Abstract: A chemical vapor deposition (CVD) apparatus for depositing a low vapor pressure copper precursor onto a silicon wafer. The CVD apparatus includes a CVD reaction chamber with an interior containing a substrate holder adapted to support a substrate, such as a silicon wafer, at a predetermined position within the CVD reaction chamber. An ultrasonic nebulizer is operatively connected to the CVD reaction chamber and is adapted to connect to a source of liquid precursor. The ultrasonic nebulizer has an atomizing discharge end adapted to atomize the liquid precursor and deposit the atomized precursor onto a substrate supported by the substrate holder. A gas distribution ring is disposed within the interior of the CVD reaction chamber for discharging a directionally oriented gas into the atomized precursor to direct the atomized precursor toward the substrate. Additional embodiments and methods for depositing the precursor are described.

Abstract: A portable air sampler to measure the concentration of a chemical compound in the air, especially in a workplace, measures the quantity of the chemical in its gas phase and in its particle phase. The sampler is connected to a pump which draws ambient air through an inlet tube and out a nozzle. A housing holds a filter aligned with the nozzle. The air is immediately separated into two parts, one portion continues straight through the filter, the second turns 180.degree.. The particles, due to their mass and resulting inertia, will travel in the forward direction to be collected in the filter. The portion of air that flows through the filter continues through a sorbent tube where the vapor (gas phase) from this portion is collected. This sorbent tube also collects the quantity of the chemical that evaporates from the particles collected on the filter.