Patents by Inventor Choll Wan Kim

Choll Wan Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240081440
    Abstract: Improved personal protective equipment facial wear including, in one embodiment, an at least partly adhesive mask, and one or more adhesive eye shields. In one implementation, the mask avoids significant contact with the delicate periorbital skin of the wearer, yet provides a substantially airtight seal so as to preclude moisture vapor transfer and “fogging” of eyeware or instruments. In another implementation, adherence of the eye shield is at least partially overlapping with the mask and creates an at least partial seal around a perimeter of the eye shield. Further, an at least partial seal is formed around a perimeter of the mask. The mask and eye shield additionally prevent nasal air flow obstruction, and address the problem of skin irritation and attachment during normal facial expression and movement of the wearer.
    Type: Application
    Filed: November 17, 2023
    Publication date: March 14, 2024
    Inventors: Michael J. O’Leary, Daniel Joseph Braun, Choll Wan Kim, Randy Wayland, Robert F. Gazdzinski
  • Publication number: 20220110385
    Abstract: Improved personal protective equipment facial wear including, in one embodiment, an at least partly adhesive mask, and one or more adhesive eye shields. In one implementation, the mask avoids significant contact with the delicate periorbital skin of the wearer, yet provides a substantially airtight seal so as to preclude moisture vapor transfer and “fogging” of eyeware or instruments. In another implementation, adherence of the eye shield is at least partially overlapping with the mask and creates an at least partial seal around a perimeter of the eye shield. Further, an at least partial seal is formed around a perimeter of the mask. The mask and eye shield additionally prevent nasal air flow obstruction, and address the problem of skin irritation and attachment during normal facial expression and movement of the wearer.
    Type: Application
    Filed: October 8, 2020
    Publication date: April 14, 2022
    Inventors: Michael J. O'Leary, Daniel Joseph Braun, Choll Wan Kim, Randy Wayland, Robert F. Gazdzinski
  • Publication number: 20200246645
    Abstract: Improved personal protective equipment facial wear including, in one embodiment, an at least partly adhesive mask, and one or more adhesive eye shields. In one implementation, the mask avoids significant contact with the delicate periorbital skin of the wearer, yet provides a substantially airtight seal so as to preclude moisture vapor transfer and “fogging” of eyeware or instruments. In another implementation, adherence of the eye shield is at least partially overlapping with the mask and creates an at least partial seal around a perimeter of the eye shield. Further, an at least partial seal is formed around a perimeter of the mask. The mask and eye shield additionally prevent nasal air flow obstruction, and address the problem of skin irritation and attachment during normal facial expression and movement of the wearer.
    Type: Application
    Filed: December 24, 2019
    Publication date: August 6, 2020
    Inventors: Michael O'Leary, Daniel Joseph Braun, Choll Wan Kim
  • Publication number: 20170095015
    Abstract: Improved personal protective equipment facial wear including, in one embodiment, an at least partly adhesive mask, and one or more adhesive eye shields. In one implementation, the mask avoids significant contact with the delicate periorbital skin of the wearer, yet provides a substantially airtight seal so as to preclude moisture vapor transfer and “fogging” of eyeware or instruments. In another implementation, adherence of the eye shield is at least partially overlapping with the mask and creates an at least partial seal around a perimeter of the eye shield. Further, an at least partial seal is formed around a perimeter of the mask. The mask and eye shield additionally prevent nasal air flow obstruction, and address the problem of skin irritation and attachment during normal facial expression and movement of the wearer.
    Type: Application
    Filed: October 4, 2016
    Publication date: April 6, 2017
    Inventors: Michael O'Leary, Daniel Joseph Braun, Choll Wan Kim