Abstract: A wire stripper includes: a first clamp component having a first pivot portion, a notch, a first top surface, a first bottom surface and two first side surfaces, with the first top surface having a pressing portion being concave and beside the notch, with the two first side surfaces each having stripping holes; a second clamp component pivotally connected to the first clamp component and having a receiving chamber and an opening in communication with the receiving chamber; a stripping module detachably coupled to the second clamp component and having a first surface and a second surface opposite the first surface, with the first and second surfaces each having at least one pressing groove forming a stripping groove together with the stripping holes, allowing a wire to be penetratingly disposed in the stripping groove; and a blade device for cutting the wire.

Abstract: The disclosed technology relates generally to semiconductor manufacturing, and more particularly to precursor delivery in cyclic deposition. In one aspect, a thin film deposition system comprises a thin film deposition chamber configured to deposit a thin film. The thin film system additionally comprises a precursor source connected to the thin film deposition chamber by a precursor delivery line, wherein the precursor delivery line comprises a filter connected to the precursor source via a first valve, and a by-pass line connected to the precursor source via a second valve.

Abstract: A method for extracting a kansei adjective of a product based on principal component analysis and explanation (PCA-E) includes constructing a product kansei evaluation vector matrix through original kansei adjectives; performing dimensionality reduction through PCA; and determining, based on principal component load factors, kansei adjectives representing principal components. In this way, the kansei adjectives extracted are explanatory to help users understand the selected kansei adjectives and make accurate evaluation.

Abstract: A method for constructing a design concept generation network (DCGN) and a method for automatically generating a conceptual scheme are provided. A DCGN includes a Transformer encoder, a Transformer decoder, an importance constraint matrix generation module, an importance constraint embedding layer, a cross-attention (CA) layer, and an optimization module. A word importance constraint is ingeniously introduced based on an attention mechanism of a Transformer to record input word constraint information contained in a generated text sequence. This can effectively ensure the reliability and effectiveness of a generated conceptual scheme and is conducive to capturing potential semantic importance information and implementing semantic knowledge reasoning.

Abstract: A method for extracting a kansei adjective of a product based on principal component analysis and explanation (PCA-E) includes constructing a product kansei evaluation vector matrix through original kansei adjectives; performing dimensionality reduction through PCA; and determining, based on principal component load factors, kansei adjectives representing principal components. In this way, the kansei adjectives extracted are explanatory to help users understand the selected kansei adjectives and make accurate evaluation.

Abstract: A method includes receiving a plurality of sets of sensor data associated with a processing chamber of a substrate processing system. Each of the plurality of sets of sensor data comprises a corresponding sensor value of the processing chamber mapped to a corresponding spacing value of the processing chamber. The method further includes providing the plurality of sets of sensor data as input to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, one or more outputs indicative of a health of the processing chamber. The method further includes causing, based on the one or more outputs, performance of one or more corrective actions associated with the processing chamber.

Abstract: A preset three-stage adjustable downhole choke with choking and pressure measurement functions includes an intake assembly for natural gas filtration, an electrically-controlled telescopic assembly for positioning and clamping the downhole choke with a prefabricated seating nipple, and a three-stage choking assembly for natural gas choking and depressurization. The intake assembly, the electrically-controlled telescopic assembly, and the three-stage choking assembly are sequentially communicated from bottom to top. A first-stage control choke, a second-stage adjustable control choke, and a third-stage control choke are sequentially provided in a gas passage of the three-stage choking assembly from bottom to top. The preset three-stage adjustable downhole choke features convenient installation and removal, three-stage choking and depressurization, and an adjustable orifice diameter of a control choke, and can achieve different choking and depressurization effects.

Abstract: Methods and apparatus for controlling a semiconductor process leverage phase shifting between at least two RF generators to improve wafer performance parameters. In some embodiments, an apparatus may include a first radio frequency (RF) generator, a second RF frequency generator, a cable connected between the first RF generator and the second RF generator wherein the cable is configured to synchronize the first RF generator and the second RF generator, and an adjustable phase shift assembly with a two-dimensional trace and an adjustable contact point. The adjustable phase shift assembly is connected to the cable and configured to alter at least one water performance parameter by changing a phase shift relationship between the first RF frequency generator and the second RF frequency generator.

Abstract: An electric seat and an angle adjustment device thereof are provided. The angle adjustment device includes an inner toothed plate and an outer toothed plate engaging with each other, and an eccentric cavity formed therebetween. An eccentric ring completely occupying a positive eccentric region of the eccentric cavity is provided in the eccentric cavity. The eccentric ring has a first accommodating region and a second accommodating region along a circumferential direction. The angle adjustment device further comprises a driving component for driving rotation of the eccentric ring. A damping component is provided in the first accommodating region and/or the second accommodating region, and the damping component is in a compressed state during operation of the driving component. The damping component eliminates a useless stroke in the above operation, thereby eliminating an adjustment lag experienced by a passenger during reverse adjustment of a seat and backrest.

Abstract: A method includes receiving a plurality of sets of sensor data associated with a processing chamber of a substrate processing system. Each of the plurality of sets of sensor data comprises a corresponding sensor value of the processing chamber mapped to a corresponding spacing value of the processing chamber. The method further includes providing the plurality of sets of sensor data as input to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, one or more outputs indicative of a health of the processing chamber. The method further includes causing, based on the one or more outputs, performance of one or more corrective actions associated with the processing chamber.

Abstract: Methods and apparatus for controlling a semiconductor process leverage phase shifting between at least two RF generators to improve wafer performance parameters. In some embodiments, an apparatus may include a first radio frequency (RF) generator, a second RF frequency generator, a cable connected between the first RF generator and the second RF generator wherein the cable is configured to synchronize the first RF generator and the second RF generator, and an adjustable phase shift assembly with a two-dimensional trace and an adjustable contact point. The adjustable phase shift assembly is connected to the cable and configured to alter at least one water performance parameter by changing a phase shift relationship between the first RF frequency generator and the second RF frequency generator.

Abstract: An electric seat and an angle adjustment device thereof are provided. The angle adjustment device includes an inner toothed plate and an outer toothed plate engaging with each other, and an eccentric cavity formed therebetween. An eccentric ring completely occupying a positive eccentric region of the eccentric cavity is provided in the eccentric cavity. The eccentric ring has a first accommodating region and a second accommodating region along a circumferential direction. The angle adjustment device further comprises a driving component for driving rotation of the eccentric ring. A damping component is provided in the first accommodating region and/or the second accommodating region, and the damping component is in a compressed state during operation of the driving component. The damping component eliminates a useless stroke in the above operation, thereby eliminating an adjustment lag experienced by a passenger during reverse adjustment of a seat and backrest.

Abstract: Embodiments of the disclosure relate to methods and a system for adjusting the chucking voltage of an electrostatic chuck. In one embodiment, a system for plasma processing a substrate includes a plasma processing chamber, a radio-frequency (RF) matching circuit coupled to the chamber, a sensor and a controller. The chamber includes a chamber body having an inner volume, a bipolar electrostatic chuck disposed in the inner volume and a power supply configured to provide chucking voltage to a pair of electrodes embedded within the electrostatic chuck. When plasma is energized within the chamber by the application of RF power through an RF matching circuit, the sensor is configured to detect a change in an electrical characteristic at the RF matching circuit. The controller is coupled to the power supply and configured to adjust the chucking voltage in response to the change in the electrical characteristic detected by the sensor.

Abstract: Embodiments presented herein provide techniques for predicting the topography of a product produced from a manufacturing process. One embodiment includes generating a plurality of prediction models. Each of the plurality of prediction models corresponds to a respective one of a plurality of positional coordinates of a product produced from a manufacturing process. The method also includes receiving a set of user-specified input parameters to apply to the manufacturing control process. The method further includes generating a graphical representation of a topography map for the product for the user-specified of input parameters based on the plurality of prediction models.

Abstract: Embodiments of the disclosure relate to methods and a system for adjusting the chucking voltage of an electrostatic chuck. In one embodiment, a system for plasma processing a substrate includes a plasma processing chamber, a radio-frequency (RF) matching circuit coupled to the chamber, a sensor and a controller. The chamber includes a chamber body having an inner volume, a bipolar electrostatic chuck disposed in the inner volume and a power supply configured to provide chucking voltage to a pair of electrodes embedded within the electrostatic chuck. When plasma is energized within the chamber by the application of RF power through an RF matching circuit, the sensor is configured to detect a change in an electrical characteristic at the RF matching circuit. The controller is coupled to the power supply and configured to adjust the chucking voltage in response to the change in the electrical characteristic detected by the sensor.

Abstract: Microwave radiation may be applied to electrochemical devices for rapid thermal processing (RTP) (including annealing, crystallizing, densifying, forming, etc.) of individual layers of the electrochemical devices, as well as device stacks, including bulk and thin film batteries and thin film electrochromic devices. A method of manufacturing an electrochemical device may comprise: depositing a layer of the electrochemical device over a substrate; and microwave annealing the layer, wherein the microwave annealing includes selecting annealing conditions with preferential microwave energy absorption in the layer. An apparatus for forming an electrochemical device may comprise: a first system to deposit an electrochemical device layer over a substrate; and a second system to microwave anneal the layer, wherein the second system is configured to provide preferential microwave energy absorption in the device layer.