Patents by Inventor Ching-Jung HSU

Ching-Jung HSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12343841
    Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.
    Type: Grant
    Filed: August 9, 2023
    Date of Patent: July 1, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Wei Chiu, Yung-Long Chen, Bo-Zhang Chen, Chong-Cheng Su, Yu-Chun Chen, Ching-Jung Hsu, Chi-Tung Lai
  • Patent number: 12341026
    Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.
    Type: Grant
    Filed: August 10, 2023
    Date of Patent: June 24, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ming-Chieh Hsu, Yung-Long Chen, Fang-Pin Chiang, Feng-An Yang, Ching-Jung Hsu, Chi-Tung Lai
  • Publication number: 20240017372
    Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.
    Type: Application
    Filed: August 9, 2023
    Publication date: January 18, 2024
    Inventors: Chi-Wei CHIU, Yung-Long CHEN, Bo-Zhang CHEN, Chong-Cheng SU, Yu-Chun CHEN, Ching-Jung HSU, Chi-Tung LAI
  • Patent number: 11858086
    Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: January 2, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Wei Chiu, Yung-Long Chen, Bo-Zhang Chen, Chong-Cheng Su, Yu-Chun Chen, Ching-Jung Hsu, Chi-Tung Lai
  • Publication number: 20230386867
    Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.
    Type: Application
    Filed: August 10, 2023
    Publication date: November 30, 2023
    Inventors: Ming-Chieh HSU, Yung-Long CHEN, Fang-Pin CHIANG, Feng-An YANG, Ching-Jung HSU, Chi-Tung LAI
  • Patent number: 11817329
    Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: November 14, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Ming-Chieh Hsu, Yung-Long Chen, Fang-Pin Chiang, Feng-An Yang, Ching-Jung Hsu, Chi-Tung Lai
  • Publication number: 20210387306
    Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.
    Type: Application
    Filed: June 15, 2020
    Publication date: December 16, 2021
    Inventors: Chi-Wei CHIU, Yung-Long CHEN, Bo-Zhang CHEN, Chong-Cheng SU, Yu-Chun CHEN, Ching-Jung HSU, Lai-Chi TUNG
  • Publication number: 20210375645
    Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.
    Type: Application
    Filed: May 29, 2020
    Publication date: December 2, 2021
    Inventors: Ming-Chieh HSU, Yung-Long CHEN, Fang-Pin CHIANG, Feng-An YANG, Ching-Jung HSU, Chi-Tung LAI
  • Patent number: 10043681
    Abstract: A fluid supply system includes a pressure tank configured to contain a pressurized gas and a fluid, a delivery point configured to be connected to a point of use, a recirculation piping connecting the pressure tank to the delivery point, and a return pump connected to the recirculation piping. The recirculation piping defines a circulation path for the fluid from the pressure tank through the delivery point and back to the pressure tank. The return pump is downstream of the delivery point and upstream of the pressure tank in the circulation path.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: August 7, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ching-Jung Hsu, Yung-Ti Hung, Chun-Feng Hsu, Nan-Peng Cheng
  • Patent number: 9278860
    Abstract: A method and an apparatus for recycling waste sulfuric acid solution are provided. The method includes providing a reaction tank and introducing a waste sulfuric acid (H2SO4) solution into the reaction tank, and the waste sulfuric acid solution includes hydrogen peroxide (H2O2). The method also includes supplying a compound containing chlorine into the reaction tank. The method further includes mixing the compound containing chlorine with the waste sulfuric acid solution to promote a chemical reaction that decomposes the hydrogen peroxide (H2O2).
    Type: Grant
    Filed: July 22, 2014
    Date of Patent: March 8, 2016
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jin-Feng Shiu, Rouh-Jier Wang, Ching-Jung Hsu, Wan-Yu Chen, Han-Ru Hung
  • Publication number: 20160023901
    Abstract: A method and an apparatus for recycling waste sulfuric acid solution are provided. The method includes providing a reaction tank and introducing a waste sulfuric acid (H2SO4) solution into the reaction tank, and the waste sulfuric acid solution includes hydrogen peroxide (H2O2). The method also includes supplying a compound containing chlorine into the reaction tank. The method further includes mixing the compound containing chlorine with the waste sulfuric acid solution to promote a chemical reaction that decomposes the hydrogen peroxide (H2O2).
    Type: Application
    Filed: July 22, 2014
    Publication date: January 28, 2016
    Inventors: Jin-Feng SHIU, Rouh-Jier WANG, Ching-Jung HSU, Wan-Yu CHEN, Han-Ru HUNG
  • Publication number: 20150027552
    Abstract: A fluid supply system includes a pressure tank configured to contain a pressurized gas and a fluid, a delivery point configured to be connected to a point of use, a recirculation piping connecting the pressure tank to the delivery point, and a return pump connected to the recirculation piping. The recirculation piping defines a circulation path for the fluid from the pressure tank through the delivery point and back to the pressure tank. The return pump is downstream of the delivery point and upstream of the pressure tank in the circulation path.
    Type: Application
    Filed: July 23, 2013
    Publication date: January 29, 2015
    Applicant: Taiwna Semiconductor Manufacturing Company, Ltd.
    Inventors: Ching-Jung HSU, Yung-Ti HUNG, Chun-Feng HSU, Nan-Peng CHENG