Patents by Inventor Chiou-Sung Chiu

Chiou-Sung Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for making reticles with reduced particle contamination and reticles formed
    Patent number: 6727029
    Abstract: A reticle for holding a mask thereon with reduced particle contamination problem is described. The reticle is constructed by a base plate that is formed of an optically transparent material such as quartz and has a recessed slot in a top surface to enclose an area at least the size of a mask formed on the base plate. An adhesive partially fills the recessed slot such that a top surface of the adhesive is at least 0.5 mm below the top surface of the base plate. A pellicle frame is mounted in the recessed slot with a bottom end of the frame encased in the adhesive and a thin film covering the top end of the pellicle frame to from a hermetically sealed cavity for protecting the mask.
    Type: Grant
    Filed: January 2, 2003
    Date of Patent: April 27, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Cheng-Ming Wu, Paul Chu, Chiou-Sung Chiu, Chih-Wing Chang