Patents by Inventor Ching-Yi HUNG

Ching-Yi HUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10261427
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer, Ching-Yi Hung, Patrick Warnaar
  • Publication number: 20180136570
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Application
    Filed: January 12, 2018
    Publication date: May 17, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Si-Han ZENG, Yue-Lin PENG, Jen-Yu FANG, Arie Jeffrey DEN BOEF, Alexander STRAAIJER, Ching-Yi HUNG, Patrick WARNAAR
  • Patent number: 9869940
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: January 16, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer, Ching-Yi Hung, Patrick Warnaar
  • Publication number: 20160313654
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Application
    Filed: April 20, 2016
    Publication date: October 27, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Si-Han ZENG, Yue-Lin PENG, Jen-Yu FANG, Arie Jeffrey DEN BOEF, Alexander STRAAIJER, Ching-Yi HUNG, Patrick WARNAAR