Abstract: A silicon-containing compound, liquid-crystal composition and a liquid-crystal display using the silicon-containing compound are provided. The silicon-containing compound has a structure represented by Formula (I): wherein K, R1, A1, A2, A3, A4, Z1, Z2, Z3, L7, L8, L9, X6, X7, n1, n2, n3, and n4 are defined as in the specification.

Abstract: Liquid-crystal compounds, liquid-crystal compositions, and liquid-crystal devices employing the same are provided. The liquid-crystal compound has a structure of Formula (I): wherein R1 is hydrogen, C1-10 alkyl, or C2-10 alkenyl; R2 is, C2-10 alkenyl, or C2-10 fluoroalkenyl, in which one or two nonadjacent —CH2— is replaced by —O—, or C2-10 ether; A1, A2, A3, and A4 are independently R3 is independently hydrogen, or halogen; Z1, Z2, and Z3 are independently single bond, —CH2—, —(CH2)2—, —(CH2)4—, —CH2O—, —OCH2—, —CF?CF—, —(CH2)2CF2O—, —(CH2)2OCF2—, —OCF2(CH2)2—, —CF2O(CH2)2—, —COO—, —OCO—, —CF2O—, —OCF2—, —C?C—, —CH?CH—, —CH?CH—(CH2)2—, or —(CH2)2—CH?CH—; and n and m are independently 1 or 0.

Abstract: A liquid crystal compound of formula (I): where A1, A2, A3, A4, R1, R2, Z1, Z2, Z3, n, and m are as defined in the specification.

Abstract: Liquid-crystal compounds, liquid-crystal compositions, and liquid-crystal devices employing the same are provided. The liquid-crystal compound has a structure of Formula (I): wherein R1 is hydrogen, C1-10 alkyl, or C2-10 alkenyl; R2 is, C2-10 alkenyl, or C2-10 fluoroalkenyl, in which one or two nonadjacent —CH2— is replaced by —O—, or C2-10 ether; A1, A2, A3, and A4 are independently R3 is independently hydrogen, or halogen; Z1, Z2, and Z3 are independently single bond, —CH2—, —(CH2)2—, —(CH2)4—, —CH2O—, —OCH2—, —CF?CF—, —(CH2)2CF2O—, —(CH2)2OCF2—, —OCF2(CH2)2—, —CF2O(CH2)2—, —COO—, —OCO—, —CF2O—, —OCF2—, —C?C—, —CH?CH—, —CH?CH—(CH2)2—, or —(CH2)2—CH?CH—; and n and m are independently 1 or 0.

Abstract: A liquid crystal compound of formula (I): where A1, A2, A3, A4, R1, R2, Z1, Z2, Z3, n, and m are as defined in the specification.

Abstract: The present invention provides equipment for processing discharging exhaust gas. The equipment comprises an adsorption system, an incinerator, an exhaust connected to the incinerator, a first heat heat exchanger connected between the adsorption system and the incinerator, a windmill that has a first piping in the inlet and a second piping in the outlet, and a pipe connected between the adsorption system and the first piping. The equipment for processing discharging exhaust gas can effectively save energy and decrease costs.

Abstract: The present invention provides equipment for processing discharging exhaust gas. The equipment comprises an adsorption system, an incinerator, an exhaust connected to the incinerator, a first heat heat exchanger connected between the adsorption system and the incinerator, a windmill that has a first piping in the inlet and a second piping in the outlet, and a pipe connected between the adsorption system and the first piping. The equipment for processing discharging exhaust gas can effectively save energy and decrease costs.

Abstract: An exhaust gas processing apparatus is provided. The apparatus includes a rotor concentrator installed in an inlet, an active carbon adsorption system installed in an outlet, and a switch located between the zeolite rotor concentrator and the active carbon adsorption system for selecting any one (or both) of the two systems to process exhaust gases.