Abstract: The present disclosure provides methods and systems for providing a similarity index in semiconductor process control. One of the methods disclosed herein is a method for semiconductor fabrication process control. The method includes steps of receiving a first semiconductor device wafer and receiving a second semiconductor device wafer. The method also includes a step of collecting metrology data from the first and second semiconductor device wafers. The metrology data includes a first set of vectors associated with the first semiconductor device wafer and a second set of vectors associated with the second semiconductor device wafer. The method includes determining a similarity index based in part on a similarity index value between a first vector from the first set of vectors and a second vector from the second set of vectors and continuing to process additional wafers under current parameters when the similarity index is above a threshold value.

Abstract: The present disclosure provides methods and systems for providing a similarity index in semiconductor process control. One of the methods disclosed herein is a method for semiconductor fabrication process control. The method includes steps of receiving a first semiconductor device wafer and receiving a second semiconductor device wafer. The method also includes a step of collecting metrology data from the first and second semiconductor device wafers. The metrology data includes a first set of vectors associated with the first semiconductor device wafer and a second set of vectors associated with the second semiconductor device wafer. The method includes determining a similarity index based in part on a similarity index value between a first vector from the first set of vectors and a second vector from the second set of vectors and continuing to process additional wafers under current parameters when the similarity index is above a threshold value.

Abstract: An engineering analysis tool comprises a unified resource model-based (URM) objective and tool mapping capability for linking engineering analysis objectives to analysis tools. A Markov chain-based analysis plan generator (APTG) for reusing engineering analysis plans may be included in the engineering analysis tool. Further, the engineering analysis tool comprises a graphic symptom capturer (GSC) that auto-captures engineering perceived fault symptoms from engineering data analysis (EDA) tools.

Abstract: An engineering analysis tool comprises a unified resource model-based (URM) objective and tool mapping capability for linking engineering analysis objectives to analysis tools. A Markov chain-based analysis plan generator (APTG) for reusing engineering analysis plans may be included in the engineering analysis tool. Further, the engineering analysis tool comprises a graphic symptom capturer (GSC) that auto-captures engineering perceived fault symptoms from engineering data analysis (EDA) tools.