Patents by Inventor Ching-Ling Lee
Ching-Ling Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11688620Abstract: In an embodiment, a system includes: a cassette comprising a slit opening configured to house a wafer; a blade configured to move the wafer to and from the slit opening by extending into the slit opening, wherein a blade thickness of the blade is at most ? of a height of the slit opening and wherein the blade is configured to secure the wafer within a pocket on the blade that is at least ? of a wafer thickness of the wafer.Type: GrantFiled: June 22, 2022Date of Patent: June 27, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chien-Chih Chen, Yao-Min Yu, Ching-Ling Lee, Ren-Dou Lee
-
Publication number: 20220392796Abstract: In an embodiment, a system includes: a cassette comprising a slit opening configured to house a wafer; a blade configured to move the wafer to and from the slit opening by extending into the slit opening, wherein a blade thickness of the blade is at most ? of a height of the slit opening and wherein the blade is configured to secure the wafer within a pocket on the blade that is at least ? of a wafer thickness of the wafer.Type: ApplicationFiled: June 22, 2022Publication date: December 8, 2022Inventors: Chien-Chih CHEN, Yao-Min YU, Ching-Ling LEE, Ren-Dou LEE
-
Patent number: 11380569Abstract: In an embodiment, a system includes: a cassette comprising a slit opening configured to house a wafer; a blade configured to move the wafer to and from the slit opening by extending into the slit opening, wherein a blade thickness of the blade is at most ? of a height of the slit opening and wherein the blade is configured to secure the wafer within a pocket on the blade that is at least ? of a wafer thickness of the wafer.Type: GrantFiled: June 22, 2020Date of Patent: July 5, 2022Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chien-Chih Chen, Yao-Min Yu, Ching-Ling Lee, Ren-Dou Lee
-
Publication number: 20200388520Abstract: In an embodiment, a system includes: a cassette comprising a slit opening configured to house a wafer; a blade configured to move the wafer to and from the slit opening by extending into the slit opening, wherein a blade thickness of the blade is at most ? of a height of the slit opening and wherein the blade is configured to secure the wafer within a pocket on the blade that is at least ? of a wafer thickness of the wafer.Type: ApplicationFiled: June 22, 2020Publication date: December 10, 2020Inventors: Chien-Chih Chen, Yao-Min Yu, Ching-Ling Lee, Ren-Dou Lee
-
Patent number: 10699931Abstract: In an embodiment, a system includes: a cassette comprising a slit opening configured to house a wafer; a blade configured to move the wafer to and from the slit opening by extending into the slit opening, wherein a blade thickness of the blade is at most ? of a height of the slit opening and wherein the blade is configured to secure the wafer within a pocket on the blade that is at least ? of a wafer thickness of the wafer.Type: GrantFiled: September 6, 2018Date of Patent: June 30, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chien-Chih Chen, Yao-Min Yu, Ching-Ling Lee, Ren-Dou Lee
-
Publication number: 20190074205Abstract: In an embodiment, a system includes: a cassette comprising a slit opening configured to house a wafer; a blade configured to move the wafer to and from the slit opening by extending into the slit opening, wherein a blade thickness of the blade is at most ? of a height of the slit opening and wherein the blade is configured to secure the wafer within a pocket on the blade that is at least ? of a wafer thickness of the wafer.Type: ApplicationFiled: September 6, 2018Publication date: March 7, 2019Inventors: Chien-Chih CHEN, Yao-Min Yu, Ching-Ling Lee, Ren-Dou Lee
-
Publication number: 20050124169Abstract: A truncated dummy plate which is suitable for promoting substantially uniform flow of process gases among all regions on the surface of a substrate to facilitate deposition of a film having uniform thickness on the substrate. The truncated dummy plate has a circular shape with a flat edge provided in the curved edge of the dummy plate. At least two, and preferably, about three or four of the dummy plates are positioned in the sites on a wafer boat which are in relatively close proximity to a gas outlet in a process furnace typically during a LPCVD process carried out in the furnace. The flat or truncated edges of the dummy plates are disposed on the gas inlet side of the process chamber, with the round edges of the dummy plates disposed on the gas outlet side of the process chamber.Type: ApplicationFiled: January 19, 2005Publication date: June 9, 2005Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Hsing Chen, Hsing-Jui Lee, Fu-Kuo Tseng, Ching-Ling Lee, Kuo-Hung Liao
-
Patent number: 6849131Abstract: A truncated dummy plate which is suitable for promoting substantially uniform flow of process gases among all regions on the surface of a substrate to facilitate deposition of a film having uniform thickness on the substrate. The truncated dummy plate has a circular shape with a flat edge provided in the curved edge of the dummy plate. At least two, and preferably, about three or four of the dummy plates are positioned in the sites on a wafer boat which are in relatively close proximity to a gas outlet in a process furnace typically during a LPCVD process carried out in the furnace. The flat or truncated edges of the dummy plates are disposed on the gas inlet side of the process chamber, with the round edges of the dummy plates disposed on the gas outlet side of the process chamber.Type: GrantFiled: October 5, 2002Date of Patent: February 1, 2005Assignee: Taiwan Semiconductor Manufacturing Co., LtdInventors: Yen-Hsing Chen, Hsing-Jui Lee, Fu-Kuo Tseng, Ching-Ling Lee, Kuo-Hung Liao
-
Publication number: 20040065261Abstract: A truncated dummy plate which is suitable for promoting substantially uniform flow of process gases among all regions on the surface of a substrate to facilitate deposition of a film having uniform thickness on the substrate. The truncated dummy plate has a circular shape with a flat edge provided in the curved edge of the dummy plate. At least two, and preferably, about three or four of the dummy plates are positioned in the sites on a wafer boat which are in relatively close proximity to a gas outlet in a process furnace typically during a LPCVD process carried out in the furnace. The flat or truncated edges of the dummy plates are disposed on the gas inlet side of the process chamber, with the round edges of the dummy plates disposed on the gas outlet side of the process chamber.Type: ApplicationFiled: October 5, 2002Publication date: April 8, 2004Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yen-Hsing Chen, Hsing-Jui Lee, Fu-Kuo Tseng, Ching-Ling Lee, Kuo-Hung Liao
-
Patent number: 6358328Abstract: A method for dry cleaning a wafer container such as a SMIF pod that is equipped with a bottom mounting plate covered with contaminating particles. In the method, the wafer containers are mounted in openings of the enclosure such that the bottom mounting plates with the contaminating particles are exposed to an air-tight cavity of the enclosure. A purge gas flow is then directed to the bottom of the plate to dislodge the contaminating particles which are then picked up by a vacuum conduit positioned juxtaposed to the purge gas conduit and connected to a factory vacuum source such that contaminating particles dislodged are immediately removed. The present invention novel method can be carried out without using wet bench cleaning while achieving desirable and efficient cleaning results.Type: GrantFiled: January 20, 2000Date of Patent: March 19, 2002Assignee: Taiwan SEmiconductor Manufacturing Company, Ltd.Inventors: Huai-Tei Yang, Suan-Jun Kuan, Ching-Ling Lee, Kuo-Hung Liao