Abstract: A supercritical fluid washing method and system in which a supercritical fluid washing system employs a supercritical fluid to clean the surface of materials possessing surface microstructures, and where a supercritical fluid is used to soak, wash, and dry elements; the element surface may include nanometer pores or high aspect ratio microstructures. This supercritical fluid washing method is able to remove impurities or water vapor from the surface of elements.

Abstract: A method and system for reducing trace organic matter from ultrapure water is applied to removal of trace organic matter from ultrapure water having a total organic carbon (TOC) level less than 1ppb, so as to avoid leaching of trace organic matter from the ion exchange resin used in the system. The trace organic matter in the ultrapure water is degraded into charged ions, and further treated with a continuous electrodeionization unit to remove the charged ions, so as to reduce the TOC level and increase the resistance value of the ultrapure water.

Abstract: A surface treatment method for material with surface microstructure includes the steps of subjecting the material surface to a dry-type free-radical oxidation treatment, and using a supercritical fluid to purge the surface of the material with surface microstructure, so as to remove oxidized and bond-broken small molecules from the material surface. The surface microstructure may include nanoholes or high-aspect-ratio microstructures. Small molecules or moistures in the nanoholes or the high-aspect-ratio microstructures are carried by the supercritical fluid away from the material with surface microstructure.

Abstract: A method of inhibiting metal corrosion is applicable to a metal-containing substrate, which has a surface in contact with a reaction solution. The method includes the steps of mixing ozone with the reaction solution and forming a metal oxide protective layer on the surface of the metal-containing substrate, so as to prevent metal beneath the protective layer from being continuously oxidized and corroded. In the method, the reaction solution contacting with metal is further adjusted in its oxidation-reduction property and pH value to change the corrosivity of the reaction solution and mitigate the corrosion tendency of metal.

Abstract: The present invention relates to a washing apparatus with bubbling reaction and a washing method of using bubbling reaction which are based on compression technology of an interface diffusion layer with bubbling, by the aid of using a bubble wall generated by a pneumatic means as a reaction interface in a gas-liquid-solid heterogeneous system and utilizing a pulling force generated by bubbles when climbing up along the surface of a material to be washed, to compress thickness of the liquid-solid interface and optimize mass transfer efficiency in multiphase that can remove organic matter from the material surface.

Abstract: The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immersed in a liquid with only a lower portion thereof being below the liquid surface. Gas such as ozone is introduced into the liquid and is continuously bubbling below the substrates. The bubbles will ascend between two adjacent substrates and climb on the surfaces of the substrates before they burst. The liquid boundary layers on the substrate surfaces are compressed and refreshed in the course of a dragging ascent of the bubbles, enhancing mass transfer between gas/liquid/solid substances across the liquid boundary layer, thereby resulting in a fast reaction and a fast treatment of the surface of the substrates.

Abstract: A method for purifying carbon nanomaterial. This method comprises providing a carbon nanomaterial or a device substrate having a carbon nanomaterial. The carbon nanomaterial or the device substrate having a carbon nanomaterial is placed in a chamber. Ozone is introduced into the chamber at room temperature and atmospheric pressure to oxidize and remove impurities from the carbon nanomaterial.

Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.

Abstract: The present invention discloses a process for collecting and concentrating trace organics in a liquid sample, which includes steps of adsorption, dehydration, and thermal desorption. The process can be automatically operated by associating with analysis instruments for detecting gaseous materials, such as GC (Gas Chromatography), GC-MS (Gas Chromatography-Mass spectroscopy) and FTIR (Fourier Transfer Infrared spectroscopy) to monitor the organics in the liquid sample. The process can collect and concentrate semi-volatile organic contaminants in a liquid sample which are unable to be collected and concentrated by purge & trap process or head-space process. The process of the present invention can be used to detect trace organics in a detecting limit at a ppt level.

Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.

Abstract: The present invention relates to a method for forming an ultra thin oxide layer by using an ozonated water, which comprises the steps of dissolving an ozone-containing gas in deionized water to form an ozonated water, and immersing a silicon wafer in the ozonated water to from an ultra thin oxide layer on the wafer. The method according to the present invention can substitute for the conventional high temperature process for growing an ultra thin oxide layer and form an ultra thin oxide layer in high density and high uniformity by taking the advantages of time-saving, energy-saving but without conducting at an elevated temperature.

Abstract: The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immersed in a liquid with only a lower portion thereof being below the liquid surface. Gas such as ozone is introduced into the liquid and is continuously bubbling below the substrates. The bubbles will ascend between two adjacent substrates and climb on the surfaces of the substrates before they burst. The liquid boundary layers on the substrate surfaces are compressed and refreshed in the course of a dragging ascent of the bubbles, enhancing mass transfer between gas/liquid/solid substances across the liquid boundary layer, thereby resulting in a fast reaction and a fast treatment of the surface of the substrates.

Abstract: A method is devised to produce a reaction liquid, for example deionized water, containing a high concentration of ozone. The method makes use of a chemical control mechanism and a recycling mechanism to enhance the dissolution of the ozone in the reaction liquid. The chemical control mechanism includes the addition of the chemical radical scavenger to a dissolution system, and the recycling mechanism recycling a portion of the resulting ozone-containing liquid back to the dissolution system, so as to enhance the ozone dissolution to an extent that the ozone concentration reaches a saturation point attainable under thermodynamics of the dissolution system.