Abstract: A method for touchless gesture recognition is provided. The method includes transmitting ultrasonic signals via a speaker. The method includes generating ultrasonic signals. The method includes receiving the reflected ultrasonic signals from an object via two or more microphones. The method includes computing a frequency shift according to the reflected ultrasonic signals. The method includes identifying a gesture that corresponds to a movement of the object according to the frequency shift. The method includes performing a function that corresponds to the gesture.

Abstract: An information handling system includes multiple dual in-line memory modules (DIMMs) and a basic input/output system (BIOS). The DIMMs form a memory system of the information handling system. The BIOS begins a system boot of the information handling system, and performs a first memory reference code training. Based on the first memory reference code training, the BIOS discovers a bad DIMM of the DIMMs, and stores information associated with the bad DIMM. The BIOS reboots the information handling system. During the reboot, the BIOS retrieves the information associated with the bad DIMM. The BIOS disables a slot associated with the bad DIMM. In response to the slot being disabled, the BIOS performs a second memory reference code training. Based on the second memory reference code training, the BIOS downgrades the memory system to a closest possible DIMM population.

Abstract: An example electronic device includes a controller to determine a user touch detection by a power adaptor coupled to the electronic device to operate the electronic device in an AC power mode. The power adaptor may comprise a proximity sensor to detect a user touch for detachment of the power adaptor from the electronic device, and a control circuit to operate a configuration pin in a low output mode to signal user touch detection. The controller may initiate central processing unit (CPU) throttling to reduce power consumption by the electronic device. The controller may further stop CPU throttling in response to detecting that the power adaptor has been detached from the electronic device. Further, the controller may switch the electronic device to a DC power mode to operate using DC power supplied by a battery of the electronic device in response to power adaptor detachment.

Abstract: A furnace includes: a reaction chamber; a wafer boat assembly comprising multiple wafer boats each for bearing a substrate and an input pipeline assembly configured to introduce a gas are arranged in the reaction chamber; the introduced gas at least includes: silicon-containing reaction gas, nitrogen-containing reaction gas, impurity removal reaction gas, and cleaning gas; the input pipeline assembly includes a first gas input pipeline and a second gas input pipeline; the first gas input pipeline is provided with gas injection holes; the second gas input pipeline is formed by an elbow joint and two single pipes; the second gas input pipeline is provided with gas injection holes.

Abstract: An example electronic device includes a controller to determine a user touch detection by a power adaptor coupled to the electronic device to operate the electronic device in an AC power mode. The power adaptor may comprise a proximity sensor to detect a user touch for detachment of the power adaptor from the electronic device, and a control circuit to operate a configuration pin in a low output mode to signal user touch detection. The controller may initiate central processing unit (CPU) throttling to reduce power consumption by the electronic device. The controller may further stop CPU throttling in response to detecting that the power adaptor has been detached from the electronic device. Further, the controller may switch the electronic device to a DC power mode to operate using DC power supplied by a battery of the electronic device in response to power adaptor detachment.

Abstract: Method and apparatus for flowing molten metal substantially vertically into a mold by means of a feeder tube while concurrently impeding the flow of oxides that collect at the perimeter of the head of the feeder tube. This reduces inclusions in the molten metal and improves the quality of a molded component as the molten metal solidifies.

Abstract: Method and apparatus for flowing molten metal substantially vertically into a mold by means of a feeder tube while concurrently impeding the flow of oxides that collect at the perimeter of the head of the feeder tube. This reduces inclusions in the molten metal and improves the quality of a molded component as the molten metal solidifies.

Abstract: Method and apparatus for forming a wheel hub by means of a casting process which involves providing additional material during the casting process at the perimeter of the hub in quantity sufficient to form a rim; spin-forming a rim about the hub using the additional material provided during the casting process; machining mounting features in the hub; and machining finish features into the rim.

Abstract: An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.

Abstract: An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.

Abstract: A coating apparatus (2) includes a work table (20) having a plurality of blowing holes (201) for suspending a substrate (200) thereabove, a coating unit (22) having a photoresist coating nozzle (222) and a supplying device (224) for photoresist material. The photoresist coating nozzle is disposed above the work table, and the supplying device connects to the coating nozzle for supplying photoresist thereto. In operation, the substrate to be coated is continuously suspended in the gas just above but not in contact with the work table. Therefore, accumulation of static electricity and/or foreign particles on the substrate can be avoided. Gas emitting from the blowing holes can remove foreign particles from the surface of the work table and the backside of the work table.

Abstract: An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.

Abstract: An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.

Abstract: A coating apparatus (20) for forming a photoresist film on a substrate (21) includes a flat table (30), a nozzle unit (40), and a particle cleaning unit (50). The flat table is used for supporting the substrate. The nozzle unit is used for dispensing photoresist material on a top surface of the substrate. The particle cleaning unit is used for removing particles from the top surface before the photoresist material is coated thereon. The coating apparatus can timely clean the substrate before coating. The coating performance is improved, and the nozzle unit is protected from being scratched or damaged.

Abstract: An apparatus (20) for supporting a substrate (S2) includes a number of slats (28), a number of connecting blocks (24) separately positioned on the slats, and a number of soft sleeves (22) connected with the connecting blocks, respectively. Because top surfaces of the soft sleeves are shaped as annular, the force applied between the substrate and the soft sleeves is distributed, and is reduced at each contact point. The surface of the substrate is hardly if at all deformed by the soft sleeves, thereby reducing the risk of or even altogether preventing the formation of undulations. The quality of the pattern to be processed is improved.

Abstract: A glass substrate includes a two-dimensional barcode, which is provided on a peripheral region of a major surface of the glass substrate. A side of the two-dimensional barcode is oblique to a nearest side of the glass substrate. The two-dimensional barcode includes a reference line, and is for recording identification information of the glass substrate. If the two-dimensional barcode sustains partial damage at the nearest side of the glass substrate, there is a reasonable likelihood that only part of the side of the two-dimensional barcode will sustain damage. In such case, the risk of damage occurring to the reference line of the two-dimensional barcode is minimized. If the reference line remains intact, then the two-dimensional barcode can still be properly read.