Patents by Inventor Ching Lung Wang

Ching Lung Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7326300
    Abstract: A coating apparatus (2) includes a work table (20) having a plurality of blowing holes (201) for suspending a substrate (200) thereabove, a coating unit (22) having a photoresist coating nozzle (222) and a supplying device (224) for photoresist material. The photoresist coating nozzle is disposed above the work table, and the supplying device connects to the coating nozzle for supplying photoresist thereto. In operation, the substrate to be coated is continuously suspended in the gas just above but not in contact with the work table. Therefore, accumulation of static electricity and/or foreign particles on the substrate can be avoided. Gas emitting from the blowing holes can remove foreign particles from the surface of the work table and the backside of the work table.
    Type: Grant
    Filed: July 7, 2005
    Date of Patent: February 5, 2008
    Assignee: Innolux Display Corp.
    Inventors: Lu Nan Sun, Ching Lung Wang, Wen Cheng Hsu, Yu-Ying Chan