Patents by Inventor Chistopher D. Bencher

Chistopher D. Bencher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme
    Patent number: 7064078
    Abstract: A method of etching a substrate is provided. The method of etching a substrate includes transferring a pattern into the substrate using a double patterned amorphous carbon layer on the substrate as a hardmask. Optionally, a non-carbon based layer is deposited on the amorphous carbon layer as a capping layer before the pattern is transferred into the substrate.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: June 20, 2006
    Assignee: Applied Materials
    Inventors: Wei Liu, Jim Zhongyi He, Sang H. Ahn, Meihua Shen, Hichem M'Saad, Wendy H. Yeh, Chistopher D. Bencher