Patents by Inventor Chizhong WANG

Chizhong WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10337112
    Abstract: Provided is a method for producing a photocatalyst electrode for water decomposition that exhibits excellent detachability between the substrate and the photocatalyst layer and exhibits high photocurrent density. The method for producing a photocatalyst electrode for water decomposition of the invention includes: a metal layer forming step of forming a metal layer on one surface of a first substrate by a vapor phase film-forming method or a liquid phase film-forming method; a photocatalyst layer forming step of forming a photocatalyst layer by subjecting the metal layer to at least one treatment selected from an oxidation treatment, a nitriding treatment, a sulfurization treatment, or a selenization treatment; a current collecting layer forming step of forming a current collecting layer on a surface of the photocatalyst layer, the surface being on the opposite side of the first substrate; and a detachment step of detaching the first substrate from the photocatalyst layer.
    Type: Grant
    Filed: August 31, 2017
    Date of Patent: July 2, 2019
    Assignees: FUJIFILM Corporation, THE UNIVERSITY OF TOKYO, JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS
    Inventors: Kazunari Domen, Takashi Hisatomi, Tsutomu Minegishi, Chizhong Wang, Chisato Katayama
  • Publication number: 20170362721
    Abstract: Provided is a method for producing a photocatalyst electrode for water decomposition that exhibits excellent detachability between the substrate and the photocatalyst layer and exhibits high photocurrent density. The method for producing a photocatalyst electrode for water decomposition of the invention includes: a metal layer forming step of forming a metal layer on one surface of a first substrate by a vapor phase film-forming method or a liquid phase film-forming method; a photocatalyst layer forming step of forming a photocatalyst layer by subjecting the metal layer to at least one treatment selected from an oxidation treatment, a nitriding treatment, a sulfurization treatment, or a selenization treatment; a current collecting layer forming step of forming a current collecting layer on a surface of the photocatalyst layer, the surface being on the opposite side of the first substrate; and a detachment step of detaching the first substrate from the photocatalyst layer.
    Type: Application
    Filed: August 31, 2017
    Publication date: December 21, 2017
    Applicants: FUJIFILM Corporation, THE UNIVERSITY OF TOKYO, Japan Technological Research Association of Artificial Photosynthetic Chemical Process
    Inventors: Kazunari DOMEN, Takashi HISATOMI, Tsutomu MINEGISHI, Chizhong WANG, Chisato KATAYAMA