Patents by Inventor Ching Hu

Ching Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260023667
    Abstract: Run-time logic built-in self-test (LBIST) may be performed, while ensuring operational continuity. The compute elements in a machine learning accelerator contain LBIST circuitry that performs logic testing of the functional circuitry in the compute element. The LBIST circuitry may be self-sufficient, meaning that it contains the data and instructions needed to run and evaluate these tests. An LBIST manager enables the logic testing during idle time of the functional circuitry between blocks of statically scheduled instructions. As a result, the LBIST circuitry can perform the logic tests without disrupting the computation of the machine learning network.
    Type: Application
    Filed: July 8, 2025
    Publication date: January 22, 2026
    Inventors: Saurabh Jain, Vishvabhusan Pati, Ching Hu
  • Patent number: 8581174
    Abstract: An image sensor includes a first imaging pixel for a first color having a photosensitive region disposed within a substrate of the image sensor and a second imaging pixel for a second color that is different from the first color having a photosensitive region disposed within the substrate. A refraction element disposed adjacent to the substrate, so that the refraction element refracts light of the first color to the photosensitive region of the first imaging pixel and refracts light of the second color to the photosensitive region of the second imaging pixel.
    Type: Grant
    Filed: August 26, 2008
    Date of Patent: November 12, 2013
    Assignee: OmniVision Technologies, Inc.
    Inventors: Tiejun Dai, Ching Hu
  • Publication number: 20100051785
    Abstract: An image sensor includes a first imaging pixel for a first color having a photosensitive region disposed within a substrate of the image sensor and a second imaging pixel for a second color that is different from the first color having a photosensitive region disposed within the substrate. A refraction element disposed adjacent to the substrate, so that the refraction element refracts light of the first color to the photosensitive region of the first imaging pixel and refracts light of the second color to the photosensitive region of the second imaging pixel.
    Type: Application
    Filed: August 26, 2008
    Publication date: March 4, 2010
    Applicant: OMNIVISION TECHNOLOGIES, INC.
    Inventors: Tiejun Dai, Ching Hu
  • Patent number: 7541596
    Abstract: A system and method for applying a layer of material in the image sensor fabrication process in order to increase the absorption of specific range light spectrum by the image sensor is described. The mechanism adopted is by converting light rays from higher energy range (shorter wavelength) to lower energy range (longer wavelength) such that the light absorption by the image sensor can be increased.
    Type: Grant
    Filed: June 28, 2007
    Date of Patent: June 2, 2009
    Assignee: OmniVision Technologies, Inc.
    Inventors: James Xinping He, Guannho George Tsau, Ching Hu
  • Publication number: 20080042066
    Abstract: A system and method for applying a layer of material in the image sensor fabrication process in order to increase the absorption of specific range light spectrum by the image sensor is described. The mechanism adopted is by converting light rays from higher energy range (shorter wavelength) to lower energy range (longer wavelength) such that the light absorption by the image sensor can be increased.
    Type: Application
    Filed: June 28, 2007
    Publication date: February 21, 2008
    Inventors: James Xinping He, Guannho George Tsau, Ching Hu