Patents by Inventor Chiu-Shan Yoo

Chiu-Shan Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for processing masks with oblique features
    Patent number: 7314689
    Abstract: A method and system is disclosed for processing one or more oblique features on a mask or reticle substrate. After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed on the mask or reticle substrate with regard to either the horizontal or vertical reference direction of the predetermined reference system is determined. The mask or reticle substrate is rotated in a predetermined direction by the offset angle; and the feature on the mask or reticle substrate is processed using the predetermined reference system wherein the feature is processed in either the horizontal or vertical reference direction thereof.
    Type: Grant
    Filed: January 27, 2004
    Date of Patent: January 1, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Burn Jeng Lin, Ping Yang, Hong Chang Hsieh, Yao Ching Ku, Chin Hsian Lin, Chiu Shan Yoo
  • Photolithography mask critical dimension metrology system and method
    Patent number: 7251015
    Abstract: A photolithography mask critical dimension metrology system is provided. The system includes a radiation source, a holder operable to securely hold at least one mask oriented to receive radiation emitted from the radiation source, a projection system operable to direct radiation passing through the at least one mask, and an image capture system operable to receive radiation directed by the projection system and capture a projected image of the at least one mask.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: July 31, 2007
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Chiu-Shan Yoo
  • Photolithography mask critical dimension metrology system and method
    Publication number: 20060290907
    Abstract: A system comprising a radiation source, a holder operable to securely hold at least one mask oriented to receive radiation emitted from the radiation source, a projection system operable to direct radiation passing through the at least one mask, and an image capture system operable to receive radiation directed by the projection system and capture a projected image of the at least one mask.
    Type: Application
    Filed: June 27, 2005
    Publication date: December 28, 2006
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Chiu-Shan Yoo