Patents by Inventor Ching-Hsiung Li

Ching-Hsiung Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fabrication of metal film stacks having improved bottom critical dimension
    Patent number: 7960835
    Abstract: A method of fabricating metal film stacks is described that reduces or eliminates adverse effects of photolithographic misalignments. A bottom critical dimension is increased by removal of a bottom titanium nitride barrier.
    Type: Grant
    Filed: May 4, 2009
    Date of Patent: June 14, 2011
    Assignee: Macronix International Co., Ltd.
    Inventors: Han-Hui Hsu, Ta-Hung Yang, Shih-Ping Hong, Ming-Tsung Wu, An-Chi Wei, Ching-Hsiung Li, Kuo-Liang Wei
  • FABRICATION OF METAL FILM STACKS HAVING IMPROVED BOTTOM CRITICAL DIMENSION
    Publication number: 20100276807
    Abstract: A method of fabricating metal film stacks is described that reduces or eliminates adverse effects of photolithographic misalignments. A bottom critical dimension is increased by removal of a bottom titanium nitride barrier.
    Type: Application
    Filed: May 4, 2009
    Publication date: November 4, 2010
    Inventors: Han-Hui Hsu, Ta-Hung Yang, Shih-Ping Hong, Ming-Tsung Wu, An-Chi Wei, Ching-Hsiung Li, Kuo-Liang Wei