Patents by Inventor Chong-Min Ryu

Chong-Min Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for treating substrate
    Patent number: 10991603
    Abstract: A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.
    Type: Grant
    Filed: August 29, 2019
    Date of Patent: April 27, 2021
    Assignee: SEMES CO., LTD.
    Inventors: Oh Jin Kwon, Chong-Min Ryu, Young Ho Choo
  • APPARATUS AND METHOD FOR TREATING SUBSTRATE
    Publication number: 20200075355
    Abstract: A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.
    Type: Application
    Filed: August 29, 2019
    Publication date: March 5, 2020
    Inventors: OH JIN KWON, CHONG-MIN RYU, YOUNG HO CHOO
  • CHUCK PIN, METHOD FOR MANUFACTURING A CHUCK PIN, APPARATUS FOR TREATING A SUBSTRATE
    Publication number: 20190358681
    Abstract: A chuck pin, method for manufacturing a chuck pin, and an apparatus for treating substrate. The substrate treating apparatus includes a container having a treating space in its inner side, a supporting unit supporting the substrate inside of the treating space, and a liquid supply unit providing a solution to the supported substrate of the supporting unit. The supporting unit is placed in a supporting plate where the substrate is placed and in the above supporting plate, and includes a chuck pin supporting a side part of the substrate. The chuck pin is formed on a body and on the above surface of the body, and includes a first coating film provided as a silicon carbide material.
    Type: Application
    Filed: August 9, 2019
    Publication date: November 28, 2019
    Inventors: Chong-Min Ryu, Won-Jun Lee, Seung-Ho Seo
  • CHUCK PIN, METHOD FOR MANUFACTURING A CHUCK PIN, APPARATUS FOR TREATING A SUBSTRATE
    Publication number: 20170140977
    Abstract: A chuck pin, method for manufacturing a chuck pin, and an apparatus for treating substrate. The substrate treating apparatus includes a container having a treating space in its inner side, a supporting unit supporting the substrate inside of the treating space, and a liquid supply unit providing a solution to the supported substrate of the supporting unit. The supporting unit is placed in a supporting plate where the substrate is placed and in the above supporting plate, and includes a chuck pin supporting a side part of the substrate. The chuck pin is formed on a body and on the above surface of the body, and includes a first coating film provided as a silicon carbide material.
    Type: Application
    Filed: November 16, 2016
    Publication date: May 18, 2017
    Inventors: Chong-Min Ryu, Won-Jun Lee, Seung-Ho Seo