Abstract: A method of forming a semiconductor device includes: forming a gate structure over a fin that protrudes above a substrate; forming source/drain regions over the fin on opposing sides of the gate structure; forming a first dielectric layer and a second dielectric layer successively over the source/drain regions; performing a first etching process to form an opening in the first dielectric layer and in the second dielectric layer, where the opening exposes an underlying electrically conductive feature; after performing the first etching process, performing a second etching process to enlarge a lower portion of the opening proximate to the substrate; and forming a contact plug in the opening after the second etching process.

Abstract: A transmission device includes a daisy chain structure composed of at least three daisy chain units arranged periodically and continuously. Each of the daisy chain units includes first, second and third conductive lines, and first and second conductive pillars. The first and second conductive lines at a first layer extend along a first direction and are discontinuously arranged. The third conductive line at a second layer extends along the first direction and is substantially parallel to the first and second conductive lines. The first conductive pillar extends in a second direction. The second direction is different from the first direction. A first part of the first conductive pillar is connected to the first and third conductive lines. The second conductive pillar extends in the second direction. A first part of the second conductive pillar is connected to the second and third conductive lines.

Abstract: A method of forming a semiconductor device includes: forming a gate structure over a fin that protrudes above a substrate; forming source/drain regions over the fin on opposing sides of the gate structure; forming a first dielectric layer and a second dielectric layer successively over the source/drain regions; performing a first etching process to form an opening in the first dielectric layer and in the second dielectric layer, where the opening exposes an underlying electrically conductive feature; after performing the first etching process, performing a second etching process to enlarge a lower portion of the opening proximate to the substrate; and forming a contact plug in the opening after the second etching process.

Abstract: A ubiquitous auto calibration device is provided, which includes microcontroller unit, flex bus, image receiver image processing module, and an image output unit. The microcontroller unit is provided for receiving the electronic signal and performing a self-adjusting process to the electronic signal. The flex bus is connected with the microcontroller unit, and is provided for transmitting the electronic signal to the image processing module after performing the self-adjusting process. The image receiver is provided for receiving the image signal from the image receiving interface. The image processing module is provided for performing an image calibration process to the image signal, so that the image signal can obey the color temperature standard, Gamma value, uniformity and color gamut standards when the panel outputs the image signal.

Abstract: A ubiquitous auto calibration device is provided, which includes microcontroller unit, flex bus, image receiver image processing module, and an image output unit. The microcontroller unit is provided for receiving the electronic signal and performing a self-adjusting process to the electronic signal. The flex bus is connected with the microcontroller unit, and is provided for transmitting the electronic signal to the image processing module after performing the self-adjusting process. The image receiver is provided for receiving the image signal from the image receiving interface. The image processing module is provided for performing an image calibration process to the image signal, so that the image signal can obey the color temperature standard, Gamma value, uniformity and color gamut standards when the panel outputs the image signal.

Abstract: A display correction system applied for an endoscope is provided which includes a color checker, a light-shielding tank, an endoscope has a lens that is sleeved in the light shielding tank and the lens is disposed toward the view window, the lens of the light-shielding tank is sequentially aligned the color block of the color checker through the view window to capture the image of the color block. The monitor has a captured image window which is provided for displaying the image of the color that is captured by the endoscope. The display correction device is provided for correcting the image signal from the color block that is transmitted by the endoscope, such that the image is displayed on the monitor is corresponding to the image of the electrical signal, and the color of the image on the monitor is the same as the true color of the color block.

Abstract: “BRAVERY” is an engineering calculation method that offers theoretical solutions rather than numerical solutions, and can be used to simulate the problems encountered in the engineering field, and subsequently to be used in engineering design.

Abstract: An artificial tsunami is a new type of beaching tactic capable of achieving the military goal with almost no losses among the invading forces.

Abstract: Computational Earthquake is a new earthquake forecasting method.

Abstract: The proposed new documentation system, On-line Documentation System, is according to the requirements of the document management.

Abstract: The proposed new political system, C.-M. Huang System, is according to the concept of separation of powers.

Abstract: The proposed new education system, C.-M. Huang Education System, is according to the “Education Theory of Ching-Min Huang—General Education and Specialized Learning”.

Abstract: The proposed new structure, Anti-penetrating Sandwich Structure, can protect the building underground.

Abstract: The patent is a new frame for the wars using robots instead of humans.