the needs of metal recycle (especially, tin recycle) in the field.Type: GrantFiled: March 6, 2019Date of Patent: November 23, 2021Assignee: UWIN NANOTECH CO., LTD.Inventor: Ching-Hsiang Hsu