Patents by Inventor Chi-Wei Hu

Chi-Wei Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10268791
    Abstract: A method is disclosed that includes the operation below. Vertices in a conflict graph are sorted into a first clique and a second clique, in which the conflict graph corresponds to a layout of a circuit. A first vertex of the vertices is merged with a second vertex of the vertices, to generate a reduced graph, in which the first clique excludes the second vertex, and the second clique excludes the first vertex. A first color pattern of a plurality of color patterns is assigned to a first pattern, corresponding to the first vertex, and a second pattern, corresponding to the second vertex, in the layout according to the reduced graph.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: April 23, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yen-Hung Lin, Chung-Hsing Wang, Chin-Chou Liu, Chi-Wei Hu
  • Publication number: 20170169154
    Abstract: A method is disclosed that includes the operation below. Vertices in a conflict graph are sorted into a first clique and a second clique, in which the conflict graph corresponds to a layout of a circuit. A first vertex of the vertices is merged with a second vertex of the vertices, to generate a reduced graph, in which the first clique excludes the second vertex, and the second clique excludes the first vertex. A first color pattern of a plurality of color patterns is assigned to a first pattern, corresponding to the first vertex, and a second pattern, corresponding to the second vertex, in the layout according to the reduced graph.
    Type: Application
    Filed: December 11, 2015
    Publication date: June 15, 2017
    Inventors: Yen-Hung LIN, Chung-Hsing WANG, Chin-Chou LIU, Chi-Wei HU
  • Patent number: 8739097
    Abstract: A method comprises selecting a region from a layout pattern of an integrated circuit, wherein the region comprises a plurality of functional units, and wherein the functional units are not coupled to each other through a variety of connection components, identifying hot spots in the region using a first threshold and inserting a plurality of decoupling capacitors adjacent to the hot spots.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: May 27, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Wei Hu, Kuan-Yu Lin, Wan-Chun Chen, Chin-Chou Liu
  • Publication number: 20140082575
    Abstract: A method comprises selecting a region from a layout pattern of an integrated circuit, wherein the region comprises a plurality of functional units, and wherein the functional units are not coupled to each other through a variety of connection components, identifying hot spots in the region using a first threshold and inserting a plurality of decoupling capacitors adjacent to the hot spots.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 20, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chi-Wei Hu, Kuan-Yu Lin, Wan-Chun Chen, Chin-Chou Liu
  • Patent number: 8508834
    Abstract: A printable photovoltaic electrochromic device is provided. The device includes a transparent substrate, at least one thin-film solar cell on the transparent substrate, at least one single polarity electrochromic (EC) thin film, wherein the single polarity electrochromic thin film includes a single polarity electrochromic material and a polyelectrolyte. The thin-film solar cell at least includes an anode layer, a cathode layer, and a photoelectric conversion layer between the anode layer and cathode layer, wherein a portion of the anode layer or a portion of the cathode layer is exposed from the thin-film solar cell. The single polarity electrochromic thin film covers and contacts with both the cathode layer and the anode layer.
    Type: Grant
    Filed: November 10, 2011
    Date of Patent: August 13, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Lee-May Huang, Chi-Wei Hu
  • Patent number: 8258883
    Abstract: A system and method for characterizing process variations are provided. A circuit comprises a plurality of inverters arranged in a sequential loop, and a plurality of transmission gates, with each transmission gate coupled between a pair of serially arranged inverters. Each transmission gate comprises a first field effect transistor (FET) having a first channel, and a second FET having a second channel. The first channel and the second channel are coupled in parallel and a gate terminal of the first FET and a gate terminal of the second FET are coupled to a first control signal and a second control signal, respectively.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: September 4, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Wei Chen, Chi-Wei Hu, Wei-Pin Changchien, Chin-Chou Liu
  • Publication number: 20120140310
    Abstract: A printable photovoltaic electrochromic device is provided. The device includes a transparent substrate, at least one thin-film solar cell on the transparent substrate, at least one single polarity electrochromic (EC) thin film, wherein the single polarity electrochromic thin film includes a single polarity electrochromic material and a polyelectrolyte. The thin-film solar cell at least includes an anode layer, a cathode layer, and a photoelectric conversion layer between the anode layer and cathode layer, wherein a portion of the anode layer or a portion of the cathode layer is exposed from the thin-film solar cell. The single polarity electrochromic thin film covers and contacts with both the cathode layer and the anode layer.
    Type: Application
    Filed: November 10, 2011
    Publication date: June 7, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Lee-May Huang, Chi-Wei Hu
  • Publication number: 20100176890
    Abstract: A system and method for characterizing process variations are provided. A circuit comprises a plurality of inverters arranged in a sequential loop, and a plurality of transmission gates, with each transmission gate coupled between a pair of serially arranged inverters. Each transmission gate comprises a first field effect transistor (FET) having a first channel, and a second FET having a second channel. The first channel and the second channel are coupled in parallel and a gate terminal of the first FET and a gate terminal of the second FET are coupled to a first control signal and a second control signal, respectively.
    Type: Application
    Filed: November 12, 2009
    Publication date: July 15, 2010
    Inventors: Yi-Wei Chen, Chi-Wei Hu, Wei-Pin Changchien, Chin-Chou Liu