Patents by Inventor Ching-Hsiung Li

Ching-Hsiung Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS FOR TREATING AND/OR PREVENTING LYMPHANGIOGENESIS-ASSOCIATED DISEASES BY USING GOLD NANOCLUSTERS
    Publication number: 20250057876
    Abstract: Disclosed herein is a method for treating and/or preventing a lymphangiogenesis-associated disease in a subject, including administering to the subject a therapeutically effective amount of a dihydrolipoic acid (DHLA)-coated gold nanocluster about 0.1 to 10 nm in diameter. Also disclosed is a method for promoting lymphangiogenesis in a subject, including administering to the subject an effective amount of said DHLA-coated gold nanocluster.
    Type: Application
    Filed: August 18, 2023
    Publication date: February 20, 2025
    Inventors: Hung-I YEH, Yih-Jer WU, Shih-Wei WANG, Ching-Hu CHUNG, Cheng-Yung LIN, Wen-Hsiung CHAN, Kuan-Jung LI, Hong-Shong CHANG
  • Fabrication of metal film stacks having improved bottom critical dimension
    Patent number: 7960835
    Abstract: A method of fabricating metal film stacks is described that reduces or eliminates adverse effects of photolithographic misalignments. A bottom critical dimension is increased by removal of a bottom titanium nitride barrier.
    Type: Grant
    Filed: May 4, 2009
    Date of Patent: June 14, 2011
    Assignee: Macronix International Co., Ltd.
    Inventors: Han-Hui Hsu, Ta-Hung Yang, Shih-Ping Hong, Ming-Tsung Wu, An-Chi Wei, Ching-Hsiung Li, Kuo-Liang Wei
  • FABRICATION OF METAL FILM STACKS HAVING IMPROVED BOTTOM CRITICAL DIMENSION
    Publication number: 20100276807
    Abstract: A method of fabricating metal film stacks is described that reduces or eliminates adverse effects of photolithographic misalignments. A bottom critical dimension is increased by removal of a bottom titanium nitride barrier.
    Type: Application
    Filed: May 4, 2009
    Publication date: November 4, 2010
    Inventors: Han-Hui Hsu, Ta-Hung Yang, Shih-Ping Hong, Ming-Tsung Wu, An-Chi Wei, Ching-Hsiung Li, Kuo-Liang Wei