Patents by Inventor Ching-Jung HSU
Ching-Jung HSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12343841Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.Type: GrantFiled: August 9, 2023Date of Patent: July 1, 2025Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chi-Wei Chiu, Yung-Long Chen, Bo-Zhang Chen, Chong-Cheng Su, Yu-Chun Chen, Ching-Jung Hsu, Chi-Tung Lai
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Patent number: 12341026Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.Type: GrantFiled: August 10, 2023Date of Patent: June 24, 2025Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ming-Chieh Hsu, Yung-Long Chen, Fang-Pin Chiang, Feng-An Yang, Ching-Jung Hsu, Chi-Tung Lai
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Publication number: 20240017372Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.Type: ApplicationFiled: August 9, 2023Publication date: January 18, 2024Inventors: Chi-Wei CHIU, Yung-Long CHEN, Bo-Zhang CHEN, Chong-Cheng SU, Yu-Chun CHEN, Ching-Jung HSU, Chi-Tung LAI
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Patent number: 11858086Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.Type: GrantFiled: June 15, 2020Date of Patent: January 2, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chi-Wei Chiu, Yung-Long Chen, Bo-Zhang Chen, Chong-Cheng Su, Yu-Chun Chen, Ching-Jung Hsu, Chi-Tung Lai
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Publication number: 20230386867Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.Type: ApplicationFiled: August 10, 2023Publication date: November 30, 2023Inventors: Ming-Chieh HSU, Yung-Long CHEN, Fang-Pin CHIANG, Feng-An YANG, Ching-Jung HSU, Chi-Tung LAI
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Patent number: 11817329Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.Type: GrantFiled: May 29, 2020Date of Patent: November 14, 2023Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Ming-Chieh Hsu, Yung-Long Chen, Fang-Pin Chiang, Feng-An Yang, Ching-Jung Hsu, Chi-Tung Lai
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Publication number: 20210387306Abstract: A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.Type: ApplicationFiled: June 15, 2020Publication date: December 16, 2021Inventors: Chi-Wei CHIU, Yung-Long CHEN, Bo-Zhang CHEN, Chong-Cheng SU, Yu-Chun CHEN, Ching-Jung HSU, Lai-Chi TUNG
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Publication number: 20210375645Abstract: A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.Type: ApplicationFiled: May 29, 2020Publication date: December 2, 2021Inventors: Ming-Chieh HSU, Yung-Long CHEN, Fang-Pin CHIANG, Feng-An YANG, Ching-Jung HSU, Chi-Tung LAI
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Patent number: 10043681Abstract: A fluid supply system includes a pressure tank configured to contain a pressurized gas and a fluid, a delivery point configured to be connected to a point of use, a recirculation piping connecting the pressure tank to the delivery point, and a return pump connected to the recirculation piping. The recirculation piping defines a circulation path for the fluid from the pressure tank through the delivery point and back to the pressure tank. The return pump is downstream of the delivery point and upstream of the pressure tank in the circulation path.Type: GrantFiled: July 23, 2013Date of Patent: August 7, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ching-Jung Hsu, Yung-Ti Hung, Chun-Feng Hsu, Nan-Peng Cheng
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Patent number: 9278860Abstract: A method and an apparatus for recycling waste sulfuric acid solution are provided. The method includes providing a reaction tank and introducing a waste sulfuric acid (H2SO4) solution into the reaction tank, and the waste sulfuric acid solution includes hydrogen peroxide (H2O2). The method also includes supplying a compound containing chlorine into the reaction tank. The method further includes mixing the compound containing chlorine with the waste sulfuric acid solution to promote a chemical reaction that decomposes the hydrogen peroxide (H2O2).Type: GrantFiled: July 22, 2014Date of Patent: March 8, 2016Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jin-Feng Shiu, Rouh-Jier Wang, Ching-Jung Hsu, Wan-Yu Chen, Han-Ru Hung
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Publication number: 20160023901Abstract: A method and an apparatus for recycling waste sulfuric acid solution are provided. The method includes providing a reaction tank and introducing a waste sulfuric acid (H2SO4) solution into the reaction tank, and the waste sulfuric acid solution includes hydrogen peroxide (H2O2). The method also includes supplying a compound containing chlorine into the reaction tank. The method further includes mixing the compound containing chlorine with the waste sulfuric acid solution to promote a chemical reaction that decomposes the hydrogen peroxide (H2O2).Type: ApplicationFiled: July 22, 2014Publication date: January 28, 2016Inventors: Jin-Feng SHIU, Rouh-Jier WANG, Ching-Jung HSU, Wan-Yu CHEN, Han-Ru HUNG
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Publication number: 20150027552Abstract: A fluid supply system includes a pressure tank configured to contain a pressurized gas and a fluid, a delivery point configured to be connected to a point of use, a recirculation piping connecting the pressure tank to the delivery point, and a return pump connected to the recirculation piping. The recirculation piping defines a circulation path for the fluid from the pressure tank through the delivery point and back to the pressure tank. The return pump is downstream of the delivery point and upstream of the pressure tank in the circulation path.Type: ApplicationFiled: July 23, 2013Publication date: January 29, 2015Applicant: Taiwna Semiconductor Manufacturing Company, Ltd.Inventors: Ching-Jung HSU, Yung-Ti HUNG, Chun-Feng HSU, Nan-Peng CHENG