Patents by Inventor Chingyin Hong

Chingyin Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8257997
    Abstract: In one aspect, a method includes forming a pit in a top surface of a substrate by removing a portion of the substrate and growing a semiconductor material with a bottom surface on the pit, the semiconductor material different than the material of the substrate. The pit has a base recessed in the top surface of the substrate. In another aspect, a structure includes a substrate having a top surface, the substrate including at least one pit having a base lower than the top surface of the substrate, and a semiconductor material having a bottom surface formed on the base of the pit.
    Type: Grant
    Filed: October 17, 2008
    Date of Patent: September 4, 2012
    Assignee: Sifotonics Technologies (USA) Inc.
    Inventors: Liang Chen, Chingyin Hong, Fuwan Gan, Dong Pan
  • Publication number: 20090101909
    Abstract: In one aspect, a method includes forming a pit in a top surface of a substrate by removing a portion of the substrate and growing a semiconductor material with a bottom surface on the pit, the semiconductor material different than the material of the substrate. The pit has a base recessed in the top surface of the substrate. In another aspect, a structure includes a substrate having a top surface, the substrate including at least one pit having a base lower than the top surface of the substrate, and a semiconductor material having a bottom surface formed on the base of the pit.
    Type: Application
    Filed: October 17, 2008
    Publication date: April 23, 2009
    Applicant: Nano Photonics, Inc.
    Inventors: Liang Chen, Chingyin Hong, Fuwan Gan, Dong Pan