Abstract: The invention discloses an etching solution and a manufacturing method of a display panel. The method includes following steps: providing a first substrate; forming a conductive layer stack including a first sub-layer, a second sub-layer and a third sub-layer, each of the first sub-layer and the second sub-layer includes a transparent conductive material including indium-containing oxide, the third sub-layer is disposed between the first sub-layer and the second sub-layer, and the third sub-layer includes silver or silver alloy; performing an etching process, an etching solution is used to etch the first sub-layer, the second sub-layer and the third sub-layer to form a first patterned sub-layer, a second patterned sub-layer and a third patterned sub-layer, and the etching solution includes 1 to 2.6 wt % of nitric acid, 35 to 45 wt % of acetic acid, 35 to 45 wt % of phosphoric acid and a remaining amount of water.

Abstract: In accordance with some embodiments, a package-on-package (PoP) structure includes a first semiconductor package having a first side and a second side opposing the first side, a second semiconductor package having a first side and a second side opposing the first side, and a plurality of inter-package connector coupled between the first side of the first semiconductor package and the first side of the second semiconductor package. The PoP structure further includes a first molding material on the second side of the first semiconductor package. The second side of the second semiconductor package is substantially free of the first molding material.

Abstract: Disclosed is a method for making nanometer ITO powder. In the method, first and second reactants are added to a solvent to provide a clear metal ion solution. The solvent is an alcohol or an organic solvent. The clear metal ion solution is added to a hydrolysis concentration solution at a desired ratio to provide a first solution. The hydrolysis concentration solution contains a sour catalyst and water. An aging step is taken on the first solution and the hydrolysis concentration solution to provide a second solution. A solvothermal step is executed on the second solution to provide multi-ingredient transparent conductive ITO powder in the order of nanometer. The solvothermal step includes the steps of locating the second solution in a solvothermal device and heating the second solution to a solvothermal temperature for a solvothermal reaction.