Abstract: An anti-plasma coating formed on a surface of a component in a plasma chamber includes an insulation layer on the surface and a plasma-resistant layer on the insulation layer. The plasma-resistant layer includes one or more stacks, where each stack includes a crystalline layer and an amorphous layer. The anti-plasma coating improves a lifetime of the component in the plasma chamber with high-energy plasma sources.

Abstract: A method includes: forming a first coating comprising amorphous rare earth metal-containing oxide directly on a surface of an article using a first atomic layer deposition (ALD) process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N1 times, the first coating characterized by a first thickness; forming a second coating comprising crystalline rare earth metal oxide on the first coating using a second ALD process, the second coating characterized by a second thickness; forming a third coating comprising amorphous rare earth metal-containing oxide on the second coating using a third ALD process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N2 times, the third coating characterized by a third thickness; and forming a fourth coating comprising crystalline rare earth metal oxide on the third coating using a fourth ALD process.

Abstract: A method includes forming a first coating comprising amorphous rare earth metal-containing oxide on a surface of an article using a first atomic layer deposition (ALD) process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N1 times. The method also includes forming a second coating comprising crystalline rare earth metal oxide on the first coating using a second ALD process. The method also includes forming a third coating comprising amorphous rare earth metal-containing oxide on the second coating using a third ALD process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N2 times. The method also includes forming a fourth coating comprising crystalline rare earth metal oxide on the third coating using a fourth ALD process. In some embodiments, a ratio of N1 to N2 is between about 100 and about 150.

Abstract: A method includes forming a first coating comprising amorphous rare earth metal-containing oxide on a surface of an article using a first atomic layer deposition (ALD) process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N1 times. The method also includes forming a second coating comprising crystalline rare earth metal oxide on the first coating using a second ALD process. The method also includes forming a third coating comprising amorphous rare earth metal-containing oxide on the second coating using a third ALD process that includes repeating a process of alumina deposition cycles followed by rare earth metal oxide deposition cycles N2 times. The method also includes forming a fourth coating comprising crystalline rare earth metal oxide on the third coating using a fourth ALD process. In some embodiments, a ratio of N1 to N2 is between about 100 and about 150.

Abstract: A near-field optical disk having surface plasmon amplification by stimulated emission of radiation (SPASER) is provided. The near-field optical disk having SPASER includes a transparent substrate, a first transparent dielectric thin film layer formed on the transparent substrate, a SPASER thin film layer formed on the first transparent dielectric thin film layer, a second transparent dielectric thin film layer formed on the SPASER thin film layer, a recording thin film layer formed on the second transparent dielectric thin film layer, and a third transparent dielectric thin film layer formed on the recording thin film layer.

Abstract: A near-field optical disk having surface plasmon amplification by stimulated emission of radiation (SPASER) is provided. The near-field optical disk having SPASER includes a transparent substrate, a first transparent dielectric thin film layer formed on the transparent substrate, a SPASER thin film layer formed on the first transparent dielectric thin film layer, a second transparent dielectric thin film layer formed on the SPASER thin film layer, a recording thin film layer formed on the second transparent dielectric thin film layer, and a third transparent dielectric thin film layer formed on the recording thin film layer.