Patents by Inventor Chiung-Jung Tu

Chiung-Jung Tu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Layout pattern and photomask including the same
    Patent number: 9442366
    Abstract: A layout pattern and a photomask including the layout pattern are provided. The layout pattern includes a plurality of main patterns and at least one auxiliary pattern. The main patterns are arranged in parallel to one another and extend in a first direction. The at least one auxiliary pattern is located between two outermost main patterns and connects the two outermost main patterns. The at least one auxiliary pattern is arranged in a second direction. The second direction is different from the first direction.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: September 13, 2016
    Assignee: MACRONIX International Co., Ltd.
    Inventors: Chiung-Jung Tu, Chih-Hao Huang
  • LAYOUT PATTERN AND PHOTOMASK INCLUDING THE SAME
    Publication number: 20160187768
    Abstract: A layout pattern and a photomask including the layout pattern are provided. The layout pattern includes a plurality of main patterns and at least one auxiliary pattern. The main patterns are arranged in parallel to one another and extend in a first direction. The at least one auxiliary pattern is located between two outermost main patterns and connects the two outermost main patterns. The at least one auxiliary pattern is arranged in a second direction. The second direction is different from the first direction.
    Type: Application
    Filed: December 31, 2014
    Publication date: June 30, 2016
    Inventors: Chiung-Jung Tu, Chih-Hao Huang