Patents by Inventor Cho-Ying Lin
Cho-Ying Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230375949Abstract: A method includes: removing debris on a collector of a lithography equipment by changing physical structure of the debris with a cleaner, the cleaner being at a temperature less than about 13 degrees Celsius; forming a cleaned collector by exhausting the removable debris from the collector; and forming openings in a mask layer on a substrate by removing regions of the mask layer exposed to radiation from the cleaned collector.Type: ApplicationFiled: May 23, 2022Publication date: November 23, 2023Inventors: Cho-Ying LIN, Tai-Yu CHEN, Chieh HSIEH, Sheng-Kang YU, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
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Publication number: 20230284366Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.Type: ApplicationFiled: April 11, 2023Publication date: September 7, 2023Inventors: Tai-Yu CHEN, Cho-Ying LIN, Sagar Deepak KHIVSARA, Hsiang CHEN, Chieh HSIEH, Sheng-Kang YU, Shang-Chieh CHIEN, Kai Tak LAM, Li-Jui CHEN, Heng-Hsin LIU, Zhiqiang WU
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Publication number: 20230273534Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed.Type: ApplicationFiled: May 3, 2023Publication date: August 31, 2023Inventors: Chieh HSIEH, Tai-Yu CHEN, Cho-Ying LIN, Heng-Hsin LIU, Li-Jui CHEN, Shang-Chieh CHIEN
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Patent number: 11662668Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed.Type: GrantFiled: August 30, 2021Date of Patent: May 30, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chieh Hsieh, Tai-Yu Chen, Cho-Ying Lin, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
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Patent number: 11647578Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.Type: GrantFiled: August 31, 2021Date of Patent: May 9, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tai-Yu Chen, Cho-Ying Lin, Sagar Deepak Khivsara, Hsiang Chen, Chieh Hsieh, Sheng-Kang Yu, Shang-Chieh Chien, Kai Tak Lam, Li-Jui Chen, Heng-Hsin Liu, Zhiqiang Wu
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Patent number: 11632849Abstract: A shutter is provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by a source side of the apparatus away from a scanner side of the apparatus and towards a debris collection device. The activation of the shutter is synchronized with the generation of light pulses so as not to block light from entering the scanner side.Type: GrantFiled: August 27, 2021Date of Patent: April 18, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chieh Hsieh, Tai-Yu Chen, Hung-Jung Hsu, Cho-Ying Lin, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
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Publication number: 20230064840Abstract: A shutter is provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by a source side of the apparatus away from a scanner side of the apparatus and towards a debris collection device. The activation of the shutter is synchronized with the generation of light pulses so as not to block light from entering the scanner side.Type: ApplicationFiled: August 27, 2021Publication date: March 2, 2023Inventors: Chieh HSIEH, Tai-Yu CHEN, Hung-Jung HSU, Cho-Ying LIN, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
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Publication number: 20230060899Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed.Type: ApplicationFiled: August 30, 2021Publication date: March 2, 2023Inventors: Chieh HSIEH, Tai-Yu CHEN, Cho-Ying LIN, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
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Publication number: 20230065403Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.Type: ApplicationFiled: August 31, 2021Publication date: March 2, 2023Inventors: Tai-Yu CHEN, Cho-Ying LIN, Sagar Deepak KHIVSARA, Hsiang CHEN, Chieh HSIEH, Sheng-Kang YU, Shang-Chieh CHIEN, Kai Tak LAM, Li-Jui CHEN, Heng-Hsin LIU, Zhiqiang WU
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Publication number: 20220267641Abstract: To provide a negative type photosensitive composition having excellent chemical resistance and capable of being cured at a low temperature. A negative type photosensitive composition comprising (I) a polysiloxane having a specific structure, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent.Type: ApplicationFiled: July 22, 2020Publication date: August 25, 2022Inventors: Daishi YOKOYAMA, Atsuko NOYA, Cho-Ying LIN, Yung-Cheng CHANG
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Patent number: 8497001Abstract: A first substrate and a second substrate are provided. An alignment process is performed on a surface of the first substrate and a surface of the second substrate respectively. A liquid crystal mixture is prepared, where the liquid crystal mixture includes a liquid crystal molecule and a liquid crystal monomer having a functional group of diacrylates, and the liquid crystal monomer having the functional group of diacrylates occupies 0.01-2 wt % of the liquid crystal mixture. The first substrate and the second substrate are assembled, and the liquid crystal mixture is filled therebetween. A polymerization curing process is performed such that the liquid crystal monomer having the functional group of diacrylates is polymerized to respectively form a liquid crystal polymer film on the aligned surfaces of the first and second substrates. The method enhances anchoring energy and reduces problems of V-T shift, surface gliding, and residual image.Type: GrantFiled: November 2, 2012Date of Patent: July 30, 2013Assignees: Taiwan TFT LCD Association, Chunghwa Picture Tubes, Ltd., AU Optronics Corporation, Hannstar Display Corporation, Chi Mei Optoelectronics Corporation, Industrial Technology Research InstituteInventors: Cho-Ying Lin, Ding-Jen Chen, Hui-Min Lin, Yang-Ching Lin
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Publication number: 20130056890Abstract: A first substrate and a second substrate are provided. An alignment process is performed on a surface of the first substrate and a surface of the second substrate respectively. A liquid crystal mixture is prepared, where the liquid crystal mixture includes a liquid crystal molecule and a liquid crystal monomer having a functional group of diacrylates, and the liquid crystal monomer having the functional group of diacrylates occupies 0.01-2 wt % of the liquid crystal mixture. The first substrate and the second substrate are assembled, and the liquid crystal mixture is filled therebetween. A polymerization curing process is performed such that the liquid crystal monomer having the functional group of diacrylates is polymerized to respectively form a liquid crystal polymer film on the aligned surfaces of the first and second substrates. The method enhances anchoring energy and reduces problems of V-T shift, surface gliding, and residual image.Type: ApplicationFiled: November 2, 2012Publication date: March 7, 2013Inventors: Cho-Ying Lin, Ding-Jen Chen, Hui-Min Lin, Yang-Ching Lin
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Patent number: 8325304Abstract: A first substrate and a second substrate are provided. An alignment process is performed on a surface of the first substrate and a surface of the second substrate respectively. A liquid crystal mixture is prepared, where the liquid crystal mixture includes a liquid crystal molecule and a liquid crystal monomer having a functional group of diacrylates, and the liquid crystal monomer having the functional group of diacrylates occupies 0.01-2 wt % of the liquid crystal mixture. The first substrate and the second substrate are assembled, and the liquid crystal mixture is filled therebetween. A polymerization curing process is performed such that the liquid crystal monomer having the functional group of diacrylates is polymerized to respectively form a liquid crystal polymer film on the aligned surfaces of the first and second substrates. The method enhances anchoring energy and reduces problems of V-T shift, surface gliding, and residual image.Type: GrantFiled: November 30, 2009Date of Patent: December 4, 2012Assignees: Taiwan TFT LCD Association, Chunghwa Picture Tubes, Ltd., AU Optronics Corporation, Hannstar Display Corporation, Chi Mei Optoelectronics Corporation, Industrial Technology Research InstituteInventors: Cho-Ying Lin, Ding-Jen Chen, Hui-Min Lin, Yang-Ching Lin
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Patent number: 8203679Abstract: An OCB mode liquid crystal display panel having a plurality of pixel regions includes a first substrate, a second substrate, dot liquid crystal polymer patterns and an OCB liquid crystal material. The first substrate has a first alignment treated layer thereon, the second substrate has a second alignment treated layer thereon, and the dot liquid crystal polymer patterns are on the first alignment treated layer and the second alignment treated layer. Each of the dot liquid crystal polymer patterns has an area between 1˜225 ?m2. The second substrate is opposite to the first substrate, and the OCB liquid crystal material is between the first substrate and the second substrate.Type: GrantFiled: November 5, 2009Date of Patent: June 19, 2012Assignees: Taiwan TFT LCD Association, Chunghwa Picture Tubes, Ltd., Au Optronics Corporation, Hannstar Display Corporation, Chi Mei Optoelectronics Corporation, Industrial Technology Research InstituteInventors: Ze-Yu Yen, Ding-Jen Chen, Ya-Ting Wu, Cho-Ying Lin
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Publication number: 20110096286Abstract: A first substrate and a second substrate are provided. An alignment process is performed on a surface of the first substrate and a surface of the second substrate respectively. A liquid crystal mixture is prepared, where the liquid crystal mixture includes a liquid crystal molecule and a liquid crystal monomer having a functional group of diacrylates, and the liquid crystal monomer having the functional group of diacrylates occupies 0.01-2 wt % of the liquid crystal mixture. The first substrate and the second substrate are assembled, and the liquid crystal mixture is filled therebetween. A polymerization curing process is performed such that the liquid crystal monomer having the functional group of diacrylates is polymerized to respectively form a liquid crystal polymer film on the aligned surfaces of the first and second substrates. The method enhances anchoring energy and reduces problems of V-T shift, surface gliding, and residual image.Type: ApplicationFiled: November 30, 2009Publication date: April 28, 2011Applicants: Taiwan TFT LCD Association, Chunghwa Picture Tubes, LTD., Au Optronics Corporation, Hannstar Display Corporation, Chi Mei Optoelectronics Corporation, Industrial Technology Research InstituteInventors: Cho-Ying Lin, Ding-Jen Chen, Hui-Min Lin, Yang-Ching Lin
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Publication number: 20110069266Abstract: An OCB mode liquid crystal display panel having a plurality of pixel regions includes a first substrate, a second substrate, dot liquid crystal polymer patterns and an OCB liquid crystal material. The first substrate has a first alignment treated layer thereon, the second substrate has a second alignment treated layer thereon, and the dot liquid crystal polymer patterns are on the first alignment treated layer and the second alignment treated layer. Each of the dot liquid crystal polymer patterns has an area between 1˜225 ?m2. The second substrate is opposite to the first substrate, and the OCB liquid crystal material is between the first substrate and the second substrate.Type: ApplicationFiled: November 5, 2009Publication date: March 24, 2011Applicants: TAIWAN TFT LCD ASSOCIATION, CHUNGHWA PICTURE TUBES, LTD., AU OPTRONICS CORPORATION, HANNSTAR DISPLAY CORPORATION, CHI MEI OPTOELECTRONICS CORPORATION, INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Ze-Yu Yen, Ding-Jen Chen, Ya-Ting Wu, Cho-Ying Lin
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Publication number: 20100128025Abstract: A method of manufacturing and driving an optically compensated birefringence (OCB) mode liquid crystal (LC) panel is provided. In the method, the OCB LC panel is applied which is characterized that a closed structure region with HAN, VA or Bend property is around a display region of the OCB LC panel. Thereafter, the OCB LC panel is driven by a mode of multistage voltage variation. The mode of multistage voltage variation includes applying a high voltage to LC molecules in the OCB LC panel for transferring them to a bend or a VA state, decaying the high voltage to a low voltage above a bend state holding voltage of the OCB LC panel, and turning off the voltage to zero so as to maintain the configuration of LC molecules in the OCB LC panel in a ?-twist state.Type: ApplicationFiled: June 16, 2009Publication date: May 27, 2010Applicants: TAIWAN TFT LCD ASSOCIATION, CHUNGHWA PICTURE TUBES, LTD., AU OPTRONICS CORPORATION, HANNSTAR DISPLAY CORPORATION, CHI MEI OPTOELECTRONICS CORPORATION, INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Ze-Yu Yen, Ding-Jen Chen, Jian-Lung Chen, Cho-Ying Lin
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Patent number: 7005535Abstract: The present invention relates a chiral compound, comprising a general formula as formula (I): wherein A, B independently are, ?X, Y independently are fluorine, hydrogen or chlorine; m represents an integral from 6 to 18; n represents 0; p represents 0, 3 or 4; and q represents 2, 3 or 4.Type: GrantFiled: March 15, 2004Date of Patent: February 28, 2006Assignee: Tatung Co., Ltd.Inventors: Shune-Long Wu, Cho-Ying Lin
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Publication number: 20050067606Abstract: The present invention relates a chiral compound, comprising a general formula as formula (L): wherein A, B independently are X, Y independently are fluorine (F), hydrogen (H) or chlorine (Cl); m represents an integral from 6 to 16; n represents 0 or 1; p represents 1,2,3 or 4; and q represents 1,2,3 or 4.Type: ApplicationFiled: March 15, 2004Publication date: March 31, 2005Applicant: Tatung Co., Ltd.Inventors: Shune-Long Wu, Cho-Ying Lin