Abstract: A semiconductor structure includes a first gate structure, a second gate structure coupled to the first gate structure, a source region, a first drain region, and a second drain region. The source region is surrounded by the first gate structure and the second gate structure. The first drain region is separated from the source region by the first gate structure. The second drain region is separated from the source region by the second gat structure. A shape of the first drain region and a shape of the second drain region are different from each other from a plan view.

Abstract: An emissions control system is disclosed. The emissions control system may have an SCR device that receives a flow of exhaust. The emissions control system may also have an injector that introduces a reduction agent into the flow of exhaust at or upstream of a catalyst within the SCR device. The emissions control system may have a controller in communication with the injector, the controller being configured to calculate a first amount of the reduction agent by using an approximation that at least one of a plurality of SCR reactions must be completed before the remaining SCR reactions commence. The controller may also be configured to adjust the injector according to at least the first amount.

Abstract: An emissions control system is disclosed. The emissions control system may have an SCR device that receives a flow of exhaust. The emissions control system may also have an injector that introduces a reduction agent into the flow of exhaust at or upstream of a catalyst within the SCR device. The emissions control system may have a controller in communication with the injector, the controller being configured to calculate a first amount of the reduction agent by using an approximation that at least one of a plurality of SCR reactions must be completed before the remaining SCR reactions commence. The controller may also be configured to adjust the injector according to at least the first amount.

Abstract: An exhaust treatment system is provided having a first exhaust passageway fluidly connected to an engine. A particulate filter and a selective catalytic reduction catalyst are situated within the first exhaust passageway. In addition, the system has a first oxidation catalyst located within the first exhaust passageway upstream of the particulate filter and the selective catalytic reduction catalyst. The system also has a second exhaust passageway fluidly connected to the first exhaust passageway upstream and downstream of the first oxidation catalyst. The exhaust treatment system further has a sensor configured to sense a parameter indicative of an exhaust gas temperature. Furthermore, the system has a controller configured to direct exhaust gas through the first oxidation catalyst when the exhaust gas temperature is below a threshold temperature and direct the exhaust gas through the second exhaust passageway when the exhaust gas temperature is above the threshold temperature.